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Class Information
Number: 257/E21.024
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Making mask on semicond uctor body for further photolithographic processing (epo) > Comprising organic layer (epo)
Description: This subclass is indented under subclass E21.023. This subclass is substantially the same in scope as ECLA classification H01L21/027B.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7456490 |
Sealing porous dielectrics with silane coupling reagents |
Nov. 25, 2008 |
| 7452795 |
Semiconductor device and method for fabricating the same |
Nov. 18, 2008 |
| 7432212 |
Methods of processing a semiconductor substrate |
Oct. 7, 2008 |
| 7407846 |
Thin film transistor, display device and their production |
Aug. 5, 2008 |
| 7393707 |
Method for manufacturing an electro-optical device |
Jul. 1, 2008 |
| 7365414 |
Component packaging apparatus, systems, and methods |
Apr. 29, 2008 |
| 7365024 |
Chemical solution coating method and chemical solution coating apparatus |
Apr. 29, 2008 |
| 7365022 |
Additive printed mask process and structures produced thereby |
Apr. 29, 2008 |
| 7345303 |
Organic thin-film transistors |
Mar. 18, 2008 |
| 7344955 |
Cut-and-paste imprint lithographic mold and method therefor |
Mar. 18, 2008 |
| 7335524 |
Method of manufacturing a thin film transistor array panel |
Feb. 26, 2008 |
| 7307338 |
Three dimensional polymer memory cell systems |
Dec. 11, 2007 |
| 7288420 |
Method for manufacturing an electro-optical device |
Oct. 30, 2007 |
| 7282735 |
TFT having a fluorocarbon-containing layer |
Oct. 16, 2007 |
| 7279386 |
Method for forming a semiconductor arrangement with gate sidewall spacers of specific dimensions |
Oct. 9, 2007 |
| 7241688 |
Aperture masks for circuit fabrication |
Jul. 10, 2007 |
| 7220683 |
Transparent amorphous carbon structure in semiconductor devices |
May. 22, 2007 |
| 7205167 |
Method to detect photoresist residue on a semiconductor device |
Apr. 17, 2007 |
| 7192880 |
Method for line etch roughness (LER) reduction for low-k interconnect damascene trench etching |
Mar. 20, 2007 |
| 7172965 |
Method for manufacturing semiconductor device |
Feb. 6, 2007 |
| 7172972 |
Semiconductor device manufacture method and etching system |
Feb. 6, 2007 |
| 7169701 |
Dual damascene trench formation to avoid low-K dielectric damage |
Jan. 30, 2007 |
| 7157732 |
Switchable memory diode-a new memory device |
Jan. 2, 2007 |
| 7135419 |
Line edge roughness reduction |
Nov. 14, 2006 |
| 7125796 |
Plasma etch process for multilayer vias having an organic layer with vertical sidewalls |
Oct. 24, 2006 |
| 7115525 |
Method for integrated circuit fabrication using pitch multiplication |
Oct. 3, 2006 |
| 7060626 |
Multi-run selective pattern and etch wafer process |
Jun. 13, 2006 |
| 7056824 |
Electronic device manufacture |
Jun. 6, 2006 |
| 7049169 |
Method of fabricating a semiconductor device |
May. 23, 2006 |
| 7026240 |
Method of fabricating a semiconductor device having a photo-sensitive polyimide layer and a device fabricated in accordance with the method |
Apr. 11, 2006 |
| 6995080 |
Methods of forming transistor gates |
Feb. 7, 2006 |
| 6946400 |
Patterning method for fabricating integrated circuit |
Sep. 20, 2005 |
| 6932934 |
Formation of discontinuous films during an imprint lithography process |
Aug. 23, 2005 |
| 6908861 |
Method for imprint lithography using an electric field |
Jun. 21, 2005 |
| 6902999 |
Pattern formation method |
Jun. 7, 2005 |
| 6900881 |
Step and repeat imprint lithography systems |
May. 31, 2005 |
| 6884735 |
Materials and methods for sublithographic patterning of gate structures in integrated circuit devices |
Apr. 26, 2005 |
| 6864192 |
Langmuir-blodgett chemically amplified photoresist |
Mar. 8, 2005 |
| 6844143 |
Sandwich photoresist structure in photolithographic process |
Jan. 18, 2005 |
| 6818139 |
Method for forming a micro-pattern on a substrate |
Nov. 16, 2004 |
| 6815333 |
Tri-layer masking architecture for patterning dual damascene interconnects |
Nov. 9, 2004 |
| 6743734 |
Bi-layer resist process |
Jun. 1, 2004 |
| 6716478 |
Coating film forming apparatus and coating film forming method |
Apr. 6, 2004 |
| 6699792 |
Polymer spacers for creating small geometry space and method of manufacture thereof |
Mar. 2, 2004 |
| 6689695 |
Multi-purpose composite mask for dual damascene patterning |
Feb. 10, 2004 |
| 6682988 |
Growth of photoresist layer in photolithographic process |
Jan. 27, 2004 |
| 6630410 |
Self-aligned PECVD etch mask |
Oct. 7, 2003 |
| 6627524 |
Methods of forming transistor gates; and methods of forming programmable read-only memory constructions |
Sep. 30, 2003 |
| 6582889 |
Method for forming resist pattern and manufacturing method of thin-film element |
Jun. 24, 2003 |
| 6579657 |
Material for forming a fine pattern and method for manufacturing a semiconductor device using the same |
Jun. 17, 2003 |
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