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Class Information
Number: 257/E21.217
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than deposition of semiconductor material on a substrate, diffusion or alloying of impurity material, or radiation treatment (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo) > Chemical or electrical treatment, e.g., electrolytic etching (epo) > Electrolytic etching (epo) > Of group iii-v compound (epo)
Description: This subclass is indented under subclass E21.216. This subclass is substantially the same in scope as ECLA classification H01L21/3063B.

Patents under this class:
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Patent Number Title Of Patent Date Issued
8679922 Method of producing semiconductor device and method of producing solid-state image pickup device Mar. 25, 2014
8647901 Method for forming a nitride semiconductor layer and method for separating the nitride semiconductor layer from the substrate Feb. 11, 2014
8597962 Vertical structure LED current spreading by implanted regions Dec. 3, 2013
8294182 Light emitting device Oct. 23, 2012
8110880 Systems and methods for interconnect metallization using a stop-etch layer Feb. 7, 2012
8101490 Method for manufacturing semiconductor device and apparatus for manufacturing same Jan. 24, 2012
8076245 MOS low power sensor with sacrificial membrane Dec. 13, 2011
8058151 Methods of die sawing Nov. 15, 2011
8053264 Photoelectrochemical etching of P-type semiconductor heterostructures Nov. 8, 2011
8035131 Method for forming a nitride semiconductor laminated structure and method for manufacturing a nitride semiconductor element Oct. 11, 2011
7998877 Diffraction grating in conjunction with reduced thickness to increase efficiency of solar cells Aug. 16, 2011
7884029 Solar cell, solar module and system and fabrication method thereof Feb. 8, 2011
7803715 Lithographic patterning for sub-90nm with a multi-layered carbon-based hardmask Sep. 28, 2010
7732897 Methods of die sawing and structures formed thereby Jun. 8, 2010
7589004 Method for implantation of high dopant concentrations in wide band gap materials Sep. 15, 2009
7585720 Dual stress liner device and method Sep. 8, 2009
7553774 Method of fabricating semiconductor optical device Jun. 30, 2009
7217612 Manufacturing method for a semiconductor device with reduced local current May. 15, 2007
7070702 Pattern formation method using light-induced suppression of etching Jul. 4, 2006
6884740 Photoelectrochemical undercut etching of semiconductor material Apr. 26, 2005
6521118 Semiconductor etching process and apparatus Feb. 18, 2003
6518603 Selective electrochemical process for creating semiconductor nano- and micro-patterns Feb. 11, 2003
6306674 Method for etching multilayer compound semiconductor material Oct. 23, 2001
6284671 Selective electrochemical process for creating semiconductor nano-and micro-patterns Sep. 4, 2001
5773369 Photoelectrochemical wet etching of group III nitrides Jun. 30, 1998
5559058 Method for producing native oxides on compound semiconductors Sep. 24, 1996
5385651 Digital electrochemical etching of compound semiconductors Jan. 31, 1995
5266518 Method of manufacturing a semiconductor body comprising a mesa Nov. 30, 1993
5202018 Process for electrochemical dissolution of semiconductors Apr. 13, 1993
4952446 Ultra-thin semiconductor membranes Aug. 28, 1990
4946735 Ultra-thin semiconductor membranes Aug. 7, 1990
4689125 Fabrication of cleaved semiconductor lasers Aug. 25, 1987
4675086 Method and apparatus for etching integrated optoelectronic devices Jun. 23, 1987
4622114 Process of producing devices with photoelectrochemically produced gratings Nov. 11, 1986
4613417 Semiconductor etching process Sep. 23, 1986
4576691 Etching optical surfaces on GaAs Mar. 18, 1986
4550489 Heterojunction semiconductor Nov. 5, 1985
4482442 Photoelectrochemical etching of n-type gallium arsenide Nov. 13, 1984
4462871 Epitaxial thinning process Jul. 31, 1984
4460910 Heterojunction semiconductor Jul. 17, 1984
4415414 Etching of optical surfaces Nov. 15, 1983
4414066 Electrochemical photoetching of compound semiconductors Nov. 8, 1983
4404072 Photoelectrochemical processing of III-V semiconductors Sep. 13, 1983
4391683 Mask structures for photoetching procedures Jul. 5, 1983
4389291 Photoelectrochemical processing of InP-type devices Jun. 21, 1983
4369099 Photoelectrochemical etching of semiconductors Jan. 18, 1983
4351706 Electrochemically eroding semiconductor device Sep. 28, 1982
4303482 Apparatus and method for selective electrochemical etching Dec. 1, 1981
4247373 Method of making semiconductor device Jan. 27, 1981
4194954 Electrolytic etch preparation of semiconductor surfaces Mar. 25, 1980

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