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Class Information
Number: 257/E21.079
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising cuprous oxide (cu 2 o) or cuprous iodide (cui) (epo) > Preparation of substrate, preliminary treatment oxidation of substrate, reduction treatment (epo)
Description: This subclass is indented under subclass E21.078. This subclass is substantially the same in scope as ECLA classification H01L21/16B.










Sub-classes under this class:

Class Number Class Name Patents
257/E21.083 Application of specified conductive layer (epo) 1
257/E21.082 Oxidation and subsequent heat treatment of substrate (epo) 31
257/E21.08 Preliminary treatment of foundation plate (epo) 5
257/E21.081 Reduction of copper oxide, treatment of oxide layer (epo) 9


Patents under this class:

Patent Number Title Of Patent Date Issued
8643155 Liquid crystal display and chip on film thereof Feb. 4, 2014
8501636 Method for fabricating silicon dioxide layer Aug. 6, 2013
8378471 Semiconductor chip bump connection apparatus and method Feb. 19, 2013
8163626 Enhancing NAND flash floating gate performance Apr. 24, 2012
8158487 Annealing process for annealing a structure Apr. 17, 2012
8119444 Method for manufacturing the image sensor Feb. 21, 2012
8110503 Surface preparation for thin film growth by enhanced nucleation Feb. 7, 2012
8043981 Dual frequency low temperature oxidation of a semiconductor device Oct. 25, 2011
8011319 Method for oxidizing a layer, and associated holding devices for a substrate Sep. 6, 2011
8004027 Image sensor and manufacturing method thereof Aug. 23, 2011
7972933 Method of selective nitridation Jul. 5, 2011
7927914 Manufacturing method for semiconductor photoelectrochemical cell and semiconductor photoelectrochemical cell Apr. 19, 2011
7910495 Plasma oxidizing method, plasma processing apparatus, and storage medium Mar. 22, 2011
7838400 Rapid thermal oxide passivated solar cell with improved junction Nov. 23, 2010
7838443 Method for minimizing the corner effect by densifying the insulating layer Nov. 23, 2010
7696091 Method of forming a silicon layer and method of manufacturing a display substrate by using the same Apr. 13, 2010
7670939 Semiconductor chip bump connection apparatus and method Mar. 2, 2010
7615499 Method for oxidizing a layer, and associated holding devices for a substrate Nov. 10, 2009
7482262 Method of manufacturing semiconductor device Jan. 27, 2009
7381631 Use of expanding material oxides for nano-fabrication Jun. 3, 2008
7259112 Method for minimizing corner effect by densifying the insulating layer Aug. 21, 2007
7141513 Integrated ashing and implant annealing method using ozone Nov. 28, 2006
7129185 Substrate processing method and a computer readable storage medium storing a program for controlling same Oct. 31, 2006
7122488 High density plasma process for the formation of silicon dioxide on silicon carbide substrates Oct. 17, 2006











 
 
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