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Class Information
Number: 257/E21.123
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Deposition of semiconductor material on substrate, e.g., epitaxial growth, solid phase epitaxy (epo) > Characterized by the substrate (epo) > Bonding of semiconductor wafer to insulating substrate or to semic onducting substrate using an intermediate insulating layer (epo) > Substrate is crystalline semiconductor material, e.g., lattice adaptation, heteroepitaxy (epo)
Description: This subclass is indented under subclass E21.119. This subclass is substantially the same in scope as ECLA classification H01L21/20B6.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7449734 |
Junction semiconductor device and method for manufacturing the same |
Nov. 11, 2008 |
| 7442589 |
System and method for uniform multi-plane silicon oxide layer formation for optical applications |
Oct. 28, 2008 |
| 7416917 |
Method of fabricating electroluminescent display |
Aug. 26, 2008 |
| 7315064 |
Bonded wafer and method of producing bonded wafer |
Jan. 1, 2008 |
| 7217635 |
Process for preparing a bonding type semiconductor substrate |
May. 15, 2007 |
| 7195941 |
Optical devices and methods to construct the same |
Mar. 27, 2007 |
| 6677249 |
Method for manufacturing breakaway layers for detaching deposited layer systems |
Jan. 13, 2004 |
| 6673646 |
Growth of compound semiconductor structures on patterned oxide films and process for fabricating same |
Jan. 6, 2004 |
| 6593211 |
Semiconductor substrate and method for producing the same |
Jul. 15, 2003 |
| 6583436 |
Strain-engineered, self-assembled, semiconductor quantum dot lattices |
Jun. 24, 2003 |
| 6486042 |
Methods of forming compound semiconductor layers using spaced trench arrays and semiconductor substrates formed thereby |
Nov. 26, 2002 |
| 6461944 |
Methods for growth of relatively large step-free SiC crystal surfaces |
Oct. 8, 2002 |
| 6261929 |
Methods of forming a plurality of semiconductor layers using spaced trench arrays |
Jul. 17, 2001 |
| 6258637 |
Method for thin film deposition on single-crystal semiconductor substrates |
Jul. 10, 2001 |
| 6254794 |
Etching solution for etching porous silicon, etching method using the etching solution and method of preparing semiconductor member using the etching solution |
Jul. 3, 2001 |
| 6171512 |
Etching solution for etching porous silicon, etching method using the etching solution and method of preparing semiconductor member using the etching solution |
Jan. 9, 2001 |
| 6107113 |
Method of relaxing a stressed film by melting an interface layer |
Aug. 22, 2000 |
| 6107197 |
Method of removing a carbon-contaminated layer from a silicon substrate surface for subsequent selective silicon epitaxial growth thereon and apparatus for selective silicon epitaxial growth |
Aug. 22, 2000 |
| 5993538 |
Method of forming single-crystalline thin film using beam irradiating method |
Nov. 30, 1999 |
| 5980631 |
Method for manufacturing III-V semiconductor layers containing nitrogen |
Nov. 9, 1999 |
| 5920795 |
Method for manufacturing semiconductor device |
Jul. 6, 1999 |
| 5895248 |
Manufacture of a semiconductor device with selectively deposited semiconductor zone |
Apr. 20, 1999 |
| 5882401 |
Method for manufacturing silicon single crystal substrate for use of epitaxial layer growth |
Mar. 16, 1999 |
| 5872022 |
Method for etching a semiconductor method for fabricating semiconductor device method for fabricating semiconductor laser and semiconductor laser |
Feb. 16, 1999 |
| 5861058 |
Composite structure and method for the production thereof |
Jan. 19, 1999 |
| 5834363 |
Method of manufacturing semiconductor wafer, semiconductor wafer manufactured by the same, semiconductor epitaxial wafer, and method of manufacturing the semiconductor epitaxial wafer |
Nov. 10, 1998 |
| 5814150 |
Method of and apparatus for forming single-crystalline thin film, beam irradiator, beam irradiating method and beam reflecting device |
Sep. 29, 1998 |
| 5795385 |
Method of forming single-crystalline thin film by beam irradiator |
Aug. 18, 1998 |
| 5780343 |
Method of producing high quality silicon surface for selective epitaxial growth of silicon |
Jul. 14, 1998 |
| 5776253 |
Apparatus for forming single-crystalline thin film by beam irradiator and beam reflecting device |
Jul. 7, 1998 |
| 5767020 |
Etching solution for etching porous silicon, etching method using the etching solution and method of preparing semiconductor member using the etching solution |
Jun. 16, 1998 |
| 5735949 |
Method of producing electronic, electrooptical and optical components |
Apr. 7, 1998 |
| 5714765 |
Method of fabricating a compositional semiconductor device |
Feb. 3, 1998 |
| 5693139 |
Growth of doped semiconductor monolayers |
Dec. 2, 1997 |
| 5637145 |
Method of vapor phase epitaxial growth |
Jun. 10, 1997 |
| 5635414 |
Low cost method of fabricating shallow junction, Schottky semiconductor devices |
Jun. 3, 1997 |
| 5599389 |
Compound semiconductor and method of manufacturing the same |
Feb. 4, 1997 |
| 5552330 |
Resonant tunneling fet and methods of fabrication |
Sep. 3, 1996 |
| 5503657 |
Process for the separation of a gaseous hydride or a mixture of gaseous hydrides with the aid of a membrane |
Apr. 2, 1996 |
| 5500388 |
Heat treatment process for wafers |
Mar. 19, 1996 |
| 5476811 |
Method of growing epitaxial layers |
Dec. 19, 1995 |
| 5436191 |
Quantum wire fabrication via photo induced evaporation enhancement during in situ epitaxial growth |
Jul. 25, 1995 |
| 5427055 |
Method for controlling roughness on surface of monocrystal |
Jun. 27, 1995 |
| 5415128 |
Rotation induced superlattice |
May. 16, 1995 |
| 5405803 |
Method of manufacturing a semiconductor device |
Apr. 11, 1995 |
| 5399522 |
Method of growing compound semiconductor |
Mar. 21, 1995 |
| 5397736 |
Liquid epitaxial process for producing three-dimensional semiconductor structures |
Mar. 14, 1995 |
| 5388548 |
Method of fabricating optoelectronic components |
Feb. 14, 1995 |
| 5372658 |
Disordered crystalline semiconductor |
Dec. 13, 1994 |
| 5362972 |
Semiconductor device using whiskers |
Nov. 8, 1994 |
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