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Class Information
Number: 257/E21.097
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Deposition of semiconductor material on substrate, e.g., epitaxial growth, solid phase epitaxy (epo) > Using physical deposition, e.g., vacuum deposition, sputtering (epo) > Epitaxial deposition of group iii-v compound (epo)
Description: This subclass is indented under subclass E21.091. This subclass is substantially the same in scope as ECLA classification H01L21/203C.


Sub-classes under this class:

Class Number Class Name Patents
257/E21.099 Deposition on insulating or metallic substrate (epo) 13
257/E21.098 Deposition on semiconductor substrate not being an group iii-v compound (epo) 15
257/E21.1 Doping during epitaxial deposition (epo) 24


Patents under this class:
1 2 3

Patent Number Title Of Patent Date Issued
7439165 Method of fabricating tensile strained layers and compressive strain layers for a CMOS device Oct. 21, 2008
7407865 Epitaxial growth method Aug. 5, 2008
7399692 III-nitride semiconductor fabrication Jul. 15, 2008
7361576 Defect reduction of non-polar and semi-polar III-Nitrides with sidewall lateral epitaxial overgrowth (SLEO) Apr. 22, 2008
7332417 Semiconductor structures with structural homogeneity Feb. 19, 2008
7288430 Method of fabricating heteroepitaxial microstructures Oct. 30, 2007
7253499 III-V group nitride system semiconductor self-standing substrate, method of making the same and III-V group nitride system semiconductor wafer Aug. 7, 2007
7250360 Single step, high temperature nucleation process for a lattice mismatched substrate Jul. 31, 2007
7245017 Liquid discharge head and manufacturing method thereof Jul. 17, 2007
7220658 Growth of reduced dislocation density non-polar gallium nitride by hydride vapor phase epitaxy May. 22, 2007
7208393 Growth of planar reduced dislocation density m-plane gallium nitride by hydride vapor phase epitaxy Apr. 24, 2007
7125735 Method of fabricating semiconductor device Oct. 24, 2006
6953703 Method of making a semiconductor device with exposure of sapphire substrate to activated nitrogen Oct. 11, 2005
6921726 Growing smooth semiconductor layers Jul. 26, 2005
6856005 Semiconductor device having a nitride-based hetero-structure and method of manufacturing the same Feb. 15, 2005
6830949 Method for producing group-III nitride compound semiconductor device Dec. 14, 2004
6821806 Method for forming compound semiconductor layer and compound semiconductor apparatus Nov. 23, 2004
6787010 Non-thermionic sputter material transport device, methods of use, and materials produced thereby Sep. 7, 2004
6784085 MIIIN based materials and methods and apparatus for producing same Aug. 31, 2004
6692568 Method and apparatus for producing MIIIN columns and MIIIN materials grown thereon Feb. 17, 2004
6642070 Electrically pumped long-wavelength VCSEL and methods of fabrication Nov. 4, 2003
6596079 III-V nitride substrate boule and method of making and using the same Jul. 22, 2003
6521042 Semiconductor growth method Feb. 18, 2003
6489175 Electrically pumped long-wavelength VCSEL and methods of fabrication Dec. 3, 2002
6486044 Band gap engineering of amorphous Al-Ga-N alloys Nov. 26, 2002
6447604 METHOD FOR ACHIEVING IMPROVED EPITAXY QUALITY (SURFACE TEXTURE AND DEFECT DENSITY) ON FREE-STANDING (ALUMINUM, INDIUM, GALLIUM) NITRIDE ((AL,IN,GA)N) SUBSTRATES FOR OPTO-ELECTRONIC AND ELECTRO Sep. 10, 2002
6368983 Multi-layer wafer fabrication Apr. 9, 2002
6242326 Method for fabricating compound semiconductor substrate having quantum dot array structure Jun. 5, 2001
6197441 Cubic nitride semiconductor device and fabrication method of the same Mar. 6, 2001
6123768 Method for the preparation and doping of highly insulating monocrystalline gallium nitride thin films Sep. 26, 2000
5985025 Semiconductor growth method Nov. 16, 1999
5948161 Method of fabricating a semiconductor device and method of cleaning a crystalline semiconductor surface Sep. 7, 1999
5945690 Compound semiconductor device Aug. 31, 1999
5827751 Method of making semiconductor components, in particular on GaAs of InP, with the substrate being recovered chemically Oct. 27, 1998
5763291 Method of making semiconductor laser Jun. 9, 1998
5762706 Method of forming compound semiconductor device Jun. 9, 1998
5759264 Method for vapor-phase growth Jun. 2, 1998
5725674 Device and method for epitaxially growing gallium nitride layers Mar. 10, 1998
5648666 Double-epitaxy heterojunction bipolar transistors for high speed performance Jul. 15, 1997
5625204 Compound semiconductors and a method for thin film growth Apr. 29, 1997
5603765 Method of growing high breakdown voltage allnas layers in InP devices by low temperature molecular beam epitaxy Feb. 18, 1997
5602418 Nitride based semiconductor device and manufacture thereof Feb. 11, 1997
5593917 Method of making semiconductor components with electrochemical recovery of the substrate Jan. 14, 1997
5491106 Method for growing a compound semiconductor and a method for producing a semiconductor laser Feb. 13, 1996
5484664 Hetero-epitaxially grown compound semiconductor substrate Jan. 16, 1996
5441913 Process of making a semiconductor epitaxial substrate Aug. 15, 1995
5436468 Ordered mixed crystal semiconductor superlattice device Jul. 25, 1995
5415128 Rotation induced superlattice May. 16, 1995
5385862 Method for the preparation and doping of highly insulating monocrystalline gallium nitride thin films Jan. 31, 1995
5367980 Method of producing defect-free perfect surfaces Nov. 29, 1994

1 2 3


 
 
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