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Class Information
Number: 257/E21.216
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than deposition of semiconductor material on a substrate, diffusion or alloying of impurity material, or radiation treatment (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo) > Chemical or electrical treatment, e.g., electrolytic etching (epo) > Electrolytic etching (epo)
Description: This subclass is indented under subclass E21.215. This subclass is substantially the same in scope as ECLA classification H01L21/3063.










Sub-classes under this class:

Class Number Class Name Patents
257/E21.217 Of group iii-v compound (epo) 58


Patents under this class:
1 2 3

Patent Number Title Of Patent Date Issued
8685836 Method for forming a silicon layer on any substrate using light irradiation Apr. 1, 2014
8558330 Deep well process for MEMS pressure sensor Oct. 15, 2013
8455314 Transistors comprising high-K metal gate electrode structures and embedded strain-inducing semiconductor alloys formed in a late stage Jun. 4, 2013
8426257 Method for fabricating semiconductor device Apr. 23, 2013
8426235 Method for manufacturing capacitive electromechanical transducer Apr. 23, 2013
8405185 Semiconductor device and semiconductor module including the same Mar. 26, 2013
8159050 Single crystal silicon structures Apr. 17, 2012
7981812 Methods for forming ultra thin structures on a substrate Jul. 19, 2011
7888144 Light-emitting device and method for making the same Feb. 15, 2011
7759138 Silicon microchannel plate devices with smooth pores and precise dimensions Jul. 20, 2010
7709341 Methods of shaping vertical single crystal silicon walls and resulting structures May. 4, 2010
7572661 Method for manufacturing a micromechanical sensor element Aug. 11, 2009
7563625 Method of making light-emitting diodes (LEDs) with improved light extraction by roughening Jul. 21, 2009
7276743 Retaining ring with conductive portion Oct. 2, 2007
7074317 Method for fabricating trench capacitors for large scale integrated semiconductor memories Jul. 11, 2006
6972438 Light emitting diode with porous SiC substrate and method for fabricating Dec. 6, 2005
6964732 Method and apparatus for continuous formation and lift-off of porous silicon layers Nov. 15, 2005
6875673 Method of producing semiconductor device Apr. 5, 2005
6852643 Method for using ammonium fluoride solution in a photoelectrochemical etching process of a silicon wafer Feb. 8, 2005
6818104 Anodizing apparatus Nov. 16, 2004
6790340 Method and apparatus for radiation assisted electrochemical etching and etched product Sep. 14, 2004
6756289 Method of producing semiconductor member and method of producing solar cell Jun. 29, 2004
6750153 Process for producing macroscopic cavities beneath the surface of a silicon wafer Jun. 15, 2004
6746932 Method of reducing the thickness of a silicon substrate Jun. 8, 2004
6693024 Semiconductor component with a semiconductor body having a multiplicity of pores and method for fabricating Feb. 17, 2004
6677183 Method of separation of semiconductor device Jan. 13, 2004
6664169 Process for producing semiconductor member, process for producing solar cell, and anodizing apparatus Dec. 16, 2003
6660654 Fabrication method and apparatus for fabricating a spatial structure in a semiconductor substrate Dec. 9, 2003
6656341 Method of etching, as well as frame element, mask and prefabricated substrate element for use in such etching Dec. 2, 2003
6649485 Method for the formation and lift-off of porous silicon layers Nov. 18, 2003
6617191 Method for anodizing silicon substrates for surface type acceleration sensors Sep. 9, 2003
6559069 Process for the electrochemical oxidation of a semiconductor substrate May. 6, 2003
6521118 Semiconductor etching process and apparatus Feb. 18, 2003
6518603 Selective electrochemical process for creating semiconductor nano- and micro-patterns Feb. 11, 2003
6511915 Electrochemical etching process Jan. 28, 2003
6506658 Method for manufacturing a SOI wafer Jan. 14, 2003
6428620 Substrate processing method and apparatus and SOI substrate Aug. 6, 2002
6426274 Method for making thin film semiconductor Jul. 30, 2002
6417075 Method for producing thin substrate layers Jul. 9, 2002
6376859 Variable porosity porous silicon isolation Apr. 23, 2002
6362079 Semiconductor device and method of anodization for the semiconductor device Mar. 26, 2002
6358861 Manufacturing method of silicon device Mar. 19, 2002
6326280 Thin film semiconductor and method for making thin film semiconductor Dec. 4, 2001
6319370 Apparatus for photoelectrochemical polishing of silicon wafers Nov. 20, 2001
6287936 Method of forming porous silicon in a silicon substrate, in particular for improving the performance of an inductive circuit Sep. 11, 2001
6284670 Method of etching silicon wafer and silicon wafer Sep. 4, 2001
6284671 Selective electrochemical process for creating semiconductor nano-and micro-patterns Sep. 4, 2001
6258240 Anodizing apparatus and method Jul. 10, 2001
6258244 Treating method and apparatus utilizing chemical reaction Jul. 10, 2001
6200878 SOI substrate processing method Mar. 13, 2001

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