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Class Information
Number: 257/E21.029
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Making mask on semicond uctor body for further photolithographic processing (epo) > Comprising organic layer (epo) > Characterized by treatment of photoresist layer (epo) > Photolith ographic process (epo) > Using anti-reflective coating (epo)
Description: This subclass is indented under subclass E21.027. This subclass is substantially the same in scope as ECLA classification H01L21/027B6B4.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6171764 |
Method for reducing intensity of reflected rays encountered during process of photolithography |
Jan. 9, 2001 |
| 6169029 |
Method of solving metal stringer problem which is induced by the product of tin and organic ARC reaction |
Jan. 2, 2001 |
| 6165695 |
Thin resist with amorphous silicon hard mask for via etch application |
Dec. 26, 2000 |
| 6165895 |
Fabrication method of an interconnect |
Dec. 26, 2000 |
| 6165881 |
Method of forming salicide poly gate with thin gate oxide and ultra narrow gate width |
Dec. 26, 2000 |
| 6165855 |
Antireflective coating used in the fabrication of microcircuit structures in 0.18 micron and smaller technologies |
Dec. 26, 2000 |
| 6162587 |
Thin resist with transition metal hard mask for via etch application |
Dec. 19, 2000 |
| 6162745 |
Film forming method |
Dec. 19, 2000 |
| 6156646 |
Method of manufacturing semiconductor devices |
Dec. 5, 2000 |
| 6156640 |
Damascene process with anti-reflection coating |
Dec. 5, 2000 |
| 6156485 |
Film scheme to solve high aspect ratio metal etch masking layer selectivity and improve photo I-line PR resolution capability in quarter-micron technology |
Dec. 5, 2000 |
| 6156149 |
In situ deposition of a dielectric oxide layer and anti-reflective coating |
Dec. 5, 2000 |
| 6153541 |
Method for fabricating an oxynitride layer having anti-reflective properties and low leakage current |
Nov. 28, 2000 |
| 6150250 |
Conductive layer forming method using etching mask with direction <200> |
Nov. 21, 2000 |
| 6144083 |
Method of reducing defects in anti-reflective coatings and semiconductor structures fabricated thereby |
Nov. 7, 2000 |
| 6136723 |
Dry etching process and a fabrication process of a semiconductor device using such a dry etching process |
Oct. 24, 2000 |
| 6133613 |
Anti-reflection oxynitride film for tungsten-silicide substrates |
Oct. 17, 2000 |
| 6133618 |
Semiconductor device having an anti-reflective layer and a method of manufacture thereof |
Oct. 17, 2000 |
| 6130155 |
Method of forming metal lines in an integrated circuit having reduced reaction with an anti-reflection coating |
Oct. 10, 2000 |
| 6121133 |
Isolation using an antireflective coating |
Sep. 19, 2000 |
| 6121123 |
Gate pattern formation using a BARC as a hardmask |
Sep. 19, 2000 |
| 6117345 |
High density plasma chemical vapor deposition process |
Sep. 12, 2000 |
| 6117743 |
Method of manufacturing MOS device using anti reflective coating |
Sep. 12, 2000 |
| 6117619 |
Low temperature anti-reflective coating for IC lithography |
Sep. 12, 2000 |
| 6117618 |
Carbonized antireflective coating produced by spin-on polymer material |
Sep. 12, 2000 |
| 6114235 |
Multipurpose cap layer dielectric |
Sep. 5, 2000 |
| 6107177 |
Silylation method for reducing critical dimension loss and resist loss |
Aug. 22, 2000 |
| 6103637 |
Method for selective etching of antireflective coatings |
Aug. 15, 2000 |
| 6103634 |
Removal of inorganic anti-reflective coating using fluorine etch process |
Aug. 15, 2000 |
| 6103632 |
In situ Etching of inorganic dielectric anti-reflective coating from a substrate |
Aug. 15, 2000 |
| 6103456 |
Prevention of photoresist poisoning from dielectric antireflective coating in semiconductor fabrication |
Aug. 15, 2000 |
| 6103457 |
Method for reducing faceting on a photoresist layer during an etch process |
Aug. 15, 2000 |
| 6087271 |
Methods for removal of an anti-reflective coating following a resist protect etching process |
Jul. 11, 2000 |
| 6080678 |
Method for etching anti-reflective coating film |
Jun. 27, 2000 |
| 6077777 |
Method for forming wires of semiconductor device |
Jun. 20, 2000 |
| 6071824 |
Method and system for patterning to enhance performance of a metal layer of a semiconductor device |
Jun. 6, 2000 |
| 6069075 |
Reducing reflectivity on a semiconductor wafer by annealing aluminum and titanium |
May. 30, 2000 |
| 6066567 |
Methods for in-situ removal of an anti-reflective coating during an oxide resistor protect etching process |
May. 23, 2000 |
| 6063547 |
Physical vapor deposition poly-p-phenylene sulfide film as a bottom anti-reflective coating on polysilicon |
May. 16, 2000 |
| 6060132 |
High density plasma CVD process for making dielectric anti-reflective coatings |
May. 9, 2000 |
| 6057246 |
Method for etching a metal layer with dimensional control |
May. 2, 2000 |
| 6057587 |
Semiconductor device with anti-reflective structure |
May. 2, 2000 |
| 6051282 |
Surface treatment of antireflective layer in chemical vapor deposition process |
Apr. 18, 2000 |
| 6051369 |
Lithography process using one or more anti-reflective coating films and fabrication process using the lithography process |
Apr. 18, 2000 |
| 6042999 |
Robust dual damascene process |
Mar. 28, 2000 |
| 6043547 |
Circuit structure with an anti-reflective layer |
Mar. 28, 2000 |
| 6039888 |
Method of etching an organic anti-reflective coating |
Mar. 21, 2000 |
| 6040613 |
Antireflective coating and wiring line stack |
Mar. 21, 2000 |
| 6040619 |
Semiconductor device including antireflective etch stop layer |
Mar. 21, 2000 |
| 6037251 |
Process for intermetal SOG/SOP dielectric planarization |
Mar. 14, 2000 |
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