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Class Information
Number: 257/E21.049
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising carbon, e.g., diamond, diamond-like carbon (epo) > Multistep processes for manufacture of device whose active layer, e.g., base, channel, comprises semiconducting carbon, e.g., diamond, diamond-like carbon (epo)
Description: This subclass is indented under subclass E21.041. This subclass is substantially the same in scope as ECLA classification H01L21/04D40.


Sub-classes under this class:

Class Number Class Name Patents
257/E21.05 Device controllable only by electric current supplied or the electric potential applied to electrode which does not carry current to be rectified, amplified, or switched, e.g., three-terminal devices such as source, drain, and gate terminals; emitter, base, collector terminals (epo) 10
257/E21.052 Device controllable only by variation of electric current supplied or the electric potential applied to electrodes carrying current to be rectified, amplified, oscillated, or switched, e.g., two-terminal device (epo) 3


Patents under this class:

Patent Number Title Of Patent Date Issued
7588990 Dynamic surface annealing of implanted dopants with low temperature HDPCVD process for depositing a high extinction coefficient optical absorber layer Sep. 15, 2009
7557378 Boron aluminum nitride diamond heterostructure Jul. 7, 2009
7553693 Method for making a field effect transistor with diamond-like carbon channel and resulting transistor Jun. 30, 2009
7541234 Methods of fabricating integrated circuit transistors by simultaneously removing a photoresist layer and a carbon-containing layer on different active areas Jun. 2, 2009
7485536 Abrupt junction formation by atomic layer epitaxy of in situ delta doped dopant diffusion barriers Feb. 3, 2009
7394103 All diamond self-aligned thin film transistor Jul. 1, 2008
7390947 Forming field effect transistors from conductors Jun. 24, 2008
7282425 Structure and method of integrating compound and elemental semiconductors for high-performance CMOS Oct. 16, 2007



 
 
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