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Class Information
Number: 257/E21.221
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than deposition of semiconductor material on a substrate, diffusion or alloying of impurity material, or radiation treatment (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo) > Chemical or electrical treatment, e.g., electrolytic etching (epo) > Chemical etching (epo) > Etching of group iii-v compound (epo) > Anisotropic liquid etching (epo)
Description: This subclass is indented under subclass E21.22. This subclass is substantially the same in scope as ECLA classification H01L21/306B4B.










Patents under this class:
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Patent Number Title Of Patent Date Issued
8669623 Structure related to a thick bottom dielectric (TBD) for trench-gate devices Mar. 11, 2014
8664040 Exposing connectors in packages through selective treatment Mar. 4, 2014
8647910 Masking pastes and processes for manufacturing a partially transparent thin-film photovoltaic panel Feb. 11, 2014
8569182 Methods of fabricating three-dimensional semiconductor device Oct. 29, 2013
8563374 Strained semiconductor devices having asymmetrical heterojunction structures and methods for the fabrication thereof Oct. 22, 2013
8426284 Manufacturing method for semiconductor structure Apr. 23, 2013
8410480 CMOS-MEMS cantilever structure Apr. 2, 2013
8383498 Method for formation of tips Feb. 26, 2013
8329589 Semiconductor device with gate-undercutting recessed region Dec. 11, 2012
8288217 Stressor in planar field effect transistor device Oct. 16, 2012
8241940 Double-sided reusable template for fabrication of semiconductor substrates for photovoltaic cell and microelectronics device manufacturing Aug. 14, 2012
8173462 Manufacturing method of nitride crystalline film, nitride film and substrate structure May. 8, 2012
8173472 Semiconductor sensor and manufacturing method of sensor body for semiconductor sensor May. 8, 2012
8080482 Methods for preparing a semiconductor structure for use in backside illumination applications Dec. 20, 2011
7981804 Manufacturing method of semiconductor device Jul. 19, 2011
7977228 Methods for the formation of interconnects separated by air gaps Jul. 12, 2011
7919415 Process of manufacturing a semiconductor device Apr. 5, 2011
7772108 Interconnection structures for semiconductor devices and methods of forming the same Aug. 10, 2010
7741137 Method of manufacturing electro-optical device Jun. 22, 2010
7544983 MTJ read head with sidewall spacers Jun. 9, 2009
7528072 Crystallographic preferential etch to define a recessed-region for epitaxial growth May. 5, 2009
7473649 Methods for controlling feature dimensions in crystalline substrates Jan. 6, 2009
7422634 Three inch silicon carbide wafer with low warp, bow, and TTV Sep. 9, 2008
7332386 Methods of fabricating fin field transistors Feb. 19, 2008
7294566 Method for forming wiring pattern, method for manufacturing device, device, electro-optic apparatus, and electronic equipment Nov. 13, 2007
7241632 MTJ read head with sidewall spacers Jul. 10, 2007
7235495 Controlled growth of highly uniform, oxide layers, especially ultrathin layers Jun. 26, 2007
7192882 Component for electromagnetic waves and a method for manufacturing the same Mar. 20, 2007
6987068 Methods to planarize semiconductor device and passivation layer Jan. 17, 2006
6927146 Chemical thinning of epitaxial silicon layer over buried oxide Aug. 9, 2005
6924162 Process of manufacturing a semiconductor device Aug. 2, 2005
6872253 Method of forming a semiconductor component Mar. 29, 2005
6810059 Semiconductor laser and method of manufacturing the same Oct. 26, 2004
6605548 Process for etching gallium nitride compound based semiconductors Aug. 12, 2003
6459120 Semiconductor device and manufacturing method of the same Oct. 1, 2002
6333236 Semiconductor device and method for manufacturing same Dec. 25, 2001
6294475 Crystallographic wet chemical etching of III-nitride material Sep. 25, 2001
6156665 Trilayer lift-off process for semiconductor device metallization Dec. 5, 2000
5972236 Etchant, etching method using the same, and related etching apparatus Oct. 26, 1999
5919715 Method for cleaning a semiconductor surface Jul. 6, 1999
5824453 Fabricating method of GaAs substrate having V-shaped grooves Oct. 20, 1998
5770475 Crystal growth method for compound semiconductor Jun. 23, 1998
5723360 Method of processing an epitaxial wafer of InP or the like Mar. 3, 1998
5698063 Intermediate workpiece employing a mask for etching an aperture aligned with the crystal planes in the workpiece substrate Dec. 16, 1997
5484507 Self compensating process for aligning an aperture with crystal planes in a substrate Jan. 16, 1996
5399230 Method and apparatus for etching compound semiconductor Mar. 21, 1995
5272114 Method for cleaving a semiconductor crystal body Dec. 21, 1993
5250471 Method for manufacturing compound semiconductor devices including a step where the semiconductor is etched without exposure to light Oct. 5, 1993
4994142 Eliminating undercutting of mask material when etching semiconductor topography by native oxide removal Feb. 19, 1991
4873558 Group III-V compound field effect transistor with diffusion barrier Oct. 10, 1989

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