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Class Information
Number: 257/E21.176
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Manufacture of electrode on semiconductor body using process other than by epitaxial growth, diffusion of impurities, alloying of impurity materials, or radiation bombardment (epo) > Manufacture or post-treatment of electrode having a capacitive structure, i.e., gate structure for field-effect device (epo)
Description: This subclass is indented under subclass E21.158. This subclass is substantially the same in scope as ECLA classification H01L21/28B.

Sub-classes under this class:

Class Number Class Name Patents
257/E21.188 Heterojunction gate structure (epo) 3
257/E21.177 Mos-gate structure (epo) 80
257/E21.184 Pn-homojunction gate structure (epo) 2
257/E21.186 Schottky gate structure (epo) 10

Patents under this class:

Patent Number Title Of Patent Date Issued
8673729 finFET eDRAM strap connection structure Mar. 18, 2014
8617953 Memory having a vertical access device Dec. 31, 2013
8586439 Inversion mode varactor Nov. 19, 2013
8564040 Inversion mode varactor Oct. 22, 2013
8384155 Semiconductor capacitor Feb. 26, 2013
8338291 Producing transistor including multiple reentrant profiles Dec. 25, 2012
8207053 Electrodes of transistors with at least two linear-shaped conductive structures of different length Jun. 26, 2012
8198633 Stress transfer enhancement in transistors by a late gate re-crystallization Jun. 12, 2012
8158517 Method for manufacturing wiring substrate, thin film transistor, display device and television device Apr. 17, 2012
8129819 Method of fabricating integrated circuit including at least six linear-shaped conductive structures at equal pitch including at least two linear-shaped conductive structures having non-gate po Mar. 6, 2012
8088682 Method for fabricating integrated circuit with gate electrode level region including two side-by-side ones of at least three linear-shaped conductive structures electrically connected to each Jan. 3, 2012
8088681 Method for fabricating integrated circuit including separated diffusion regions of different type each having four gate electrodes with each of two complementary gate electrode pairs formed fr Jan. 3, 2012
8088680 Method for fabricating integrated circuit having at least three linear-shaped gate electrode level conductive features of equal length positioned side-by-side at equal pitch Jan. 3, 2012
8088679 Method for fabricating integrated circuit with gate electrode level portion including at least two complementary transistor forming linear conductive segments and at least one non-gate linear Jan. 3, 2012
7923788 Semiconductor device Apr. 12, 2011
7892957 Gate CD trimming beyond photolithography Feb. 22, 2011
7875540 Method for manufacturing recess gate in a semiconductor device Jan. 25, 2011
7842572 Methods of manufacturing semiconductor devices with local recess channel transistors Nov. 30, 2010
7833853 Method of defining gate structure height for semiconductor devices Nov. 16, 2010
7807558 Method of fabricating a semiconductor device Oct. 5, 2010
7749833 Semiconductor MOS transistor device and method for making the same Jul. 6, 2010
7741170 Dielectric structure in nonvolatile memory device and method for fabricating the same Jun. 22, 2010
7727870 Method of making a semiconductor device using a stressor Jun. 1, 2010
7723221 Stacked film patterning method and gate electrode forming method May. 25, 2010
7678676 Method for fabricating semiconductor device with recess gate Mar. 16, 2010
7662689 Strained transistor integration for CMOS Feb. 16, 2010
7625813 Method of fabricating recess channel in semiconductor device Dec. 1, 2009
7592271 Method of fabricating a flash memory device Sep. 22, 2009
7586150 Semiconductor devices with local recess channel transistors and methods of manufacturing the same Sep. 8, 2009
7579241 Semiconductor device and method of manufacture thereof Aug. 25, 2009
7579265 Method for manufacturing recess gate in a semiconductor device Aug. 25, 2009
7544594 Method of forming a transistor having gate protection and transistor formed according to the method Jun. 9, 2009
7538017 Method of manufacturing a thin film transistor, a thin film transistor manufactured by the method, a method of manufacturing flat panel display device, and a flat panel display device manufact May. 26, 2009
7485948 Front-end processing of nickel plated bond pads Feb. 3, 2009
7482256 Semiconductor device and method of manufacturing the same Jan. 27, 2009
7449402 Method of fabricating semiconductor device Nov. 11, 2008
7422969 Multi-step process for patterning a metal gate electrode Sep. 9, 2008
7355225 Semiconductor device and method for providing a reduced surface area electrode Apr. 8, 2008
7344908 Atomic force microscope cantilever including field effect transistor and method for manufacturing the same Mar. 18, 2008
7329581 Field effect transistor (FET) devices and methods of manufacturing FET devices Feb. 12, 2008
7323403 Multi-step process for patterning a metal gate electrode Jan. 29, 2008
7256114 Process for oxide cap formation in semiconductor manufacturing Aug. 14, 2007
7176136 Semiconductor device fabrication method Feb. 13, 2007
7160776 Methods of forming a gate structure of a non-volatile memory device and apparatus for performing the same Jan. 9, 2007
7153752 Methods for forming capacitors and contact holes of semiconductor devices simultaneously Dec. 26, 2006
7115504 Method of forming electrode structure for use in an integrated circuit Oct. 3, 2006
7087508 Method of improving short channel effect and gate oxide reliability by nitrogen plasma treatment before spacer deposition Aug. 8, 2006
7087499 Integrated antifuse structure for FINFET and CMOS devices Aug. 8, 2006

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