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Class Information
Number: 257/E21.192
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Manufacture of electrode on semiconductor body using process other than by epitaxial growth, diffusion of impurities, alloying of impurity materials, or radiation bombardment (epo) > Making electrode structure comprising conductor-insulator-semiconductor, e.g., mis gate (epo) > Insulator formed on silicon semiconductor body (epo) > Characterized by insulator (epo)
Description: This subclass is indented under subclass E21.191. This subclass is substantially the same in scope as ECLA classification H01L21/28E2C.










Sub-classes under this class:

Class Number Class Name Patents
257/E21.193 On single crystalline silicon (epo) 1,052


Patents under this class:
1 2

Patent Number Title Of Patent Date Issued
8502326 Gate dielectric formation for high-voltage MOS devices Aug. 6, 2013
8431469 Method for depinning the Fermi level of a semiconductor at an electrical junction and devices incorporating such junctions Apr. 30, 2013
8431471 Method for integrating a non-volatile memory (NVM) Apr. 30, 2013
8426302 Method of manufacturing semiconductor device Apr. 23, 2013
8410554 Method, structure and design structure for customizing history effects of SOI circuits Apr. 2, 2013
8350314 Semiconductor memory device and method for fabricating semiconductor memory device Jan. 8, 2013
8349695 Work function adjustment in high-k gate stacks including gate dielectrics of different thickness Jan. 8, 2013
8318565 High-k dielectric gate structures resistant to oxide growth at the dielectric/silicon substrate interface and methods of manufacture thereof Nov. 27, 2012
8299569 Semiconductor device and method of cutting electrical fuse Oct. 30, 2012
8158480 Method of forming a pattern for a semiconductor device, method of forming a charge storage pattern using the same method, non-volatile memory device and methods of manufacturing the same Apr. 17, 2012
8119510 Manufacturing method of semiconductor device Feb. 21, 2012
8105930 Method of forming dielectric including dysprosium and scandium by atomic layer deposition and integrated circuit device including the dielectric layer Jan. 31, 2012
7981786 Method of fabricating non-volatile memory device having charge trapping layer Jul. 19, 2011
7973397 Package substrate having embedded semiconductor chip and fabrication method thereof Jul. 5, 2011
7968956 Semiconductor device Jun. 28, 2011
7964513 Method to form ultra high quality silicon-containing compound layers Jun. 21, 2011
7923378 Film formation method and apparatus for forming silicon-containing insulating film Apr. 12, 2011
7884003 Method for depinning the fermi level of a semiconductor at an electrical junction and devices incorporating such junctions Feb. 8, 2011
7863157 Method and structure for fabricating solar cells using a layer transfer process Jan. 4, 2011
7833891 Semiconductor device manufacturing method using oxygen diffusion barrier layer between buried oxide layer and high K dielectric layer Nov. 16, 2010
7824943 Methods for trapping charge in a microelectromechanical system and microelectromechanical system employing same Nov. 2, 2010
7824991 Method for nitridation of the interface between a dielectric and a substrate in a MOS device Nov. 2, 2010
7723240 Methods of low temperature oxidation May. 25, 2010
7655099 High-k dielectric film, method of forming the same and related semiconductor device Feb. 2, 2010
7651953 Method to form ultra high quality silicon-containing compound layers Jan. 26, 2010
7622401 Method of producing insulator thin film, insulator thin film, method of manufacturing semiconductor device, and semiconductor device Nov. 24, 2009
7528434 Production process for a semiconductor component with a praseodymium oxide dielectric May. 5, 2009
7456042 Microelectromechanical systems having stored charge and methods for fabricating and using same Nov. 25, 2008
7432183 Methods of manufacturing a thin film including zirconium titanium oxide and methods of manufacturing a gate structure, a capacitor and a flash memory device including the same Oct. 7, 2008
7416907 Semiconductor device and method for forming the same Aug. 26, 2008
7371637 Oxide-nitride stack gate dielectric May. 13, 2008
7348644 Semiconductor device and method of manufacturing semiconductor device Mar. 25, 2008
7300838 Semiconductor device and method of manufacturing semiconductor device Nov. 27, 2007
7297641 Method to form ultra high quality silicon-containing compound layers Nov. 20, 2007
7294582 Low temperature silicon compound deposition Nov. 13, 2007
7217582 Method for non-damaging charge injection and a system thereof May. 15, 2007
7205217 Method for forming trench gate dielectric layer Apr. 17, 2007
7169673 Atomic layer deposited nanolaminates of HfO.sub.2/ZrO.sub.2 films as gate dielectrics Jan. 30, 2007
7153780 Method and apparatus for self-aligned MOS patterning Dec. 26, 2006
6960812 Method of forming an oxide film Nov. 1, 2005
6759711 Method of manufacturing a transistor Jul. 6, 2004
6686264 Methods of forming binary noncrystalline oxide analogs of silicon dioxide Feb. 3, 2004
6680261 Method of reducing boron outgassing at trench power IC's oxidation process for sacrificial oxide layer Jan. 20, 2004
6635589 Methods of heat treatment and heat treatment apparatus for silicon oxide films Oct. 21, 2003
6586346 Method of forming an oxide film Jul. 1, 2003
6563154 Polysilicon layer having improved roughness after POCl3 doping May. 13, 2003
6559014 Preparation of composite high-K / standard-K dielectrics for semiconductor devices May. 6, 2003
6552403 Binary non-crystalline oxide analogs of silicon dioxide for use in gate dielectrics Apr. 22, 2003
6534421 Method to fabricate thin insulating film Mar. 18, 2003
6528358 Semiconductor device and method for fabricating the same Mar. 4, 2003

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