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Class Information
Number: 257/E21.122
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Deposition of semiconductor material on substrate, e.g., epitaxial growth, solid phase epitaxy (epo) > Characterized by the substrate (epo) > Bonding of semiconductor wafer to insulating substrate or to semic onducting substrate using an intermediate insulating layer (epo)
Description: This subclass is indented under subclass E21.119. This subclass is substantially the same in scope as ECLA classification H01L21/20B2.


Sub-classes under this class:

Class Number Class Name Patents
257/E21.123 Substrate is crystalline semiconductor material, e.g., lattice adaptation, heteroepitaxy (epo) 142


Patents under this class:
1 2 3 4 5 6 7 8 9

Patent Number Title Of Patent Date Issued
5603779 Bonded wafer and method of fabrication thereof Feb. 18, 1997
5597410 Method to make a SOI wafer for IC manufacturing Jan. 28, 1997
5591678 Process of manufacturing a microelectric device using a removable support substrate and etch-stop Jan. 7, 1997
5588994 Method of producing sheets of crystalline material and devices made therefrom Dec. 31, 1996
5589083 Method of manufacturing microstructure by the anisotropic etching and bonding of substrates Dec. 31, 1996
5569620 Bonded wafer processing with metal silicidation Oct. 29, 1996
5556503 Apparatus for thinning a semiconductor film on an insulating film Sep. 17, 1996
5549747 Method of producing sheets of crystalline material and devices made therefrom Aug. 27, 1996
5540785 Fabrication of defect free silicon on an insulating substrate Jul. 30, 1996
5536354 Solid phase bonding method Jul. 16, 1996
5517047 Bonded wafer processing May. 14, 1996
5514235 Method of making bonded wafers May. 7, 1996
5504376 Stacked-type semiconductor device Apr. 2, 1996
5488012 Silicon on insulator with active buried regions Jan. 30, 1996
5478408 SOI substrate and manufacturing method therefor Dec. 26, 1995
5468674 Method for forming low and high minority carrier lifetime layers in a single semiconductor structure Nov. 21, 1995
5462883 Method of fabricating defect-free silicon on an insulating substrate Oct. 31, 1995
5459335 Semiconductor substrate having a thin film semiconductor layer bonded on a support substrate through an adhesive layer Oct. 17, 1995
5459104 Process for production of semiconductor substrate Oct. 17, 1995
5441591 Silicon to sapphire bond Aug. 15, 1995
5441911 Silicon carbide wafer bonded to a silicon wafer Aug. 15, 1995
5413951 Composite semiconductor substrate and a fabrication process thereof May. 9, 1995
5414276 Transistors using crystalline silicon devices on glass May. 9, 1995
5407856 Direct substrate bonding Apr. 18, 1995
5401983 Processes for lift-off of thin film materials or devices for fabricating three dimensional integrated circuits, optical detectors, and micromechanical devices Mar. 28, 1995
5399231 Method of forming crystalline silicon devices on glass Mar. 21, 1995
5395788 Method of producing semiconductor substrate Mar. 7, 1995
5387555 Bonded wafer processing with metal silicidation Feb. 7, 1995
5383993 Method of bonding semiconductor substrates Jan. 24, 1995
5376579 Schemes to form silicon-on-diamond structure Dec. 27, 1994
5373184 SOI/semiconductor heterostructure fabrication by wafer bonding Dec. 13, 1994
5366923 Bonded wafer structure having a buried insulation layer Nov. 22, 1994
5367189 Vertical semiconductor device Nov. 22, 1994
5362682 Method of producing sheets of crystalline material and devices made therefrom Nov. 8, 1994
5362667 Bonded wafer processing Nov. 8, 1994
5355022 Stacked-type semiconductor device Oct. 11, 1994
5349207 Silicon carbide wafer bonded to a silicon wafer Sep. 20, 1994
5346848 Method of bonding silicon and III-V semiconductor materials Sep. 13, 1994
5344524 SOI substrate fabrication Sep. 6, 1994
5340435 Bonded wafer and method of manufacturing it Aug. 23, 1994
5334273 Wafer bonding using trapped oxidizing vapor Aug. 2, 1994
5328549 Method of producing sheets of crystalline material and devices made therefrom Jul. 12, 1994
5323059 Vertical current flow semiconductor device utilizing wafer bonding Jun. 21, 1994
5318652 Wafer bonding enhancement technique Jun. 7, 1994
5310446 Method for producing semiconductor film May. 10, 1994
5308779 Method of making high mobility integrated drivers for active matrix displays May. 3, 1994
5307433 Optical connection member of silicon and method for the manufacture thereof Apr. 26, 1994
5295395 Diaphragm-based-sensors Mar. 22, 1994
5286671 Fusion bonding technique for use in fabricating semiconductor devices Feb. 15, 1994
5284803 Metod of manufacturing a semiconductor body using a carrier wafer and a monocrystalline semiconducting top layer Feb. 8, 1994

1 2 3 4 5 6 7 8 9


 
 
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