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Class Information
Number: 257/E21.021
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Manufacture of two-terminal component for integrated circuit (epo) > Of capacitor (epo) > Formation of electrode (epo) > With increased surface area, e.g., by roughening, texturing (epo) > Having multilayers, e.g., comprising barrier layer and metal layer (epo)
Description: This subclass is indented under subclass E21.012. This subclass is substantially the same in scope as ECLA classification H01L21/02B3C4.


Patents under this class:
1 2 3 4 5 6 7 8 9 10 11 12

Patent Number Title Of Patent Date Issued
7459318 Ferroelectric and high dielectric constant integrated circuit capacitors with three-dimensional orientation for high-density memories, and method of making the same Dec. 2, 2008
7452783 Capacitor for a semiconductor device and method of forming the same Nov. 18, 2008
7442633 Decoupling capacitor for high frequency noise immunity Oct. 28, 2008
7435678 Method of depositing noble metal electrode using oxidation-reduction reaction Oct. 14, 2008
7435670 Bit line barrier metal layer for semiconductor device and process for preparing the same Oct. 14, 2008
7422977 Copper adhesion improvement device and method Sep. 9, 2008
7414296 Method of manufacturing a metal-insulator-metal capacitor Aug. 19, 2008
7390678 Method for fabricating semiconductor device Jun. 24, 2008
7361590 Semiconductor device and manufacturing method thereof Apr. 22, 2008
7358174 Methods of forming solder bumps on exposed metal pads Apr. 15, 2008
7341908 Semiconductor device and method of manufacturing the same Mar. 11, 2008
7335611 Copper conductor annealing process employing high speed optical annealing with a low temperature-deposited optical absorber layer Feb. 26, 2008
7332433 Methods of modulating the work functions of film layers Feb. 19, 2008
7314806 Methods of forming metal-insulator-metal (MIM) capacitors with separate seed Jan. 1, 2008
7309885 PRAMs having a plurality of active regions located vertically in sequence and methods of forming the same Dec. 18, 2007
7303983 ALD gate electrode Dec. 4, 2007
7300840 MIM capacitor structure and fabricating method thereof Nov. 27, 2007
7297616 Methods, photoresists and substrates for ion-implant lithography Nov. 20, 2007
7279421 Method and deposition system for increasing deposition rates of metal layers from metal-carbonyl precursors Oct. 9, 2007
7276453 Methods for forming an undercut region and electronic devices incorporating the same Oct. 2, 2007
7276436 Manufacturing method for electronic component module and electromagnetically readable data carrier Oct. 2, 2007
7268413 Bipolar transistors with low-resistance emitter contacts Sep. 11, 2007
7239017 Low-k B-doped SiC copper diffusion barrier films Jul. 3, 2007
7235454 MIM capacitor structure and method of fabrication Jun. 26, 2007
7232736 Semiconductor devices with capacitors of metal/insulator/metal structure and methods for forming the same Jun. 19, 2007
7164203 Methods and procedures for engineering of composite conductive by atomic layer deposition Jan. 16, 2007
7112507 MIM capacitor structure and method of fabrication Sep. 26, 2006
7074669 Semiconductor integrated circuit device with capacitor of crown structure and method of manufacturing the same Jul. 11, 2006
7067861 Device and method for protecting against oxidation of a conductive layer in said device Jun. 27, 2006
7064365 Ferroelectric capacitors including a seed conductive film Jun. 20, 2006
7057874 Ferroelectric capacitor Jun. 6, 2006
7049191 Method for protecting against oxidation of a conductive layer in said device May. 23, 2006
7049646 Capacitor for semiconductor integrated devices May. 23, 2006
7041550 Device and method for protecting against oxidation of a conductive layer in said device May. 9, 2006
7038263 Integrated circuits with rhodium-rich structures May. 2, 2006
7033933 Manufacturing method of semiconductor device Apr. 25, 2006
7033882 Method of forming on-chip decoupling capacitor by selectively etching grain boundaries in electrode Apr. 25, 2006
7030015 Method for forming a titanium nitride layer Apr. 18, 2006
7029972 Method of manufacturing a metal-insulator-metal capacitor Apr. 18, 2006
7029983 Methods of forming MIM type capacitors by forming upper and lower electrode layers in a recess that exposes a source/drain region of a transistor and MIM capacitors so formed Apr. 18, 2006
7015049 Fence-free etching of iridium barrier having a steep taper angle Mar. 21, 2006
7015532 Capacitor compatible with high dielectric constant materials having a low contact resistance layer and the method for forming same Mar. 21, 2006
7015527 Metal oxynitride capacitor barrier layer Mar. 21, 2006
7015523 Ferroelectric memory structure and fabrication method thereof Mar. 21, 2006
7012001 Method for manufacturing a semiconductor device for use in a memory cell that includes forming a composite layer of tantalum oxide and titanium oxide over a bottom capacitor electrode Mar. 14, 2006
7009230 Barrier stack with improved barrier properties Mar. 7, 2006
7001781 Method for producing a ferroelectric capacitor that includes etching with hardmasks Feb. 21, 2006
7001821 Method of forming and using a hardmask for forming ferroelectric capacitors in a semiconductor device Feb. 21, 2006
7002193 Ferroelectric capacitor and method of manufacturing the same Feb. 21, 2006
7002202 Metal oxynitride capacitor barrier layer Feb. 21, 2006

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