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Class Information
Number: 257/E21.033
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Making mask on semicond uctor body for further photolithographic processing (epo) > Comprising inorganic layer (epo)
Description: This subclass is indented under subclass E21.023. This subclass is substantially the same in scope as ECLA classification H01L21/033.










Sub-classes under this class:

Class Number Class Name Patents
257/E21.035 Characterized by their composition, e.g., multilayer masks, materials (epo) 315
257/E21.036 Characterized by their size, orientation, disposition, behavior, shape, in horizontal or vertical plane (epo) 112
257/E21.034 For lift-off process (epo) 65


Patents under this class:
1 2 3 4 5 6 7 8 9 10

Patent Number Title Of Patent Date Issued
8471259 Display device and electronic apparatus Jun. 25, 2013
8236689 Method for applying a structure to a semiconductor element Aug. 7, 2012
8222069 Image sensor and manufacturing method for same Jul. 17, 2012
8222635 Method for manufacturing an organic light emitting device as well as such a device Jul. 17, 2012
8207537 Display device Jun. 26, 2012
8071406 Array substrate and method of manufacturing the same Dec. 6, 2011
8071404 Method for fabricating light emitting device Dec. 6, 2011
7935641 Thin film etching method May. 3, 2011
7880232 Processes and apparatus having a semiconductor fin Feb. 1, 2011
7867810 Method for manufacturing a solid-state image capturing apparatus Jan. 11, 2011
7772098 Method for manufacturing semiconductor device Aug. 10, 2010
7736962 Advanced JFET with reliable channel control and method of manufacture Jun. 15, 2010
7700482 Patterned material layer, method of forming the same, microdevice, and method of manufacturing the same Apr. 20, 2010
7696047 Method for evaluating a gate insulation film characteristic for use in a semiconductor device Apr. 13, 2010
7687408 Method for integrated circuit fabrication using pitch multiplication Mar. 30, 2010
7622338 Method for manufacturing semiconductor device Nov. 24, 2009
7608544 Etching method and storage medium Oct. 27, 2009
7589026 Method for fabricating a fine pattern in a semiconductor device Sep. 15, 2009
7432212 Methods of processing a semiconductor substrate Oct. 7, 2008
7416995 Method for fabricating controlled stress silicon nitride films Aug. 26, 2008
7393707 Method for manufacturing an electro-optical device Jul. 1, 2008
7329613 Structure and method for forming semiconductor wiring levels using atomic layer deposition Feb. 12, 2008
7288420 Method for manufacturing an electro-optical device Oct. 30, 2007
7241688 Aperture masks for circuit fabrication Jul. 10, 2007
7192789 Method for monitoring an ion implanter Mar. 20, 2007
7176053 Laser ablation method for fabricating high performance organic devices Feb. 13, 2007
7172965 Method for manufacturing semiconductor device Feb. 6, 2007
7138341 Process for making a memory structure Nov. 21, 2006
7115524 Methods of processing a semiconductor substrate Oct. 3, 2006
6797597 Process for treating complementary regions of the surface of a substrate and semiconductor product obtained by this process Sep. 28, 2004
6743729 Etching method and etching apparatus of carbon thin film Jun. 1, 2004
6225217 Method of manufacturing semiconductor device having multilayer wiring May. 1, 2001
6140225 Method of manufacturing semiconductor device having multilayer wiring Oct. 31, 2000
6025268 Method of etching conductive lines through an etch resistant photoresist mask Feb. 15, 2000
6025115 Processing method for etching a substrate Feb. 15, 2000
5981001 Processing method for selectively irradiating a surface in presence of a reactive gas to cause etching Nov. 9, 1999
5962194 Processing method and apparatus Oct. 5, 1999
5863706 Processing method for patterning a film Jan. 26, 1999
5847465 Contacts for semiconductor devices Dec. 8, 1998
5837560 Method of masking substrates leaving exposed facets Nov. 17, 1998
5824455 Processing method and apparatus Oct. 20, 1998
5714306 Processing method and apparatus Feb. 3, 1998
5528058 IGBT device with platinum lifetime control and reduced gaw Jun. 18, 1996
5420067 Method of fabricatring sub-half-micron trenches and holes May. 30, 1995
5409566 Slope etching process Apr. 25, 1995
5334550 Method of producing a self-aligned window at recessed intersection of insulating regions Aug. 2, 1994
5283201 High density power device fabrication process Feb. 1, 1994
5283202 IGBT device with platinum lifetime control having gradient or profile tailored platinum diffusion regions Feb. 1, 1994
5262336 IGBT process to produce platinum lifetime control Nov. 16, 1993
5256583 Mask surrogate semiconductor process with polysilicon gate protection Oct. 26, 1993

1 2 3 4 5 6 7 8 9 10










 
 
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