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Class Information
Number: 257/E21.193
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Manufacture of electrode on semiconductor body using process other than by epitaxial growth, diffusion of impurities, alloying of impurity materials, or radiation bombardment (epo) > Making electrode structure comprising conductor-insulator-semiconductor, e.g., mis gate (epo) > Insulator formed on silicon semiconductor body (epo) > Characterized by insulator (epo) > On single crystalline silicon (epo)
Description: This subclass is indented under subclass E21.192. This subclass is substantially the same in scope as ECLA classification H01L21/28E2C2.

Sub-classes under this class:

Class Number Class Name Patents
257/E21.194 Characterized by treatment after formation of definitive gate conductor (epo) 258

Patents under this class:

Patent Number Title Of Patent Date Issued
8647988 Memory device and method of fabricating the same Feb. 11, 2014
8415728 Memory device and method of fabricating the same Apr. 9, 2013
8389995 Epitaxial solid-state semiconducting heterostructures and method for making same Mar. 5, 2013
8053837 Semiconductor device Nov. 8, 2011
8030713 Semiconductor device Oct. 4, 2011
7994570 Semiconductor device and method of manufacturing the same Aug. 9, 2011
7972974 Gallium lanthanide oxide films Jul. 5, 2011
7964916 Method for fabrication of a semiconductor device and structure Jun. 21, 2011
7897467 Semiconductor integrated circuit device and manufacturing method thereof Mar. 1, 2011
7816736 Method of manufacturing a semiconductor device Oct. 19, 2010
7812340 Strained-silicon-on-insulator single-and double-gate MOSFET and method for forming the same Oct. 12, 2010
7795160 ALD of metal silicate films Sep. 14, 2010
7741677 Semiconductor integrated circuit device and manufacturing method thereof Jun. 22, 2010
7662720 3-Dimensional flash memory device and method of fabricating the same Feb. 16, 2010
7645709 Methods for low temperature oxidation of a semiconductor device Jan. 12, 2010
7642177 Method of manufacturing nanowire Jan. 5, 2010
7557048 Methods of forming semiconductor constructions Jul. 7, 2009
7514758 Dual-oxide transistors for the improvement of reliability and off-state leakage Apr. 7, 2009
7459720 Single crystal wafer and solar battery cell Dec. 2, 2008
7429539 Nitriding method of gate oxide film Sep. 30, 2008
7405131 Method and structure to prevent silicide strapping of source/drain to body in semiconductor devices with source/drain stressor Jul. 29, 2008
7365027 ALD of amorphous lanthanide doped TiO.sub.x films Apr. 29, 2008
7361613 Semiconductor device, manufacture and evaluation methods for semiconductor device, and process condition evaluation method Apr. 22, 2008
7348222 Method for manufacturing a thin film transistor and method for manufacturing a semiconductor device Mar. 25, 2008
7320943 Capacitor with hafnium, lanthanum and oxygen mixed dielectric and method for fabricating the same Jan. 22, 2008
7282415 Method for making a semiconductor device with strain enhancement Oct. 16, 2007
7282403 Temperature stable metal nitride gate electrode Oct. 16, 2007
7268047 Semiconductor device and method for manufacturing the same Sep. 11, 2007
7250375 Substrate processing method and material for electronic device Jul. 31, 2007
7238625 Method for processing a semiconductor device comprising a silicon-oxy-nitride dielectric layer Jul. 3, 2007
7235448 Dielectric layer forming method and devices formed therewith Jun. 26, 2007
7232772 Substrate processing method Jun. 19, 2007
7232731 Method for fabricating transistor of semiconductor device Jun. 19, 2007
7205217 Method for forming trench gate dielectric layer Apr. 17, 2007
7195961 SOI structure comprising substrate contacts on both sides of the box, and method for the production of such a structure Mar. 27, 2007
7192887 Semiconductor device with nitrogen in oxide film on semiconductor substrate and method of manufacturing the same Mar. 20, 2007
7189662 Methods of forming semiconductor constructions Mar. 13, 2007
7189623 Semiconductor processing method and field effect transistor Mar. 13, 2007
7176094 Ultra-thin gate oxide through post decoupled plasma nitridation anneal Feb. 13, 2007
7169716 Photosensitive lacquer for providing a coating on a semiconductor substrate or a mask Jan. 30, 2007
7163901 Methods for forming thin film layers by simultaneous doping and sintering Jan. 16, 2007
7160818 Semiconductor device and method for fabricating same Jan. 9, 2007
7151299 Semiconductor device and its manufacturing method Dec. 19, 2006
7135421 Atomic layer-deposited hafnium aluminum oxide Nov. 14, 2006
7115456 Sequential lateral solidification device and method of crystallizing silicon using the same Oct. 3, 2006
7109131 System and method for hydrogen-rich selective oxidation Sep. 19, 2006
7105411 Methods of forming a transistor gate Sep. 12, 2006
7067434 Hydrogen free integration of high-k gate dielectrics Jun. 27, 2006
7064052 Method of processing a transistor gate dielectric film with stem Jun. 20, 2006
7064058 Low-temperature growth high-quality ultra-thin praseodymium gate dieletrics Jun. 20, 2006

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