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Class Information
Number: 257/E21.101
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Deposition of semiconductor material on substrate, e.g., epitaxial growth, solid phase epitaxy (epo) > Using reduction or decomposition of gaseous compound yielding solid condensate, i.e., chemical deposition (epo)
Description: This subclass is indented under subclass E21.09. This subclass is substantially the same in scope as ECLA classification H01L21/205.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7407869 |
Method for manufacturing a free-standing substrate made of monocrystalline semiconductor material |
Aug. 5, 2008 |
| 7365028 |
Methods of forming metal oxide and semimetal oxide |
Apr. 29, 2008 |
| 7351668 |
Film formation method and apparatus for semiconductor process |
Apr. 1, 2008 |
| 7329554 |
Reactive codoping of GaAlInP compound semiconductors |
Feb. 12, 2008 |
| 7208412 |
Method of forming metal oxide and semimetal oxide |
Apr. 24, 2007 |
| 7192888 |
Low selectivity deposition methods |
Mar. 20, 2007 |
| 7183208 |
Methods for treating pluralities of discrete semiconductor substrates |
Feb. 27, 2007 |
| 7153726 |
Semiconductor device with magnetically permeable heat sink |
Dec. 26, 2006 |
| 7135389 |
Irradiation method of laser beam |
Nov. 14, 2006 |
| 7074641 |
Method of forming silicon-based thin film, silicon-based thin film, and photovoltaic element |
Jul. 11, 2006 |
| 7041342 |
Thin-film solar cells and method of making |
May. 9, 2006 |
| 7011866 |
Method and apparatus for film deposition |
Mar. 14, 2006 |
| 7001831 |
Method for depositing a film on a substrate using Cat-PACVD |
Feb. 21, 2006 |
| 6998675 |
Nucleation for improved flash erase characteristics |
Feb. 14, 2006 |
| 6974766 |
In situ deposition of a low .kappa. dielectric layer, barrier layer, etch stop, and anti-reflective coating for damascene application |
Dec. 13, 2005 |
| 6972433 |
Fabrication method for a thin film semiconductor device, the thin film semiconductor device itself, liquid crystal display, and electronic device |
Dec. 6, 2005 |
| 6967384 |
Structure and method for ultra-small grain size polysilicon |
Nov. 22, 2005 |
| 6958253 |
Process for deposition of semiconductor films |
Oct. 25, 2005 |
| 6951826 |
Silicon carbide deposition for use as a low dielectric constant anti-reflective coating |
Oct. 4, 2005 |
| 6926876 |
Plasma production of polycrystalline silicon |
Aug. 9, 2005 |
| 6924212 |
Method for forming a semiconductor |
Aug. 2, 2005 |
| 6913986 |
Method and apparatus for fabricating a thin film and thin film transistor and method of fabricating same |
Jul. 5, 2005 |
| 6911369 |
Discontinuity prevention for SiGe deposition |
Jun. 28, 2005 |
| 6900115 |
Deposition over mixed substrates |
May. 31, 2005 |
| 6900463 |
Semiconductor device |
May. 31, 2005 |
| 6897559 |
Silicon-based thin film forming apparatus, silicon-based thin film forming method and semiconductor element |
May. 24, 2005 |
| 6884705 |
Semiconductor device having hetero grain stack gate and method of forming the same |
Apr. 26, 2005 |
| 6875674 |
Method of manufacturing a semiconductor device with fluorine concentration |
Apr. 5, 2005 |
| 6872972 |
Method for forming silicon film with changing grain size by thermal process |
Mar. 29, 2005 |
| 6864161 |
Method of forming a gate structure using a dual step polysilicon deposition procedure |
Mar. 8, 2005 |
| 6821825 |
Process for deposition of semiconductor films |
Nov. 23, 2004 |
| 6814811 |
Semiconductor wafer and vapor phase growth apparatus |
Nov. 9, 2004 |
| 6808965 |
Methodology for fabricating a thin film transistor, including an LDD region, from amorphous semiconductor film deposited at 530.degree. C. or less using low pressure chemical vapor deposition |
Oct. 26, 2004 |
| 6808986 |
Method of forming nanocrystals in a memory device |
Oct. 26, 2004 |
| 6803080 |
Method of forming crystalline silicon film by CVD |
Oct. 12, 2004 |
| 6786997 |
Plasma processing apparatus |
Sep. 7, 2004 |
| 6784103 |
Method of formation of nanocrystals on a semiconductor structure |
Aug. 31, 2004 |
| 6780464 |
Thermal gradient enhanced CVD deposition at low pressure |
Aug. 24, 2004 |
| 6764883 |
Amorphous and polycrystalline silicon nanolaminate |
Jul. 20, 2004 |
| 6762451 |
Nucleation for improved flash erase characteristics |
Jul. 13, 2004 |
| 6750474 |
Semiconducting devices and method of making thereof |
Jun. 15, 2004 |
| 6743738 |
Dopant precursors and processes |
Jun. 1, 2004 |
| 6743700 |
Semiconductor film, semiconductor device and method of their production |
Jun. 1, 2004 |
| 6737123 |
Silicon-based film formation process, silicon-based film, semiconductor device, and silicon-based film formation system |
May. 18, 2004 |
| 6726955 |
Method of controlling the crystal structure of polycrystalline silicon |
Apr. 27, 2004 |
| 6723613 |
Method of forming an isolated-grain rugged polysilicon surface via a temperature ramping step |
Apr. 20, 2004 |
| 6723421 |
Semiconductor with coordinatively irregular structures |
Apr. 20, 2004 |
| 6716713 |
Dopant precursors and ion implantation processes |
Apr. 6, 2004 |
| 6716751 |
Dopant precursors and processes |
Apr. 6, 2004 |
| 6706336 |
Silicon-based film, formation method therefor and photovoltaic element |
Mar. 16, 2004 |
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