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Class Information
Number: 257/E21.219
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than deposition of semiconductor material on a substrate, diffusion or alloying of impurity material, or radiation treatment (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo) > Chemical or electrical treatment, e.g., electrolytic etching (epo) > Chemical etching (epo)
Description: This subclass is indented under subclass E21.215. This subclass is substantially the same in scope as ECLA classification H01L21/306B.

Sub-classes under this class:

Class Number Class Name Patents
257/E21.223 Anisotropic liquid etching (epo) 248
257/E21.22 Etching of group iii-v compound (epo) 152

Patents under this class:
1 2 3 4 5 6 7 8 9

Patent Number Title Of Patent Date Issued
8685836 Method for forming a silicon layer on any substrate using light irradiation Apr. 1, 2014
8674052 Carbazole novolak resin Mar. 18, 2014
8669190 Method for manufacturing semiconductor device and semiconductor wafer Mar. 11, 2014
8647439 Method of epitaxial germanium tin alloy surface preparation Feb. 11, 2014
8642485 Method for fabricating patterned polyimide film and applications thereof Feb. 4, 2014
8629567 Integrated circuit packaging system with contacts and method of manufacture thereof Jan. 14, 2014
8580585 Method and system for controlled isotropic etching on a plurality of etch systems Nov. 12, 2013
8575016 Method for etching gate stack Nov. 5, 2013
8569182 Methods of fabricating three-dimensional semiconductor device Oct. 29, 2013
8558330 Deep well process for MEMS pressure sensor Oct. 15, 2013
8557711 Etching solution composition for metal films Oct. 15, 2013
8557612 Method for fabricating micro and nanostructures in a material Oct. 15, 2013
8557613 Methods for designing, fabricating, and predicting shape formations in a material Oct. 15, 2013
8551875 Pattern forming method Oct. 8, 2013
8546244 Method of manufacturing semiconductor device Oct. 1, 2013
8546872 Nonvolatile semiconductor memory device and method of manufacturing the same Oct. 1, 2013
8530261 Method for producing a component, and sensor element Sep. 10, 2013
8524520 Method for producing a structure comprising a mobile element by means of a heterogeneous sacrificial layer Sep. 3, 2013
8524610 Process for enhancing solubility and reaction rates in supercritical fluids Sep. 3, 2013
8513746 MEMS sensor and method for producing MEMS sensor, and MEMS package Aug. 20, 2013
8513120 Gold-tin etch using combination of halogen plasma and wet etch Aug. 20, 2013
8513038 Method of manufacturing organic electroluminescent device Aug. 20, 2013
8501516 Method for producing micromechanical patterns having a relief-like sidewall outline shape or an adjustable angle of inclination Aug. 6, 2013
8486843 Method of forming nanoscale three-dimensional patterns in a porous material Jul. 16, 2013
8450782 Field effect transistor, method of manufacturing field effect transistor, and method of forming groove May. 28, 2013
8425718 Wet metal-etching method and apparatus for MEMS device fabrication Apr. 23, 2013
8420549 Etching and cleaning methods and etching and cleaning apparatuses used therefor Apr. 16, 2013
8409893 Semiconductor light-emitting element, fabrication method thereof, convex part formed on backing, and convex part formation method for backing Apr. 2, 2013
8409992 Method for producing a polished semiconductor wafer Apr. 2, 2013
8394686 Dry etching method of silicon compound film Mar. 12, 2013
8389412 Finishing method for a silicon on insulator substrate Mar. 5, 2013
8383437 Echtant and method for manufacturing display device using the same Feb. 26, 2013
8366868 Substrate processing apparatus Feb. 5, 2013
8367528 Cyclical epitaxial deposition and etch Feb. 5, 2013
8357567 Manufacturing method of semiconductor device Jan. 22, 2013
8349639 Method for manufacturing image sensor Jan. 8, 2013
8338293 Method of reducing erosion of a metal cap layer during via patterning in semiconductor devices Dec. 25, 2012
8338314 Technique for reducing topography-related irregularities during the patterning of a dielectric material in a contact level of closely spaced transistors Dec. 25, 2012
8334205 Method for removing polymer after etching gate stack structure of high-K gate dielectric/metal gate Dec. 18, 2012
8329595 Process for enhancing solubility and reaction rates in supercritical fluids Dec. 11, 2012
8329547 Semiconductor process for etching a recess into a substrate by using an etchant that contains hydrogen peroxide Dec. 11, 2012
8314022 Method for etching gate stack Nov. 20, 2012
8309381 Group III nitride semiconductor light-emitting device and production method therefor Nov. 13, 2012
8298869 Resin package and production method thereof Oct. 30, 2012
8298924 Method for differential spacer removal by wet chemical etch process and device with differential spacer structure Oct. 30, 2012
8298962 Device made of single-crystal silicon Oct. 30, 2012
8293071 Spin head Oct. 23, 2012
8277570 Method of preventing premature drying Oct. 2, 2012
8257549 Spin head, chuck pin used in the spin head, and method for treating a substrate with the spin head Sep. 4, 2012
8242025 Method for producing semiconductor chip, and field effect transistor and method for manufacturing same Aug. 14, 2012

1 2 3 4 5 6 7 8 9

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