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Class Information
Number: 257/E21.157
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Alloying of impurity material, e.g., doping material, electrode material, with a semiconductor body (epo) > Alloying of electrode material (epo) > With group iii-v compound (epo)
Description: This subclass is indented under subclass E21.156. This subclass is substantially the same in scope as ECLA classification H01L21/24C2.










Patents under this class:

Patent Number Title Of Patent Date Issued
8633569 AlN inter-layers in III-N material grown on REO/silicon substrate Jan. 21, 2014
8415180 Method for fabricating wafer product and method for fabricating gallium nitride based semiconductor optical device Apr. 9, 2013
8119492 Dissolving precipates in alloy material in capacitor structure Feb. 21, 2012
7964424 Method for manufacturing nitride semiconductor light-emitting element Jun. 21, 2011
7939352 Selective area metal bonding Si-based laser May. 10, 2011
7186632 Method of fabricating a semiconductor device having a decreased concentration of phosphorus impurities in polysilicon Mar. 6, 2007
6858522 Electrical contact for compound semiconductor device and method for forming same Feb. 22, 2005
6486050 Method of manufacturing III-nitride semiconductor devices Nov. 26, 2002
4916411 Variable frequency jitter generator Apr. 10, 1990
4307131 Method of manufacturing metal-semiconductor contacts exhibiting high injected current density Dec. 22, 1981
4075044 Method of producing a siliceous cover layer on a semiconductor element by centrifugal coating utilizing a mixture of silica emulsions Feb. 21, 1978











 
 
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