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Class Information
Number: 257/E21.222
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than deposition of semiconductor material on a substrate, diffusion or alloying of impurity material, or radiation treatment (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo) > Chemical or electrical treatment, e.g., electrolytic etching (epo) > Chemical etching (epo) > Etching of group iii-v compound (epo) > Vapor phase etching (epo)
Description: This subclass is indented under subclass E21.22. This subclass is substantially the same in scope as ECLA classification H01L21/306B4C.










Patents under this class:
1 2 3 4

Patent Number Title Of Patent Date Issued
8669190 Method for manufacturing semiconductor device and semiconductor wafer Mar. 11, 2014
8524602 Method for forming vias in a substrate Sep. 3, 2013
8476158 Method of preparing and storing GaN substrate, prepared and stored GaN substrate, and semiconductor device and method of its manufacture Jul. 2, 2013
8420543 Method for treating the dislocation in a GaN-containing semiconductor layer Apr. 16, 2013
8383498 Method for formation of tips Feb. 26, 2013
8283254 Etching method and etching apparatus Oct. 9, 2012
8227826 Method of storing GaN substrate, stored substrate, and semiconductor device and method of its manufacture Jul. 24, 2012
8193099 Protecting exposed metal gate structures from etching processes in integrated circuit manufacturing Jun. 5, 2012
8183669 Nitride semiconductor wafer having a chamfered edge May. 22, 2012
8143168 Etching method and manufacturing method of semiconductor device Mar. 27, 2012
8114698 High light extraction efficiency nitride based light emitting diode by surface roughening Feb. 14, 2012
7981805 Method for manufacturing resistance change element Jul. 19, 2011
7981804 Manufacturing method of semiconductor device Jul. 19, 2011
7960284 III-V compound semiconductor substrate manufacturing method Jun. 14, 2011
7935641 Thin film etching method May. 3, 2011
7898038 Method to improve writer leakage in SiGe bipolar device Mar. 1, 2011
7872331 Nitride semiconductor wafer Jan. 18, 2011
7851248 Method for producing a micromechanical component having a thin-layer capping Dec. 14, 2010
7838429 Method to manufacture a thin film resistor Nov. 23, 2010
7820553 Prevention of trench photoresist scum Oct. 26, 2010
7816265 Method for forming vias in a substrate Oct. 19, 2010
7811908 Method of storing GaN substrate, stored substrate, and semiconductor device and method of its manufacture Oct. 12, 2010
7544611 Method of manufacturing III-V nitride semiconductor device Jun. 9, 2009
7534727 Method for manufacturing semiconductor device May. 19, 2009
7488667 Method for manufacturing nitride-base semiconductor element and nitride-base semiconductor element Feb. 10, 2009
7462566 Method for manufacturing semiconductor device Dec. 9, 2008
7452823 Etching method and apparatus Nov. 18, 2008
7435691 Micromechanical component and suitable method for its manufacture Oct. 14, 2008
7432532 Electronic assembly including a die having an integrated circuit and a layer of diamond to transfer heat Oct. 7, 2008
7399708 Method of treating a composite spin-on glass/anti-reflective material prior to cleaning Jul. 15, 2008
7378351 Method of manufacturing nitride semiconductor device May. 27, 2008
7358110 Image sensor having inner lens Apr. 15, 2008
7176534 Low resistance T-gate MOSFET device using a damascene gate process and an innovative oxide removal etch Feb. 13, 2007
6933242 Plasma etching Aug. 23, 2005
6893971 Dry etching method and apparatus May. 17, 2005
6720200 Field effect transistor and fabrication process thereof Apr. 13, 2004
6508948 Cyanuric fluoride and related compounds for anisotropic etching Jan. 21, 2003
6426523 Heterojunction field effect transistor Jul. 30, 2002
6358316 Method for producing semiconductor device, method for producing semiconductor laser device, and method for producing quantum wire structure Mar. 19, 2002
6266354 Semiconductor laser device with ridge structure Jul. 24, 2001
6211089 Method for fabricating GaN substrate Apr. 3, 2001
6204189 Fabrication of precision high quality facets on molecular beam epitaxy material Mar. 20, 2001
6177352 Method for producing semiconductor bodies with an MOVPE layer sequence Jan. 23, 2001
6156665 Trilayer lift-off process for semiconductor device metallization Dec. 5, 2000
6153897 Heterojunction compound semiconductor device and method of manufacturing the same Nov. 28, 2000
6127201 Method for etching a compound semiconductor, a semiconductor laser device and method for producing the same Oct. 3, 2000
6090649 Heterojunction field effect transistor and method of fabricating the same Jul. 18, 2000
6063699 Methods for making high-aspect ratio holes in semiconductor and its application to a gate damascene process for sub- 0.05 micron mosfets May. 16, 2000
6057567 Integrated circuit and method May. 2, 2000
5968845 Method for etching a compound semiconductor, a semi-conductor laser device and method for producing the same Oct. 19, 1999

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