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Class Information
Number: 257/E21.02
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Manufacture of two-terminal component for integrated circuit (epo) > Of capacitor (epo) > Formation of electrode (epo) > With increased surface area, e.g., by roughening, texturing (epo) > Having vertical extensions (epo) > Made by patterning layers, e.g., etching conductive layers (epo)
Description: This subclass is indented under subclass E21.018. This subclass is substantially the same in scope as ECLA classification H01L21/02B3C2V6.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7405418 |
Memory device electrode with a surface structure |
Jul. 29, 2008 |
| 7335526 |
Sensing system |
Feb. 26, 2008 |
| 7262108 |
Methods for forming resistors for integrated circuit devices |
Aug. 28, 2007 |
| 7241700 |
Methods for post offset spacer clean for improved selective epitaxy silicon growth |
Jul. 10, 2007 |
| 7187085 |
Semiconductor device including dual damascene interconnections |
Mar. 6, 2007 |
| 7115531 |
Organosilicate resins as hardmasks for organic polymer dielectrics in fabrication of microelectronic devices |
Oct. 3, 2006 |
| 7060454 |
Method for sorting antifungal molecules acting on the glucanosyltransferase activity |
Jun. 13, 2006 |
| 7041551 |
Device and a method for forming a capacitor device |
May. 9, 2006 |
| 7022495 |
Method for sorting antifungal molecules acting on the glucanosyltransferase activity |
Apr. 4, 2006 |
| 7015529 |
Localized masking for semiconductor structure development |
Mar. 21, 2006 |
| 6972451 |
Trench capacitor in a substrate with two floating electrodes independent from the substrate |
Dec. 6, 2005 |
| 6949431 |
Method for fabricating cylinder type capacitor |
Sep. 27, 2005 |
| 6844268 |
Method for fabricating a semiconductor storage device having an increased dielectric film area |
Jan. 18, 2005 |
| 6815754 |
Spacer patterned, high dielectric constant capacitor |
Nov. 9, 2004 |
| 6723602 |
Method for spacer patterned, high dielectric constant capacitor |
Apr. 20, 2004 |
| 6693002 |
Semiconductor device and its manufacture |
Feb. 17, 2004 |
| 6686234 |
Semiconductor device and method for fabricating the same |
Feb. 3, 2004 |
| 6646299 |
Integrated circuit configuration having at least two capacitors and method for manufacturing an integrated circuit configuration |
Nov. 11, 2003 |
| 6608344 |
Structure and manufacturing method of semiconductor device having uneven surface at memory cell capacitor part |
Aug. 19, 2003 |
| 6586794 |
Semiconductor device and its manufacture |
Jul. 1, 2003 |
| 6580112 |
Method for fabricating an open can-type stacked capacitor on an uneven surface |
Jun. 17, 2003 |
| 6573554 |
Localized masking for semiconductor structure development |
Jun. 3, 2003 |
| 6566702 |
Spacer patterned, high dielectric constant capacitor |
May. 20, 2003 |
| 6558999 |
Method for forming a storage electrode on a semiconductor device |
May. 6, 2003 |
| 6548346 |
Process for forming DRAM cell |
Apr. 15, 2003 |
| 6514812 |
Structure and manufacturing method of semiconductor device having uneven surface at memory cell capacitor part |
Feb. 4, 2003 |
| 6506660 |
Semiconductor with nanoscale features |
Jan. 14, 2003 |
| 6458654 |
Large surface area capacitor and methods for fabricating same |
Oct. 1, 2002 |
| 6451650 |
Low thermal budget method for forming MIM capacitor |
Sep. 17, 2002 |
| 6448605 |
Method of fabricating gate |
Sep. 10, 2002 |
| 6404005 |
Methods of forming capacitors and related integrated circuitry |
Jun. 11, 2002 |
| 6391708 |
Method of manufacturing DRAM capacitor |
May. 21, 2002 |
| 6387752 |
Semiconductor memory device and method of fabricating the same |
May. 14, 2002 |
| 6387750 |
Method of forming MIM capacitor |
May. 14, 2002 |
| 6372574 |
Method of forming a capacitor container electrode and method of patterning a metal layer by selectively silicizing the electrode or metal layer and removing the silicized portion |
Apr. 16, 2002 |
| 6358813 |
Method for increasing the capacitance of a semiconductor capacitors |
Mar. 19, 2002 |
| 6358793 |
Method for localized masking for semiconductor structure development |
Mar. 19, 2002 |
| 6352932 |
Methods of forming integrated circuitry and integrated circuitry structures |
Mar. 5, 2002 |
| 6346724 |
Semiconductor memory device having a capacitor over bit-line structure and method for manufacturing the same |
Feb. 12, 2002 |
| 6337173 |
Method for fabricating a semiconductor capacitor |
Jan. 8, 2002 |
| 6335257 |
Method of making pillar-type structure on semiconductor substrate |
Jan. 1, 2002 |
| 6329244 |
Method of manufacturing dynamic random access memory cell |
Dec. 11, 2001 |
| 6326276 |
Method for forming a capacitor in dram |
Dec. 4, 2001 |
| 6319771 |
Fabrication process for a lower electrode of a memory capacitor |
Nov. 20, 2001 |
| 6319790 |
Process for fabricating semiconductor device with multiple cylindrical capacitor |
Nov. 20, 2001 |
| 6316352 |
Method of fabricating a bottom electrode |
Nov. 13, 2001 |
| 6312986 |
Concentric container fin capacitor and method |
Nov. 6, 2001 |
| 6300196 |
Method of fabricating gate |
Oct. 9, 2001 |
| 6291293 |
Method for fabricating an open can-type stacked capacitor on an uneven surface |
Sep. 18, 2001 |
| 6288423 |
Composite gate structure memory cell having increased capacitance |
Sep. 11, 2001 |
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