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Class Information
Number: 257/E21.082
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising cuprous oxide (cu 2 o) or cuprous iodide (cui) (epo) > Preparation of substrate, preliminary treatment oxidation of substrate, reduction treatment (epo) > Oxidation and subsequent heat treatment of substrate (epo)
Description: This subclass is indented under subclass E21.079. This subclass is substantially the same in scope as ECLA classification H01L21/16B3.










Patents under this class:

Patent Number Title Of Patent Date Issued
8501636 Method for fabricating silicon dioxide layer Aug. 6, 2013
8450219 Method of fabricating Al2O3 thin film layer May. 28, 2013
8445336 Method of fabricating polycrystalline silicon, TFT fabricated using the same, method of fabricating the TFT, and organic light emitting diode display device including the TFT May. 21, 2013
8354349 Semiconductor device having sealing film and manufacturing method thereof Jan. 15, 2013
8288184 Production method of semiconductor device and semiconductor device Oct. 16, 2012
8247301 Substrate and manufacturing method therefor Aug. 21, 2012
8236596 Diffusion furnaces employing ultra low mass transport systems and methods of wafer rapid diffusion processing Aug. 7, 2012
8211778 Forming isolation regions for integrated circuits Jul. 3, 2012
8198104 Method of manufacturing a semiconductor device Jun. 12, 2012
8163659 Method for oxide film formation and apparatus for the method Apr. 24, 2012
8158487 Annealing process for annealing a structure Apr. 17, 2012
8138064 Method for producing silicon film-transferred insulator wafer Mar. 20, 2012
7977254 Method of forming a gate insulator in group III-V nitride semiconductor devices Jul. 12, 2011
7939454 Module and lamination process for multijunction cells May. 10, 2011
7892934 SOI substrate and method for manufacturing SOI substrate Feb. 22, 2011
7884012 Void-free copper filling of recessed features for semiconductor devices Feb. 8, 2011
7736963 Method of forming a gate structure for a semiconductor device and method of forming a cell gate structure for a non-volatile memory device Jun. 15, 2010
7727780 Substrate processing method and semiconductor manufacturing apparatus Jun. 1, 2010
7687364 Low-k isolation spacers for conductive regions Mar. 30, 2010
7645619 Magnetic random access memory device and method of forming the same Jan. 12, 2010
7622402 Method for forming underlying insulation film Nov. 24, 2009
7563628 Fabrication of optical waveguide devices Jul. 21, 2009
7550328 Method for production of thin-film semiconductor device Jun. 23, 2009
7446000 Method of fabricating semiconductor device having gate dielectrics with different thicknesses Nov. 4, 2008
7410854 Method of making FUSI gate and resulting structure Aug. 12, 2008
7381631 Use of expanding material oxides for nano-fabrication Jun. 3, 2008
7372090 Magnetic random access memory device and method of forming the same May. 13, 2008
7288430 Method of fabricating heteroepitaxial microstructures Oct. 30, 2007
7205231 Method for in-situ uniformity optimization in a rapid thermal processing system Apr. 17, 2007
7157383 Method for forming silicon dioxide film on silicon substrate, method for forming oxide film on semiconductor substrate, and method for producing semiconductor device Jan. 2, 2007
7141513 Integrated ashing and implant annealing method using ozone Nov. 28, 2006











 
 
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