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Class Information
Number: 257/E21.017
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Manufacture of two-terminal component for integrated circuit (epo) > Of capacitor (epo) > Formation of electrode (epo) > With increased surface area, e.g., by roughening, texturing (epo) > Having horizontal extensions (epo) > Made by patterning layers, e.g., etching conductive layers (epo)
Description: This subclass is indented under subclass E21.015. This subclass is substantially the same in scope as ECLA classification H01L21/02B3C2H6.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7407890 |
Patterning sub-lithographic features with variable widths |
Aug. 5, 2008 |
| 7338887 |
Plasma control method and plasma control apparatus |
Mar. 4, 2008 |
| 7332425 |
Simultaneous deposition and etch process for barrier layer formation in microelectronic device interconnects |
Feb. 19, 2008 |
| 7326647 |
Dry etching process to form a conductive layer within an opening without use of a mask during the formation of a semiconductor device |
Feb. 5, 2008 |
| 7320924 |
Method of producing a chip-type solid electrolytic capacitor |
Jan. 22, 2008 |
| 7294566 |
Method for forming wiring pattern, method for manufacturing device, device, electro-optic apparatus, and electronic equipment |
Nov. 13, 2007 |
| 7288482 |
Silicon nitride etching methods |
Oct. 30, 2007 |
| 7273816 |
Methods for removal of organic materials |
Sep. 25, 2007 |
| 7262108 |
Methods for forming resistors for integrated circuit devices |
Aug. 28, 2007 |
| 7256107 |
Damascene process for use in fabricating semiconductor structures having micro/nano gaps |
Aug. 14, 2007 |
| 7247562 |
Semiconductor element, semiconductor device and methods for manufacturing thereof |
Jul. 24, 2007 |
| 7241639 |
Color filter, manufacturing method thereof, electrooptical device and electronic equipment |
Jul. 10, 2007 |
| 7217987 |
Semiconductor device and manufacturing the same |
May. 15, 2007 |
| 7205226 |
Sacrificial layer for protection during trench etch |
Apr. 17, 2007 |
| 7172960 |
Multi-layer film stack for extinction of substrate reflections during patterning |
Feb. 6, 2007 |
| 6746877 |
Encapsulation of ferroelectric capacitors |
Jun. 8, 2004 |
| 6638818 |
Method of fabricating a dynamic random access memory with increased capacitance |
Oct. 28, 2003 |
| 6451650 |
Low thermal budget method for forming MIM capacitor |
Sep. 17, 2002 |
| 6417066 |
Method of forming a DRAM capacitor structure including increasing the surface area using a discrete silicon mask |
Jul. 9, 2002 |
| 6407423 |
Staggered-edge capacitor electrode |
Jun. 18, 2002 |
| 6403440 |
Method for fabricating a stacked capacitor in a semiconductor configuration, and stacked capacitor fabricated by this method |
Jun. 11, 2002 |
| 6373092 |
Staggered-edge capacitor electrode |
Apr. 16, 2002 |
| 6258656 |
Capacitor with high-.epsilon. dielectric or ferroelectric material based on the fin stack principle and production process using a negative mold |
Jul. 10, 2001 |
| 6218257 |
Method of forming semiconductor memory device |
Apr. 17, 2001 |
| 6211036 |
Semiconductor device having an improved capacitor structure, and a method of manufacturing the same |
Apr. 3, 2001 |
| 6146942 |
Method of manufacturing a semiconductor memory device |
Nov. 14, 2000 |
| 6121108 |
Method for fabricating a capacitor in a dynamic random access memory |
Sep. 19, 2000 |
| 6078493 |
Fin-shaped capacitor |
Jun. 20, 2000 |
| 6015988 |
Microstructure and methods for fabricating such structure |
Jan. 18, 2000 |
| 6008515 |
Stacked capacitor having improved charge storage capacity |
Dec. 28, 1999 |
| 5986300 |
Semiconductor memory device and method of manufacturing the same |
Nov. 16, 1999 |
| 5926716 |
Method for forming a structure |
Jul. 20, 1999 |
| 5851898 |
Method of forming stacked capacitor having corrugated side-wall structure |
Dec. 22, 1998 |
| 5834357 |
Fabricating method of making a fin shaped capacitor |
Nov. 10, 1998 |
| 5830807 |
Successive dry etching of alternating laminate |
Nov. 3, 1998 |
| 5827783 |
Stacked capacitor having improved charge storage capacity |
Oct. 27, 1998 |
| 5824593 |
Method for making a capacitor on a semiconductor device |
Oct. 20, 1998 |
| 5807782 |
Method of manufacturing a stacked capacitor having a fin-shaped storage electrode on a dynamic random access memory cell |
Sep. 15, 1998 |
| 5792692 |
Method of fabricating a twin hammer tree shaped capacitor structure for a dram device |
Aug. 11, 1998 |
| 5476807 |
Method for forming fine patterns in a semiconductor device |
Dec. 19, 1995 |
| 5422295 |
Method for forming a semiconductor memory device having a vertical multi-layered storage electrode |
Jun. 6, 1995 |
| 5350707 |
Method for making a capacitor having an electrode surface with a plurality of trenches formed therein |
Sep. 27, 1994 |
| 5240871 |
Corrugated storage contact capacitor and method for forming a corrugated storage contact capacitor |
Aug. 31, 1993 |
| 5160987 |
Three-dimensional semiconductor structures formed from planar layers |
Nov. 3, 1992 |
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