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Class Information
Number: 257/E21.026
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Making mask on semicond uctor body for further photolithographic processing (epo) > Comprising organic layer (epo) > Characterized by treatment of photoresist layer (epo)
Description: This subclass is indented under subclass E21.024. This subclass is substantially the same in scope as ECLA classification H01L21/027B6.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7452820 |
Radiation-resistant zone plates and method of manufacturing thereof |
Nov. 18, 2008 |
| 7361588 |
Etch process for CD reduction of arc material |
Apr. 22, 2008 |
| 7354781 |
Method of manufacturing field emission device |
Apr. 8, 2008 |
| 7332444 |
Method for smoothing areas in structures by utilizing the surface tension |
Feb. 19, 2008 |
| 7329618 |
Ion implanting methods |
Feb. 12, 2008 |
| 7294586 |
Method of processing a substrate, heating apparatus, and method of forming a pattern |
Nov. 13, 2007 |
| 7276452 |
Method for removing mottled etch in semiconductor fabricating process |
Oct. 2, 2007 |
| 7253113 |
Methods for using a silylation technique to reduce cell pitch in semiconductor devices |
Aug. 7, 2007 |
| 7241707 |
Layered films formed by controlled phase segregation |
Jul. 10, 2007 |
| 7226873 |
Method of improving via filling uniformity in isolated and dense via-pattern regions |
Jun. 5, 2007 |
| 7226852 |
Preventing damage to low-k materials during resist stripping |
Jun. 5, 2007 |
| 7157319 |
Method of patterning a thin film transistor that includes simultaneously forming a gate electrode and a pixel electrode |
Jan. 2, 2007 |
| 7157377 |
Method of making a semiconductor device using treated photoresist |
Jan. 2, 2007 |
| 7144752 |
Method of manufacturing organic electroluminescent display device and organic electroluminescent display device, and display device equipped with organic electroluminescent display device |
Dec. 5, 2006 |
| 7053030 |
Silicone hyper-branched polymer surfactant, method of preparing the same and method of rinsing using a rinsing solution comprising the same |
May. 30, 2006 |
| 7049052 |
Method providing an improved bi-layer photoresist pattern |
May. 23, 2006 |
| 7015529 |
Localized masking for semiconductor structure development |
Mar. 21, 2006 |
| 7009148 |
Method of processing a substrate, heating apparatus, and method of forming a pattern |
Mar. 7, 2006 |
| 6969580 |
Method of manufacturing semiconductor device |
Nov. 29, 2005 |
| 6946390 |
Photolithographic production of trenches in a substrate |
Sep. 20, 2005 |
| 6946400 |
Patterning method for fabricating integrated circuit |
Sep. 20, 2005 |
| 6943117 |
UV nanoimprint lithography process using elementwise embossed stamp and selectively additive pressurization |
Sep. 13, 2005 |
| 6923920 |
Method and compositions for hardening photoresist in etching processes |
Aug. 2, 2005 |
| 6908854 |
Method of forming a dual-layer resist and application thereof |
Jun. 21, 2005 |
| 6905949 |
Semiconductor apparatus fabrication method forming a resist pattern, a film over the resist, and reflowing the resist |
Jun. 14, 2005 |
| 6900141 |
Method of forming a resist pattern and fabricating tapered features |
May. 31, 2005 |
| 6893958 |
Methods for preventing cross-linking between multiple resists and patterning multiple resists |
May. 17, 2005 |
| 6884727 |
Semiconductor fabrication process for modifying the profiles of patterned features |
Apr. 26, 2005 |
| 6875956 |
Method of forming photoresist pattern using hot plate oven |
Apr. 5, 2005 |
| 6872512 |
Method of forming resist pattern |
Mar. 29, 2005 |
| 6866986 |
Method of 193 NM photoresist stabilization by the use of ion implantation |
Mar. 15, 2005 |
| 6864144 |
Method of stabilizing resist material through ion implantation |
Mar. 8, 2005 |
| 6849486 |
Method of manufacturing a thinned gate electrode utilizing protective films and etching |
Feb. 1, 2005 |
| 6841488 |
Pattern formation method |
Jan. 11, 2005 |
| 6841465 |
Method of forming dual damascene pattern in semiconductor device |
Jan. 11, 2005 |
| 6833326 |
Method for forming fine patterns in semiconductor device |
Dec. 21, 2004 |
| 6828217 |
Dicing process for GAAS/INP and other semiconductor materials |
Dec. 7, 2004 |
| 6780778 |
Method for fabricating semiconductor device |
Aug. 24, 2004 |
| 6767824 |
Method of fabricating a gate structure of a field effect transistor using an alpha-carbon mask |
Jul. 27, 2004 |
| 6764946 |
Method of controlling line edge roughness in resist films |
Jul. 20, 2004 |
| 6750073 |
Method for forming a mask pattern |
Jun. 15, 2004 |
| 6746821 |
Method of structuring a photoresist layer |
Jun. 8, 2004 |
| 6746822 |
Use of surface coupling agent to improve adhesion |
Jun. 8, 2004 |
| 6686322 |
Cleaning agent and cleaning process using the same |
Feb. 3, 2004 |
| 6677242 |
Integrated shallow trench isolation approach |
Jan. 13, 2004 |
| 6660459 |
System and method for developing a photoresist layer with reduced pattern collapse |
Dec. 9, 2003 |
| 6653030 |
Optical-mechanical feature fabrication during manufacture of semiconductors and other micro-devices and nano-devices that include micron and sub-micron features |
Nov. 25, 2003 |
| 6645851 |
Method of forming planarized coatings on contact hole patterns of various duty ratios |
Nov. 11, 2003 |
| 6645702 |
Treat resist surface to prevent pattern collapse |
Nov. 11, 2003 |
| 6638833 |
Process for the fabrication of integrated devices with reduction of damage from plasma |
Oct. 28, 2003 |
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