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Class Information
Number: 257/E21.039
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Making mask on semicond uctor body for further photolithographic processing (epo) > Comprising inorganic layer (epo) > Characterized by their size, orientation, disposition, behavior, shape, in horizontal or vertical plane (epo) > Process specially adapted to improve the resolution of the mask (epo)
Description: This subclass is indented under subclass E21.036. This subclass is substantially the same in scope as ECLA classification H01L21/033F6.

Patents under this class:
1 2 3 4

Patent Number Title Of Patent Date Issued
8664077 Method for forming self-aligned overlay mark Mar. 4, 2014
8642428 Semiconductor device including line-type active region and method for manufacturing the same Feb. 4, 2014
8629064 Multiple patterning lithography using spacer and self-aligned assist patterns Jan. 14, 2014
8563439 Method of pitch dimension shrinkage Oct. 22, 2013
8557675 Methods of patterning features in a structure using multiple sidewall image transfer technique Oct. 15, 2013
8486840 Inverse spacer processing Jul. 16, 2013
8450833 Spacer double patterning that prints multiple CD in front-end-of-line May. 28, 2013
8420499 Concave-convex pattern forming method and magnetic tunnel junction element forming method Apr. 16, 2013
8361904 Semiconductor device having fine pattern wiring lines integrally formed with contact plug and method of manufacturing same Jan. 29, 2013
8338959 Simplified pitch doubling process flow Dec. 25, 2012
8216949 Method for integrated circuit fabrication using pitch multiplication Jul. 10, 2012
8163190 Method for fabricating a fine pattern Apr. 24, 2012
8114306 Method of forming sub-lithographic features using directed self-assembly of polymers Feb. 14, 2012
8071487 Patterning method using stacked structure Dec. 6, 2011
8030222 Structures with increased photo-alignment margins Oct. 4, 2011
8018070 Semiconductor device, method for manufacturing semiconductor devices and mask systems used in the manufacturing of semiconductor devices Sep. 13, 2011
7989346 Surface treatment of silicon Aug. 2, 2011
7897522 Method and system for improving particle beam lithography Mar. 1, 2011
7884022 Multiple deposition for integration of spacers in pitch multiplication process Feb. 8, 2011
7855148 Methods of isolating array features during pitch doubling processes and semiconductor device structures having isolated array features Dec. 21, 2010
7846812 Methods of forming trench isolation and methods of forming floating gate transistors Dec. 7, 2010
7825031 Method of fabricating a semiconductor device Nov. 2, 2010
7732343 Simplified pitch doubling process flow Jun. 8, 2010
7727838 Method to improve transistor Tox using high-angle implants with no additional masks Jun. 1, 2010
7727825 Polyconductor line end formation and related mask Jun. 1, 2010
7718530 Method for manufacturing semiconductor device May. 18, 2010
7718081 Techniques for the use of amorphous carbon (APF) for various etch and litho integration schemes May. 18, 2010
7713882 Patterning method for a semiconductor substrate May. 11, 2010
7709390 Methods of isolating array features during pitch doubling processes and semiconductor device structures having isolated array features May. 4, 2010
7704882 Semiconductor devices using fine patterns and methods of forming fine patterns Apr. 27, 2010
7687408 Method for integrated circuit fabrication using pitch multiplication Mar. 30, 2010
7622336 Manufacturing method of semiconductor device Nov. 24, 2009
7608541 Method of forming fine pattern, liquid crystal display device having a fine pattern and fabricating method thereof Oct. 27, 2009
7608542 Large-size glass substrate for photomask and making method, computer-readable recording medium, and mother glass exposure method Oct. 27, 2009
7605006 Method of manufacturing a magnetic head Oct. 20, 2009
7553771 Method of forming pattern of semiconductor device Jun. 30, 2009
7544521 Negative bias critical dimension trim Jun. 9, 2009
7510973 Method for forming fine pattern in semiconductor device Mar. 31, 2009
7507674 Memory device including resistance change layer as storage node and method(s) for making the same Mar. 24, 2009
7498257 Methods for metal ARC layer formation Mar. 3, 2009
7495347 Ion implantation with multiple concentration levels Feb. 24, 2009
7476610 Removable spacer Jan. 13, 2009
7465615 Polyconductor line end formation and related mask Dec. 16, 2008
7396781 Method and apparatus for adjusting feature size and position Jul. 8, 2008
7381654 Method for fabricating right-angle holes in a substrate Jun. 3, 2008
7361588 Etch process for CD reduction of arc material Apr. 22, 2008
7351666 Layout and process to contact sub-lithographic structures Apr. 1, 2008
7316978 Method for forming recesses Jan. 8, 2008
7314824 Nitrogen-free ARC/capping layer and method of manufacturing the same Jan. 1, 2008
7179748 Method for forming recesses Feb. 20, 2007

1 2 3 4

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