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Class Information
Number: 257/E21.032
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Making mask on semicond uctor body for further photolithographic processing (epo) > Comprising organic layer (epo) > Characterized by treatment of photoresist layer (epo) > Ion lithographic process (epo)
Description: This subclass is indented under subclass E21.026. This subclass is substantially the same in scope as ECLA classification H01L21/027B6E.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7115525 |
Method for integrated circuit fabrication using pitch multiplication |
Oct. 3, 2006 |
| 7067435 |
Method for etch-stop layer etching during damascene dielectric etching with low polymerization |
Jun. 27, 2006 |
| 7026099 |
Pattern forming method and method for manufacturing semiconductor device |
Apr. 11, 2006 |
| 6774043 |
Method of manufacturing semiconductor device |
Aug. 10, 2004 |
| 6194268 |
Printing sublithographic images using a shadow mandrel and off-axis exposure |
Feb. 27, 2001 |
| 6096598 |
Method for forming pillar memory cells and device formed thereby |
Aug. 1, 2000 |
| 5849436 |
Block mask and charged particle beam exposure method and apparatus using the same |
Dec. 15, 1998 |
| 5770336 |
Lithography mask and fabrication method thereof |
Jun. 23, 1998 |
| 5387529 |
Production method of a MESFET semiconductor device |
Feb. 7, 1995 |
| 5300445 |
Production method of an HEMT semiconductor device |
Apr. 5, 1994 |
| 5102688 |
Fine pattern forming process |
Apr. 7, 1992 |
| 5037767 |
Method of manufacturing a semiconductor device by ion implantation through an ion-sensitive resist |
Aug. 6, 1991 |
| 4851691 |
Method for photoresist pretreatment prior to charged particle beam processing |
Jul. 25, 1989 |
| 4383026 |
Accelerated particle lithographic processing and articles so produced |
May. 10, 1983 |
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