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Class Information
Number: 257/E21.061
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising silicon carbide (sic) (epo) > Making electrode (epo)
Description: This subclass is indented under subclass E21.054. This subclass is substantially the same in scope as ECLA classification H01L21/04H10.










Sub-classes under this class:

Class Number Class Name Patents
257/E21.063 Conductor-insulator-semiconductor electrode, e.g., mis contact (epo) 49
257/E21.062 Ohmic electrode (epo) 69
257/E21.064 Schottky electrode (epo) 39


Patents under this class:

Patent Number Title Of Patent Date Issued
8643085 High-voltage-resistant semiconductor component having vertically conductive semiconductor body areas and a trench structure Feb. 4, 2014
8274145 Semiconductor package system with patterned mask over thermal relief Sep. 25, 2012
8242006 Smooth electrode and method of fabricating same Aug. 14, 2012
8043949 Method of manufacturing silicon carbide semiconductor device Oct. 25, 2011
7989284 DRAM cell transistor device and method Aug. 2, 2011
7875518 Semiconductor device having silicon layer in a gate electrode Jan. 25, 2011
7858507 Method and system for creating photosensitive array with integrated backplane Dec. 28, 2010
7829957 Semiconductor device and manufacturing method thereof Nov. 9, 2010
7586173 Method and apparatus for using flex circuit technology to create a reference electrode channel Sep. 8, 2009
7566612 Method of fabricating capacitor in semiconductor device and semiconductor device using the same Jul. 28, 2009
7498259 Through electrode and method for forming the same Mar. 3, 2009
7244992 Turn-on-efficient bipolar structures with deep N-well for on-chip ESD protection Jul. 17, 2007
7214615 Method of manufacturing semiconductor device, semiconductor device, circuit substrate and electronic apparatus May. 8, 2007
7190016 Capacitor structure Mar. 13, 2007
7008886 Process for treatment of the surface of a semiconducting material, particularly using hydrogen, and surface obtained using this process Mar. 7, 2006
6905916 Method for processing a surface of an SiC semiconductor layer and Schottky contact Jun. 14, 2005
6544674 Stable electrical contact for silicon carbide devices Apr. 8, 2003
6410460 Technology for thermodynamically stable contacts for binary wide band gap semiconductors Jun. 25, 2002











 
 
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