 |
|
 |
| |
 |
|
Class Information
Number: 257/E21.028
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Making mask on semicond uctor body for further photolithographic processing (epo) > Comprising organic layer (epo) > Characterized by treatment of photoresist layer (epo) > Photolith ographic process (epo) > Using laser (epo)
Description: This subclass is indented under subclass E21.027. This subclass is substantially the same in scope as ECLA classification H01L21/027B6B2.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7410852 |
Opto-thermal annealing methods for forming metal gate and fully silicided gate field effect transistors |
Aug. 12, 2008 |
| 7329936 |
Mask for sequential lateral solidification and crystallization method using thereof |
Feb. 12, 2008 |
| 7232771 |
Method and apparatus for depositing charge and/or nanoparticles |
Jun. 19, 2007 |
| 7067894 |
Semiconductor devices using anti-reflective coatings |
Jun. 27, 2006 |
| 7060635 |
Method of manufacturing semiconductor device and method of forming pattern |
Jun. 13, 2006 |
| 7026253 |
Method for fabricating semiconductor device using ArF photolithography capable of protecting tapered profile of hard mask |
Apr. 11, 2006 |
| 7026099 |
Pattern forming method and method for manufacturing semiconductor device |
Apr. 11, 2006 |
| 7015529 |
Localized masking for semiconductor structure development |
Mar. 21, 2006 |
| 6960532 |
Suppressing lithography at a wafer edge |
Nov. 1, 2005 |
| 6933236 |
Method for forming pattern using argon fluoride photolithography |
Aug. 23, 2005 |
| 6924023 |
Method of manufacturing a structure having pores |
Aug. 2, 2005 |
| 6887649 |
Multi-layered resist structure and manufacturing method of semiconductor device |
May. 3, 2005 |
| 6713234 |
Fabrication of semiconductor devices using anti-reflective coatings |
Mar. 30, 2004 |
| 6610463 |
Method of manufacturing structure having pores |
Aug. 26, 2003 |
| 6573554 |
Localized masking for semiconductor structure development |
Jun. 3, 2003 |
| 6410348 |
Interface texturing for light-emitting device |
Jun. 25, 2002 |
| 6358793 |
Method for localized masking for semiconductor structure development |
Mar. 19, 2002 |
| 6340557 |
Pattern formation method |
Jan. 22, 2002 |
| 6200907 |
Ultra-thin resist and barrier metal/oxide hard mask for metal etch |
Mar. 13, 2001 |
| 6143671 |
Semiconductor device manufacturing method |
Nov. 7, 2000 |
| 6037967 |
Short wavelength pulsed laser scanner |
Mar. 14, 2000 |
| 5981149 |
Method for manufacturing semiconductor device |
Nov. 9, 1999 |
| 5902716 |
Exposure method and apparatus |
May. 11, 1999 |
| 5876901 |
Method for fabricating semiconductor device |
Mar. 2, 1999 |
| 5741628 |
Method of forming micropatterns by having a resist film absorb water |
Apr. 21, 1998 |
| 5726102 |
Method for controlling etch bias in plasma etch patterning of integrated circuit layers |
Mar. 10, 1998 |
| 5679500 |
Method of forming micropatterns utilizing silylation and overall energy beam exposure |
Oct. 21, 1997 |
| 5658711 |
Method of forming micropatterns |
Aug. 19, 1997 |
| 5641607 |
Anti-reflective layer used to form a semiconductor device |
Jun. 24, 1997 |
| 5591566 |
Method of forming a resist pattern by using a silicon carbide anti-reflective layer |
Jan. 7, 1997 |
| 5484672 |
Method of making a rim-type phase-shift mask |
Jan. 16, 1996 |
| 5472829 |
Method of forming a resist pattern by using an anti-reflective layer |
Dec. 5, 1995 |
| 5472827 |
Method of forming a resist pattern using an anti-reflective layer |
Dec. 5, 1995 |
| 5113402 |
Solid state laser device for lithography light source and semiconductor lithography method |
May. 12, 1992 |
| 4966428 |
Manufacture of integrated circuits using holographic techniques |
Oct. 30, 1990 |
| 4857425 |
Manufacture of integrated circuits using holographic techniques |
Aug. 15, 1989 |
| 4824747 |
Method of forming a variable width channel |
Apr. 25, 1989 |
| 4727381 |
Appartus for, and methods of, inscribing patterns on semiconductor wafers |
Feb. 23, 1988 |
| 4307131 |
Method of manufacturing metal-semiconductor contacts exhibiting high injected current density |
Dec. 22, 1981 |
| 4049944 |
Process for fabricating small geometry semiconductive devices including integrated components |
Sep. 20, 1977 |
|
|
|
 |
|
 |
|
| |
Randomly Featured Patents |
|
