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Class Information
Number: 257/E21.101
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Deposition of semiconductor material on substrate, e.g., epitaxial growth, solid phase epitaxy (epo) > Using reduction or decomposition of gaseous compound yielding solid condensate, i.e., chemical deposition (epo)
Description: This subclass is indented under subclass E21.09. This subclass is substantially the same in scope as ECLA classification H01L21/205.










Sub-classes under this class:

Class Number Class Name Patents
257/E21.107 Deposition of diamond (epo) 11
257/E21.108 Epitaxial deposition of group iii-v compound (epo) 322
257/E21.102 Epitaxial deposition of group iv elements, e.g., si, ge, c (epo) 233


Patents under this class:
1 2 3 4 5 6 7 8 9 10 11

Patent Number Title Of Patent Date Issued
6576534 Method for forming a semiconductor Jun. 10, 2003
6569765 Hybrid deposition system and methods May. 27, 2003
6559037 Process for producing semiconductor device having crystallized film formed from deposited amorphous film May. 6, 2003
6514803 Process for making an amorphous silicon thin film semiconductor device Feb. 4, 2003
6506451 Composite structure and process for producing it Jan. 14, 2003
6503771 Semiconductor photoelectrically sensitive device Jan. 7, 2003
6488776 Method and apparatus for forming insitu boron doped polycrystalline and amorphous silicon films Dec. 3, 2002
6479373 Method of structuring layers with a polysilicon layer and an overlying metal or metal silicide layer using a three step etching process with fluorine, chlorine, bromine containing gases Nov. 12, 2002
6479166 Large area polysilicon films with predetermined stress characteristics and method for producing same Nov. 12, 2002
6475627 Semiconductor wafer and vapor growth apparatus Nov. 5, 2002
6472296 Fabrication of photovoltaic cell by plasma process Oct. 29, 2002
6468885 Deposition of device quality, low hydrogen content, hydrogenated amorphous silicon at high deposition rates Oct. 22, 2002
6465045 Low stress polysilicon film and method for producing same Oct. 15, 2002
6461444 Method and apparatus for manufacturing semiconductor device Oct. 8, 2002
6455400 Semiconductor processing methods of forming silicon layers Sep. 24, 2002
6455372 Nucleation for improved flash erase characteristics Sep. 24, 2002
6447850 Polycrystalline silicon thin film forming method Sep. 10, 2002
6427622 Hot wire chemical vapor deposition method and apparatus using graphite hot rods Aug. 6, 2002
6410090 Method and apparatus for forming insitu boron doped polycrystalline and amorphous silicon films Jun. 25, 2002
6403479 Process for producing semiconductor and apparatus for production Jun. 11, 2002
6403443 Method for reducing surface humps of doped amorphous silicon layer Jun. 11, 2002
6399411 Method for forming non-single-crystal semiconductor thin film, and method for producing photovoltaic device Jun. 4, 2002
6391690 Thin film semiconductor device and method for producing the same May. 21, 2002
6387736 Method and structure for bonding layers in a semiconductor device May. 14, 2002
6383897 Apparatus for manufacturing a semiconductor device in a CVD reactive chamber May. 7, 2002
6376340 Methods for forming polycrystalline silicon film Apr. 23, 2002
6355941 Semiconductor device Mar. 12, 2002
6338990 Method for fabricating thin-film transistor Jan. 15, 2002
6335542 Fabrication method for a thin film semiconductor device, the thin film semiconductor device itself, liquid crystal display, and electronic device Jan. 1, 2002
6323140 Method of manufacturing semiconductor wafer Nov. 27, 2001
6322631 Heat treatment method and its apparatus Nov. 27, 2001
6309906 Photovoltaic cell and method of producing that cell Oct. 30, 2001
6306183 Method of forming manufacturing semiconductor device Oct. 23, 2001
6306776 Catalytic breakdown of reactant gases in chemical vapor deposition Oct. 23, 2001
6294219 Method of annealing large area glass substrates Sep. 25, 2001
6287635 High rate silicon deposition method at low pressures Sep. 11, 2001
6287943 Deposition of semiconductor layer by plasma process Sep. 11, 2001
6277657 Apparatus for fabricating semiconductor device and fabrication method therefor Aug. 21, 2001
6274461 Method for depositing layers of high quality semiconductor material Aug. 14, 2001
6274509 Global planarization method for inter-layer-dielectric and inter-metal dielectric Aug. 14, 2001
6271062 Thin film semiconductor device including a semiconductor film with high field-effect mobility Aug. 7, 2001
6268068 Low stress polysilicon film and method for producing same Jul. 31, 2001
6265288 Method of manufacturing silicon-based thin-film photoelectric conversion device Jul. 24, 2001
6261705 Poly-si film and a semiconductor device wherein the poly-si film is applied Jul. 17, 2001
6245647 Method for fabrication of thin film Jun. 12, 2001
6238935 Silicon-on-insulator wafer having conductive layer for detection with electrical sensors May. 29, 2001
6218702 Microcrystal silicon film and its manufacturing method, and photoelectric conversion device and its manufacturing method Apr. 17, 2001
6218257 Method of forming semiconductor memory device Apr. 17, 2001
6214706 Hot wire chemical vapor deposition method and apparatus using graphite hot rods Apr. 10, 2001
6211081 Method of manufacturing a semiconductor device in a CVD reactive chamber Apr. 3, 2001

1 2 3 4 5 6 7 8 9 10 11










 
 
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