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Class Information
Number: 257/E21.031
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Making mask on semicond uctor body for further photolithographic processing (epo) > Comprising organic layer (epo) > Characterized by treatment of photoresist layer (epo) > X-ray lithographic process (epo)
Description: This subclass is indented under subclass E21.026. This subclass is substantially the same in scope as ECLA classification H01L21/027B6D.










Patents under this class:

Patent Number Title Of Patent Date Issued
8604598 Microelectronic devices and methods for manufacturing microelectronic devices Dec. 10, 2013
8501573 High-resolution integrated X-ray CMOS image sensor Aug. 6, 2013
8183615 Memory cell with a vertically oriented transistor coupled to a digit line and method of forming the same May. 22, 2012
7871908 Method of manufacturing semiconductor device Jan. 18, 2011
7825452 Memory cell with buried digit line Nov. 2, 2010
7042071 Leadframe, plastic-encapsulated semiconductor device, and method for fabricating the same May. 9, 2006
7026099 Pattern forming method and method for manufacturing semiconductor device Apr. 11, 2006
6239008 Method of making a density multiplier for semiconductor device manufacturing May. 29, 2001
5889758 Reflection type mask structure and exposure apparatus using the same Mar. 30, 1999
5861603 Mask structure and method of making the same Jan. 19, 1999
5350485 High-resolution lithography and semiconductor device manufacturing method Sep. 27, 1994
5168512 Method of manufacture of semiconductor devices Dec. 1, 1992
5166888 Fabrication of particle beam masks Nov. 24, 1992
4791302 Semiconductor wafer for providing a plurality of semiconductor chips through electron-beam lithography Dec. 13, 1988
4379832 Method for making low barrier Schottky devices of the electron beam evaporation of reactive metals Apr. 12, 1983
4267259 Exposure process May. 12, 1981
4256829 Method of manufacturing solid-state devices in which planar dimensional distortion is reduced Mar. 17, 1981
4244799 Fabrication of integrated circuits utilizing thick high-resolution patterns Jan. 13, 1981
4238685 Arrangement for the production of electronic semiconductor components Dec. 9, 1980
4165395 Process for forming a high aspect ratio structure by successive exposures with electron beam and actinic radiation Aug. 21, 1979
4035522 X-ray lithography mask Jul. 12, 1977











 
 
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