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Class Information
Number: 257/E21.223
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than deposition of semiconductor material on a substrate, diffusion or alloying of impurity material, or radiation treatment (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo) > Chemical or electrical treatment, e.g., electrolytic etching (epo) > Chemical etching (epo) > Anisotropic liquid etching (epo)
Description: This subclass is indented under subclass E21.219. This subclass is substantially the same in scope as ECLA classification H01L21/306B3.










Patents under this class:
1 2 3 4 5

Patent Number Title Of Patent Date Issued
8664056 Transistor with embedded strain-inducing material formed in diamond-shaped cavities based on a pre-amorphization Mar. 4, 2014
8569182 Methods of fabricating three-dimensional semiconductor device Oct. 29, 2013
8562855 Silicon etching liquid and etching method Oct. 22, 2013
8551846 Methods for fabricating semiconductor devices Oct. 8, 2013
8492264 Method for forming interconnection levels of an integrated circuit Jul. 23, 2013
8461055 Process for preparing cleaned surfaces of strained silicon Jun. 11, 2013
8241940 Double-sided reusable template for fabrication of semiconductor substrates for photovoltaic cell and microelectronics device manufacturing Aug. 14, 2012
8241973 Method for increasing penetration depth of drain and source implantation species for a given gate height Aug. 14, 2012
8222158 Electronic device, method of manufacturing the same, display and sensor Jul. 17, 2012
8129205 Solid state lighting devices and associated methods of manufacturing Mar. 6, 2012
8120075 Semiconductor device with improved trenches Feb. 21, 2012
8093119 CMOS microelectromechanical system (MEMS) device and fabrication method thereof Jan. 10, 2012
7994062 Selective silicon etch process Aug. 9, 2011
7977228 Methods for the formation of interconnects separated by air gaps Jul. 12, 2011
7968470 Plasma nitriding method, method for manufacturing semiconductor device and plasma processing apparatus Jun. 28, 2011
7968920 Semiconductor device and manufacturing method thereof Jun. 28, 2011
7956473 Semiconductor device Jun. 7, 2011
7927897 Photoresist composition and method of manufacturing array substrate using the same Apr. 19, 2011
7871530 Near-field optical probe based on SOI substrate and fabrication method thereof Jan. 18, 2011
7851313 Semiconductor device and process for improved etch control of strained silicon alloy trenches Dec. 14, 2010
7838887 Source/drain carbon implant and RTA anneal, pre-SiGe deposition Nov. 23, 2010
7821044 Transistor with improved tip profile and method of manufacture thereof Oct. 26, 2010
7749864 Semiconductor device with a thinned semiconductor chip and method for producing the thinned semiconductor chip Jul. 6, 2010
7705416 Method for forming horizontal buried channels or cavities in wafers of monocrystalline semiconductor material Apr. 27, 2010
7629266 Etch compositions and methods of processing a substrate Dec. 8, 2009
7589377 Gate structure with low resistance for high power semiconductor devices Sep. 15, 2009
7494858 Transistor with improved tip profile and method of manufacture thereof Feb. 24, 2009
7432120 Method for realizing a hosting structure of nanometric elements Oct. 7, 2008
7297568 Three-dimensional structural body composed of silicon fine wire, its manufacturing method, and device using same Nov. 20, 2007
7294566 Method for forming wiring pattern, method for manufacturing device, device, electro-optic apparatus, and electronic equipment Nov. 13, 2007
7192885 Method for texturing surfaces of silicon wafers Mar. 20, 2007
7192882 Component for electromagnetic waves and a method for manufacturing the same Mar. 20, 2007
7063751 Semiconductor substrate formed by epitaxially filling a trench in a semiconductor substrate with a semiconductor material after smoothing the surface and rounding the corners Jun. 20, 2006
7064069 Substrate thinning including planarization Jun. 20, 2006
7063798 Method for realizing microchannels in an integrated structure Jun. 20, 2006
7045407 Amorphous etch stop for the anisotropic etching of substrates May. 16, 2006
6987068 Methods to planarize semiconductor device and passivation layer Jan. 17, 2006
6940089 Semiconductor device structure Sep. 6, 2005
6878630 Method of manufacturing a wafer Apr. 12, 2005
6872253 Method of forming a semiconductor component Mar. 29, 2005
6855640 Apparatus and process for bulk wet etch with leakage protection Feb. 15, 2005
6852643 Method for using ammonium fluoride solution in a photoelectrochemical etching process of a silicon wafer Feb. 8, 2005
6844269 Etching method for semiconductor silicon wafer Jan. 18, 2005
6799883 Method for continuously blending chemical solutions Oct. 5, 2004
6787052 Method for fabricating microstructures with deep anisotropic etching of thick silicon wafers Sep. 7, 2004
6767840 Wafer processing apparatus, wafer processing method, and semiconductor substrate fabrication method Jul. 27, 2004
6743722 Method of spin etching wafers with an alkali solution Jun. 1, 2004
6689211 Etch stop layer system Feb. 10, 2004
6670257 Method for forming horizontal buried channels or cavities in wafers of monocrystalline semiconductor material Dec. 30, 2003
6642154 Method and apparatus for fabricating structures using chemically selective endpoint detection Nov. 4, 2003

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