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Class Information
Number: 257/E21.035
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Making mask on semicond uctor body for further photolithographic processing (epo) > Comprising inorganic layer (epo) > Characterized by their composition, e.g., multilayer masks, materials (epo)
Description: This subclass is indented under subclass E21.033. This subclass is substantially the same in scope as ECLA classification H01L21/033D.










Patents under this class:
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Patent Number Title Of Patent Date Issued
8637363 Methods of manufacturing a semiconductor device having a node array Jan. 28, 2014
8563371 Method of forming semiconductor device Oct. 22, 2013
8492259 Method of forming metal gate structure Jul. 23, 2013
8445379 Method of manufacturing semiconductor device May. 21, 2013
8420499 Concave-convex pattern forming method and magnetic tunnel junction element forming method Apr. 16, 2013
8383504 Method for providing electrical connections to spaced conductive lines Feb. 26, 2013
8309413 Methods of forming capacitors Nov. 13, 2012
8309460 Methods of manufacturing semiconductor devices Nov. 13, 2012
8278156 Spacer double patterning for lithography operations Oct. 2, 2012
8258052 Method of manufacturing silicon carbide semiconductor device Sep. 4, 2012
8252699 Composite removable hardmask Aug. 28, 2012
8241823 Method of fabrication of a semiconductor device having reduced pitch Aug. 14, 2012
8211760 Method for producing a transistor gate with sub-photolithographic dimensions Jul. 3, 2012
8193018 Patterning method for light-emitting devices Jun. 5, 2012
8153512 Patterning techniques Apr. 10, 2012
8114306 Method of forming sub-lithographic features using directed self-assembly of polymers Feb. 14, 2012
8071487 Patterning method using stacked structure Dec. 6, 2011
8030156 Methods of forming DRAM arrays Oct. 4, 2011
8030712 Method for manufacturing high-stability resistors, such as high ohmic poly resistors, integrated on a semiconductor substrate Oct. 4, 2011
8021983 Method of forming pattern of inorganic material film comprising thermally induced cracking Sep. 20, 2011
7989355 Method of pitch halving Aug. 2, 2011
7985682 Method of fabricating semiconductor device Jul. 26, 2011
7935639 Process for increasing feature density during the manufacture of a semiconductor device May. 3, 2011
7915160 Methods for forming small contacts Mar. 29, 2011
7902035 Semiconductor device having multiple fin heights Mar. 8, 2011
7893479 Deep trench in a semiconductor structure Feb. 22, 2011
7883945 Array substrate and method of manufacturing the same Feb. 8, 2011
7867925 Method for manufacturing pattern formed structure Jan. 11, 2011
7867911 Method for forming pattern using hard mask Jan. 11, 2011
7825000 Method for integration of magnetic random access memories with improved lithographic alignment to magnetic tunnel junctions Nov. 2, 2010
7804148 Opto-thermal mask including aligned thermal dissipative layer, reflective layer and transparent capping layer Sep. 28, 2010
7786469 Thermal sensor with a silicon/germanium superlattice structure Aug. 31, 2010
7776750 Semiconductor device and method for forming a pattern in the same with double exposure technology Aug. 17, 2010
7772126 Hard mask arrangement, contact arrangement and methods of patterning a substrate and manufacturing a contact arrangement Aug. 10, 2010
7736985 Method for manufacturing semiconductor device using overlapping exposure and semiconductor device thereof Jun. 15, 2010
7718081 Techniques for the use of amorphous carbon (APF) for various etch and litho integration schemes May. 18, 2010
7704776 Method of forming a vertical image sensor that includes patterning an oxide layer to form a mask for implanting a floating diffusion area Apr. 27, 2010
7704810 Manufacturing method of display device Apr. 27, 2010
7700473 Gated semiconductor device and method of fabricating same Apr. 20, 2010
7696101 Process for increasing feature density during the manufacture of a semiconductor device Apr. 13, 2010
7696033 Method of fabricating complementary metal-oxide semiconductor (CMOS) thin film transistor (TFT) Apr. 13, 2010
7695982 Refurbishing a wafer having a low-k dielectric layer Apr. 13, 2010
7667281 Method for hard mask CD trim Feb. 23, 2010
7662721 Hard mask layer stack and a method of patterning Feb. 16, 2010
7648872 Methods of forming DRAM arrays Jan. 19, 2010
7645660 Method for manufacturing high-stability resistors, such as high ohmic poly resistors, integrated on a semiconductor substrate Jan. 12, 2010
7638441 Method of forming a carbon polymer film using plasma CVD Dec. 29, 2009
7611980 Single spacer process for multiplying pitch by a factor greater than two and related intermediate IC structures Nov. 3, 2009
7602003 Semiconductor device structure for reducing hot carrier effect of MOS transistor Oct. 13, 2009
7601607 Protruded contact and insertion of inter-layer-dielectric material to match damascene hardmask to improve undercut for low-k interconnects Oct. 13, 2009

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