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Browse by Category: Main > Physics
Class Information
Number: 257/E21.143
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Diffusion of impurity material, e.g., doping material, electrode material, into or out of a semiconductor body, or between semiconductor regions; interactions between two or more impurities; redistribution of impurities (epo) > Using diffusion into or out of a solid from or into a gaseous phase (epo) > From or into plasma phase (epo)
Description: This subclass is indented under subclass E21.141. This subclass is substantially the same in scope as ECLA classification H01L21/223E.










Patents under this class:
1 2 3

Patent Number Title Of Patent Date Issued
8680524 Method of arranging pads in semiconductor device, semiconductor memory device using the method, and processing system having mounted therein the semiconductor memory device Mar. 25, 2014
8536051 Manufacture method for semiconductor device Sep. 17, 2013
8524619 Method for fabricating semiconductor device including performing oxygen plasma treatment Sep. 3, 2013
8513134 Semiconductor device producing method Aug. 20, 2013
8501631 Plasma processing system control based on RF voltage Aug. 6, 2013
8450745 EL display device May. 28, 2013
8431468 Noise reduction in semiconductor devices Apr. 30, 2013
8421076 Insulating substrate for semiconductor apparatus, semiconductor apparatus, and method for manufacturing semiconductor apparatus Apr. 16, 2013
8404573 Plasma processing method and apparatus Mar. 26, 2013
8288259 Plasma processing method and apparatus Oct. 16, 2012
8216922 Plasma doping method Jul. 10, 2012
8207046 Method for producing semiconductor device and semiconductor device produced by same method Jun. 26, 2012
8183571 EL display device and method for manufacturing the same May. 22, 2012
8124507 Semiconductor device and method for fabricating the same Feb. 28, 2012
7981779 Method for making junction and processed material formed using the same Jul. 19, 2011
7955911 TFT-LCD pixel unit and method for manufacturing the same Jun. 7, 2011
7952103 EL display device and method for manufacturing the same May. 31, 2011
7947531 Combinatorial evaluation of dry semiconductor processes May. 24, 2011
7923353 Gettering method and a wafer using the same Apr. 12, 2011
7919775 Semiconductor device and method comprising a high voltage reset driver and an isolated memory array Apr. 5, 2011
7910497 Method of forming dielectric layers on a substrate and apparatus therefor Mar. 22, 2011
7864257 Thin film transistor and method of manufacturing the same Jan. 4, 2011
7858537 Plasma processing method and apparatus Dec. 28, 2010
7846823 Masking paste, method of manufacturing same, and method of manufacturing solar cell using masking paste Dec. 7, 2010
7829463 Plasma processing method and plasma processing apparatus Nov. 9, 2010
7820533 Multi-step plasma doping with improved dose control Oct. 26, 2010
7811916 Method for isotropic doping of a non-planar surface exposed in a void Oct. 12, 2010
7754503 Method for producing semiconductor device and semiconductor producing apparatus Jul. 13, 2010
7723219 Plasma immersion ion implantation process with reduced polysilicon gate loss and reduced particle deposition May. 25, 2010
7687330 TFT-LCD pixel structure and manufacturing method thereof Mar. 30, 2010
7670865 Image sensor pixel having photodiode with multi-dopant implantation Mar. 2, 2010
7655929 Ion beam measuring method and ion implanting apparatus Feb. 2, 2010
7601619 Method and apparatus for plasma processing Oct. 13, 2009
7598184 Plasma composition for selective high-k etch Oct. 6, 2009
7547619 Method of introducing impurity, device and element Jun. 16, 2009
7514373 Method and apparatus for plasma nitridation of gate dielectrics using amplitude modulated radio-frequency energy Apr. 7, 2009
7494904 Plasma-assisted doping Feb. 24, 2009
7476556 Systems and methods for plasma processing of microfeature workpieces Jan. 13, 2009
7465978 Field effect transistor with a high breakdown voltage and method of manufacturing the same Dec. 16, 2008
7459704 Ion source configuration for production of ionized clusters, ionized molecules and ionized mono-atoms Dec. 2, 2008
7442623 Method for manufacturing bonded substrate and bonded substrate manufactured by the method Oct. 28, 2008
7405484 Semiconductor device containing stacked semiconductor chips and manufacturing method thereof Jul. 29, 2008
7303967 Method for fabricating transistor of semiconductor device Dec. 4, 2007
7303982 Plasma immersion ion implantation process using an inductively coupled plasma source having low dissociation and low minimum plasma voltage Dec. 4, 2007
7247879 Semiconductor integrated circuit device having particular testing pad arrangement Jul. 24, 2007
7199064 Plasma processing method and apparatus Apr. 3, 2007
7144808 Integration flow to prevent delamination from copper Dec. 5, 2006
7060599 Method of forming shallow doped junctions having a variable profile gradation of dopants Jun. 13, 2006
6984552 Method for doping semiconductor layer, method for producing thin film semiconductor element and thin film semiconductor element Jan. 10, 2006
6955991 Atmospheric process and system for controlled and rapid removal of polymers from high depth to width aspect ratio holes Oct. 18, 2005

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