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Class Information
Number: 257/E21.034
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Making mask on semicond uctor body for further photolithographic processing (epo) > Comprising inorganic layer (epo) > For lift-off process (epo)
Description: This subclass is indented under subclass E21.033. This subclass is substantially the same in scope as ECLA classification H01L21/033B.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7446030 |
Methods for fabricating current-carrying structures using voltage switchable dielectric materials |
Nov. 4, 2008 |
| 7291891 |
In-solid nuclear spin quantum calculation device |
Nov. 6, 2007 |
| 7041228 |
Substrate for and a process in connection with the product of structures |
May. 9, 2006 |
| 7033936 |
Process for making island arrays |
Apr. 25, 2006 |
| 7008810 |
Method for fabricating at least one mesa or ridge structure or at least one electrically pumped region in a layer or layer sequence |
Mar. 7, 2006 |
| 6916597 |
Method for fabricating a resist pattern, a method for patterning a thin film and a method for manufacturing a micro device |
Jul. 12, 2005 |
| 6914003 |
Method for manufacturing magnetic random access memory |
Jul. 5, 2005 |
| 6849532 |
Method of manufacturing a transistor in a semiconductor device |
Feb. 1, 2005 |
| 6846750 |
High precision pattern forming method of manufacturing a semiconductor device |
Jan. 25, 2005 |
| 6686128 |
Method of fabricating patterned layers of material upon a substrate |
Feb. 3, 2004 |
| 6627526 |
Method for fabricating a conductive structure for a semiconductor device |
Sep. 30, 2003 |
| 6623988 |
Method for fabricating ferroelectric capacitor of semiconductor device |
Sep. 23, 2003 |
| 6590250 |
DRAM capacitor array and integrated device array of substantially identically shaped devices |
Jul. 8, 2003 |
| 6537866 |
Method of forming narrow insulating spacers for use in reducing minimum component size |
Mar. 25, 2003 |
| 6521541 |
Surface preparation of substances for continuous convective assembly of fine particles |
Feb. 18, 2003 |
| 6451684 |
Semiconductor device having a conductive layer side surface slope which is at least 90.degree. and method for manufacturing the same |
Sep. 17, 2002 |
| 6383853 |
Method of fabricating semiconductor device |
May. 7, 2002 |
| 6365470 |
Method for manufacturing self-matching transistor |
Apr. 2, 2002 |
| 6274198 |
Shadow mask deposition |
Aug. 14, 2001 |
| 6180429 |
Process for selective area growth of III-V semiconductors |
Jan. 30, 2001 |
| 6156665 |
Trilayer lift-off process for semiconductor device metallization |
Dec. 5, 2000 |
| 6121653 |
Dram capacitor arrays with 3-capacitor and 6-capacitor geometries |
Sep. 19, 2000 |
| 6080514 |
Fabrication method of mask for semiconductor device |
Jun. 27, 2000 |
| 6048671 |
Ultra-fine microfabrication method using an energy beam |
Apr. 11, 2000 |
| 6015976 |
Fabrication apparatus employing energy beam |
Jan. 18, 2000 |
| 6010831 |
Ultra-fine microfabrication method using an energy beam |
Jan. 4, 2000 |
| 6007969 |
Ultra-fine microfabrication method using an energy beam |
Dec. 28, 1999 |
| 5950106 |
Method of patterning a metal substrate using spin-on glass as a hard mask |
Sep. 7, 1999 |
| 5894058 |
Ultra-fine microfabrication method using a fast atomic energy beam |
Apr. 13, 1999 |
| 5891804 |
Process for conductors with selective deposition |
Apr. 6, 1999 |
| 5871870 |
Mask for forming features on a semiconductor substrate and a method for forming the mask |
Feb. 16, 1999 |
| 5868952 |
Fabrication method with energy beam |
Feb. 9, 1999 |
| 5858861 |
Reducing nitride residue by changing the nitride film surface property |
Jan. 12, 1999 |
| 5858847 |
Method for a lightly doped drain structure |
Jan. 12, 1999 |
| 5830774 |
Method for forming a metal pattern on a substrate |
Nov. 3, 1998 |
| 5725788 |
Apparatus and method for patterning a surface |
Mar. 10, 1998 |
| 5676853 |
Mask for forming features on a semiconductor substrate and a method for forming the mask |
Oct. 14, 1997 |
| 5641715 |
Semiconductor IC device fabricating method |
Jun. 24, 1997 |
| 5554488 |
Semiconductor device structure and method of formation thereof |
Sep. 10, 1996 |
| 5541128 |
Self-aligned thin-film transistor constructed using lift-off technique |
Jul. 30, 1996 |
| 5407529 |
Method for manufacturing semiconductor device |
Apr. 18, 1995 |
| 5376229 |
Method of fabrication of adjacent coplanar semiconductor devices |
Dec. 27, 1994 |
| 5240558 |
Method for forming a semiconductor device |
Aug. 31, 1993 |
| 4766093 |
Chemically formed self-aligned structure and wave guide |
Aug. 23, 1988 |
| 4697333 |
Method of manufacturing a semiconductor device using amorphous silicon as a mask |
Oct. 6, 1987 |
| 4654119 |
Method for making submicron mask openings using sidewall and lift-off techniques |
Mar. 31, 1987 |
| 4637129 |
Selective area III-V growth and lift-off using tungsten patterning |
Jan. 20, 1987 |
| 4356056 |
Process for insulating the interconnections of integrated circuits |
Oct. 26, 1982 |
| 4224361 |
High temperature lift-off technique |
Sep. 23, 1980 |
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