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Class Information
Number: 257/E21.218
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than deposition of semiconductor material on a substrate, diffusion or alloying of impurity material, or radiation treatment (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo) > Chemical or electrical treatment, e.g., electrolytic etching (epo) > Plasma etching; reactive-ion etching (epo)
Description: This subclass is indented under subclass E21.215. This subclass is substantially the same in scope as ECLA classification H01L21/3065.

Patents under this class:
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Patent Number Title Of Patent Date Issued
8709848 Method for etched cavity devices Apr. 29, 2014
8691611 Method for creating a micromechanical membrane structure and MEMS component Apr. 8, 2014
8685860 Semiconductor structure and manufacturing method thereof Apr. 1, 2014
8679359 Low temperature metal etching and patterning Mar. 25, 2014
8680646 Self-aligned carbon electronics with embedded gate electrode Mar. 25, 2014
8669190 Method for manufacturing semiconductor device and semiconductor wafer Mar. 11, 2014
8664123 Method for manufacturing nitride semiconductor substrate Mar. 4, 2014
8647990 Method of patterning a low-K dielectric film Feb. 11, 2014
8642370 Cavity open process to improve undercut Feb. 4, 2014
8633116 Dry etching method Jan. 21, 2014
8628676 Plasma etching method Jan. 14, 2014
8609549 Plasma etching method, plasma etching apparatus, and computer-readable storage medium Dec. 17, 2013
8598037 Silicon etch with passivation using plasma enhanced oxidation Dec. 3, 2013
8598040 ETCH process for 3D flash structures Dec. 3, 2013
8592882 Magnetic random access memory and manufacturing method thereof Nov. 26, 2013
8586446 Manufacturing method of semiconductor device Nov. 19, 2013
8580693 Temperature enhanced electrostatic chucking in plasma processing apparatus Nov. 12, 2013
8574926 Magnetic memory and manufacturing method thereof Nov. 5, 2013
8569177 Plasma processing apparatus and plasma processing method Oct. 29, 2013
8563374 Strained semiconductor devices having asymmetrical heterojunction structures and methods for the fabrication thereof Oct. 22, 2013
8564038 Nonvolatile semiconductor memory device including resistive element Oct. 22, 2013
8557707 Focused ion beam deep nano-patterning apparatus and method Oct. 15, 2013
8557612 Method for fabricating micro and nanostructures in a material Oct. 15, 2013
8557613 Methods for designing, fabricating, and predicting shape formations in a material Oct. 15, 2013
8551886 CMP process for processing STI on two distinct silicon planes Oct. 8, 2013
8546244 Method of manufacturing semiconductor device Oct. 1, 2013
8546265 Method, apparatus and program for manufacturing silicon structure Oct. 1, 2013
8536031 Method of fabricating dual damascene structures using a multilevel multiple exposure patterning scheme Sep. 17, 2013
8536051 Manufacture method for semiconductor device Sep. 17, 2013
8524608 Method for fabricating a patterned structure of a semiconductor device Sep. 3, 2013
8525139 Method and apparatus of halogen removal Sep. 3, 2013
8525304 Semiconductor device Sep. 3, 2013
8518725 Structure manufacturing method and liquid discharge head substrate manufacturing method Aug. 27, 2013
8518830 Plasma etching method and storage medium Aug. 27, 2013
8513134 Semiconductor device producing method Aug. 20, 2013
8501630 Selective etch process for silicon nitride Aug. 6, 2013
8501499 Adaptive recipe selector Aug. 6, 2013
8501631 Plasma processing system control based on RF voltage Aug. 6, 2013
8497214 Semiconductor device manufacturing method Jul. 30, 2013
8492285 Method for plasma texturing Jul. 23, 2013
8486741 Process for etching trenches in an integrated optical device Jul. 16, 2013
8481381 Superior integrity of high-k metal gate stacks by preserving a resist material above end caps of gate electrode structures Jul. 9, 2013
8481393 Semiconductor substrate and method for manufacturing the same, and method for manufacturing semiconductor device Jul. 9, 2013
8475673 Method and apparatus for high aspect ratio dielectric etch Jul. 2, 2013
8476719 Semiconductor device and method of manufacturing the same Jul. 2, 2013
8466069 Method for manufacturing semiconductor device Jun. 18, 2013
8455365 Self-aligned carbon electronics with embedded gate electrode Jun. 4, 2013
8445919 Wafer-level package structure of light emitting diode and manufacturing method thereof May. 21, 2013
8445390 Patterning of antistiction films for electromechanical systems devices May. 21, 2013
8445324 Method of wafer-level fabrication of MEMS devices May. 21, 2013

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