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Browse by Category: Main > Physics
Class Information
Number: 257/E21.029
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Making mask on semicond uctor body for further photolithographic processing (epo) > Comprising organic layer (epo) > Characterized by treatment of photoresist layer (epo) > Photolith ographic process (epo) > Using anti-reflective coating (epo)
Description: This subclass is indented under subclass E21.027. This subclass is substantially the same in scope as ECLA classification H01L21/027B6B4.










Patents under this class:
1 2 3 4 5 6 7 8 9 10

Patent Number Title Of Patent Date Issued
8673770 Methods of forming conductive structures in dielectric layers on an integrated circuit device Mar. 18, 2014
8558335 Solid-state imaging device and manufacturing method thereof, and electronic apparatus Oct. 15, 2013
8536031 Method of fabricating dual damascene structures using a multilevel multiple exposure patterning scheme Sep. 17, 2013
8536049 Method for forming metal contacts Sep. 17, 2013
8394714 Anti-reflective coatings for micro-fluid applications Mar. 12, 2013
8372719 Hard mask removal for semiconductor devices Feb. 12, 2013
8293651 Method of forming thin film pattern for semiconductor device and apparatus for the same Oct. 23, 2012
8288271 Method for reworking antireflective coating over semiconductor substrate Oct. 16, 2012
8252685 Techniques to improve characteristics of processed semiconductor substrates Aug. 28, 2012
8236705 Deposition of viscous material Aug. 7, 2012
8168520 Method of manufacturing semiconductor device May. 1, 2012
8138578 Method and system for creating self-aligned twin wells with co-planar surfaces in a semiconductor device Mar. 20, 2012
8048735 Manufacturing method of semiconductor device Nov. 1, 2011
8003522 Method for forming trenches with wide upper portion and narrow lower portion Aug. 23, 2011
7960835 Fabrication of metal film stacks having improved bottom critical dimension Jun. 14, 2011
7910477 Etch residue reduction by ash methodology Mar. 22, 2011
7888162 Method of manufacturing a photoelectronic device Feb. 15, 2011
7842606 Method of depositing thin film and method of manufacturing semiconductor using the same Nov. 30, 2010
7816253 Surface treatment of inter-layer dielectric Oct. 19, 2010
7807497 Phase-change material layers, methods of forming the same, phase-change memory devices having the same, and methods of forming phase-change memory devices Oct. 5, 2010
7803655 Method to manufacture a phase change memory Sep. 28, 2010
7781345 Method of manufacturing imprint substrate and imprinting method Aug. 24, 2010
7781344 Method for manufacturing a semiconductor device by selective etching Aug. 24, 2010
7718081 Techniques for the use of amorphous carbon (APF) for various etch and litho integration schemes May. 18, 2010
7683487 Structure applied to a photolithographic process Mar. 23, 2010
7662711 Method of forming dual damascene pattern Feb. 16, 2010
7655562 Method of manufacturing semiconductor memory device Feb. 2, 2010
7626238 Semiconductor devices having antireflective material Dec. 1, 2009
7605439 Antireflective hard mask compositions Oct. 20, 2009
7602003 Semiconductor device structure for reducing hot carrier effect of MOS transistor Oct. 13, 2009
7589015 Fabrication of semiconductor devices using anti-reflective coatings Sep. 15, 2009
7579250 Method for reducing hot carrier effect of MOS transistor Aug. 25, 2009
7557025 Method of etching a dielectric layer to form a contact hole and a via hole and damascene method Jul. 7, 2009
7541286 Method for manufacturing semiconductor device using KrF light source Jun. 2, 2009
7541288 Methods of forming integrated circuit structures using insulator deposition and insulator gap filling techniques Jun. 2, 2009
7538404 Optical semiconductor device and method for manufacturing the same May. 26, 2009
7538040 Techniques for precision pattern transfer of carbon nanotubes from photo mask to wafers May. 26, 2009
7524773 Anti-reflective substrate and the manufacturing method thereof Apr. 28, 2009
7501307 Method of fabricating semiconductor memory device Mar. 10, 2009
7485573 Process of making a semiconductor device using multiple antireflective materials Feb. 3, 2009
7452795 Semiconductor device and method for fabricating the same Nov. 18, 2008
7442606 Method of manufacturing a semiconductor device Oct. 28, 2008
7416992 Method of patterning a low-k dielectric using a hard mask Aug. 26, 2008
7390738 Fabrication of semiconductor devices using anti-reflective coatings Jun. 24, 2008
7368331 Manufacturing method of thin-film transistor, thin-film transistor sheet, and electric circuit May. 6, 2008
7365408 Structure for photolithographic applications using a multi-layer anti-reflection coating Apr. 29, 2008
7344990 Method of manufacturing micro-structure element by utilizing molding glass Mar. 18, 2008
7345002 Replication and transfer of microstructures and nanostructures Mar. 18, 2008
7335585 Method for preventing the formation of a void in a bottom anti-reflective coating filling a via hole Feb. 26, 2008
7326646 Nitrogen-free ARC layer and a method of manufacturing the same Feb. 5, 2008

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