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Class Information
Number: 257/E21.205
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Manufacture of electrode on semiconductor body using process other than by epitaxial growth, diffusion of impurities, alloying of impurity materials, or radiation bombardment (epo) > Making electrode structure comprising conductor-insulator-semiconductor, e.g., mis gate (epo) > Insulator formed on silicon semiconductor body (epo) > Characterized by conductor (epo) > Characterized by sectional shape, e.g., t-shape, inverted t, spacer (epo)
Description: This subclass is indented under subclass E21.195. This subclass is substantially the same in scope as ECLA classification H01L21/28E2B20.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7432120 |
Method for realizing a hosting structure of nanometric elements |
Oct. 7, 2008 |
| 7432564 |
Pixel structure |
Oct. 7, 2008 |
| 7387955 |
Field effect transistor and method for manufacturing the same |
Jun. 17, 2008 |
| 7384852 |
Sub-lithographic gate length transistor using self-assembling polymers |
Jun. 10, 2008 |
| 7374989 |
Flash memory and methods of fabricating the same |
May. 20, 2008 |
| 7354821 |
Methods of fabricating trench capacitors with insulating layer collars in undercut regions |
Apr. 8, 2008 |
| 7341920 |
Method for forming a bipolar transistor device with self-aligned raised extrinsic base |
Mar. 11, 2008 |
| 7335542 |
Semiconductor device with mushroom electrode and manufacture method thereof |
Feb. 26, 2008 |
| 7326621 |
Method of fabricating a recess channel array transistor using a mask layer with a high etch selectivity with respect to a silicon substrate |
Feb. 5, 2008 |
| 7282423 |
Method of forming fet with T-shaped gate |
Oct. 16, 2007 |
| 7223645 |
Semiconductor device with mushroom electrode and manufacture method thereof |
May. 29, 2007 |
| 7198996 |
Component built-in module and method for producing the same |
Apr. 3, 2007 |
| 7186607 |
Charge-trapping memory device and method for production |
Mar. 6, 2007 |
| 7176534 |
Low resistance T-gate MOSFET device using a damascene gate process and an innovative oxide removal etch |
Feb. 13, 2007 |
| 7129564 |
Structure and method of forming a notched gate field effect transistor |
Oct. 31, 2006 |
| 7101766 |
Methods of fabricating semiconductor device having T-shaped gate and L-shaped spacer |
Sep. 5, 2006 |
| 7087499 |
Integrated antifuse structure for FINFET and CMOS devices |
Aug. 8, 2006 |
| 7074684 |
Elevated source drain disposable spacer CMOS |
Jul. 11, 2006 |
| 7064400 |
Semiconductor device and process for producing the same |
Jun. 20, 2006 |
| 7064020 |
Method of manufacturing a semiconductor device having a gate electrode with a three layer structure |
Jun. 20, 2006 |
| 7045845 |
Self-aligned vertical gate semiconductor device |
May. 16, 2006 |
| 7041585 |
Process for producing an integrated electronic component |
May. 9, 2006 |
| 7041552 |
Integrated metal-insulator-metal capacitor and metal gate transistor |
May. 9, 2006 |
| 7034354 |
Semiconductor structure with lining layer partially etched on sidewall of the gate |
Apr. 25, 2006 |
| 7026202 |
Inverse-T gate structure using damascene processing |
Apr. 11, 2006 |
| 7018914 |
Method of enlarging contact area of a gate electrode, semiconductor device having a surface-enlarged gate electrode, and method of manufacturing the same |
Mar. 28, 2006 |
| 7005710 |
Transistors having controlled conductive spacers, uses of such transistors and methods of making such transistors |
Feb. 28, 2006 |
| 6995434 |
Semiconductor device and method of fabricating the same |
Feb. 7, 2006 |
| 6987038 |
Method for fabricating MOS field effect transistor |
Jan. 17, 2006 |
| 6979634 |
Manufacturing method for semiconductor device having a T-type gate electrode |
Dec. 27, 2005 |
| 6977415 |
Semiconductor device including a gate insulating film on a recess and source and drain extension regions |
Dec. 20, 2005 |
| 6974743 |
Method of making encapsulated spacers in vertical pass gate DRAM and damascene logic gates |
Dec. 13, 2005 |
| 6955990 |
Methods for forming a gate in a semiconductor device |
Oct. 18, 2005 |
| 6953972 |
Complementary metal oxide semiconductor transistor technology using selective epitaxy of a strained silicon germanium layer |
Oct. 11, 2005 |
| 6943400 |
Semiconductor device and its manufacturing method |
Sep. 13, 2005 |
| 6933620 |
Semiconductor component and method of manufacture |
Aug. 23, 2005 |
| 6930030 |
Method of forming an electronic device on a recess in the surface of a thin film of silicon etched to a precise thickness |
Aug. 16, 2005 |
| 6927110 |
Method of manufacturing a semiconductor device |
Aug. 9, 2005 |
| 6927459 |
Semiconductor device having a gate electrode with a sidewall insulating film and manufacturing method thereof |
Aug. 9, 2005 |
| 6924191 |
Method for fabricating a gate structure of a field effect transistor |
Aug. 2, 2005 |
| 6921940 |
MOS transistor and fabrication method thereof |
Jul. 26, 2005 |
| 6914009 |
Method of making small transistor lengths |
Jul. 5, 2005 |
| 6909114 |
Semiconductor device having LDD regions |
Jun. 21, 2005 |
| 6909145 |
Metal spacer gate for CMOS FET |
Jun. 21, 2005 |
| 6905976 |
Structure and method of forming a notched gate field effect transistor |
Jun. 14, 2005 |
| 6894357 |
Gate stack for high performance sub-micron CMOS devices |
May. 17, 2005 |
| 6894368 |
Microelectronic device fabricating method, method of forming a pair of conductive device components of different base widths from a common deposited conductive layer, and integrated circuitry |
May. 17, 2005 |
| 6891235 |
FET with T-shaped gate |
May. 10, 2005 |
| 6887764 |
Method for producing a gate structure for an MOS transistor |
May. 3, 2005 |
| 6884669 |
Hatted polysilicon gate structure for improving salicide performance and method of forming the same |
Apr. 26, 2005 |
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