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Browse by Category: Main > Physics
Class Information
Number: 257/E21.013
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Manufacture of two-terminal component for integrated circuit (epo) > Of capacitor (epo) > Formation of electrode (epo) > With increased surface area, e.g., by roughening, texturing (epo) > With rough surface, e.g., using hemispherical grains (epo)
Description: This subclass is indented under subclass E21.012. This subclass is substantially the same in scope as ECLA classification H01L21/02B3C2B.










Patents under this class:
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Patent Number Title Of Patent Date Issued
8575000 Copper interconnects separated by air gaps and method of making thereof Nov. 5, 2013
8441077 Method for forming a ruthenium metal layer and a structure comprising the ruthenium metal layer May. 14, 2013
8426286 Method and device for a DRAM capacitor having low depletion ratio Apr. 23, 2013
8384143 Semiconductor device and manufacturing method therefor Feb. 26, 2013
8268703 Surface roughening process Sep. 18, 2012
8252703 Methods for forming roughened surfaces and applications thereof Aug. 28, 2012
8203176 Dielectric, capacitor using dielectric, semiconductor device using dielectric, and manufacturing method of dielectric Jun. 19, 2012
8169015 Semiconductor device and manufacturing method therefor May. 1, 2012
8080483 Double gyroid structure nanoporous films and nanowire networks Dec. 20, 2011
8080474 Method for making electrode Dec. 20, 2011
8071476 Cobalt titanium oxide dielectric films Dec. 6, 2011
8039344 Methods of forming a capacitor structure and methods of manufacturing a semiconductor device using the same Oct. 18, 2011
8021974 Structure and method for back end of the line integration Sep. 20, 2011
8012858 Method of fabricating semiconductor device Sep. 6, 2011
7989362 Hafnium lanthanide oxynitride films Aug. 2, 2011
7872291 Enhanced atomic layer deposition Jan. 18, 2011
7867885 Post structure, semiconductor device and light emitting device using the structure, and method for forming the same Jan. 11, 2011
7825043 Method for fabricating capacitor in semiconductor device Nov. 2, 2010
7812450 Electrode with nano-sized structures Oct. 12, 2010
7807477 Varactors and methods of manufacture and use Oct. 5, 2010
7781820 Semiconductor memory device and method of manufacturing the same Aug. 24, 2010
7741176 Method for fabricating a cylindrical capacitor including implanting impurities into the upper sections of the lower electrode to prevent the formation of hemispherical grain silicon on the upp Jun. 22, 2010
7732316 Method for manufacturing a semiconductor device Jun. 8, 2010
7709877 High surface area capacitor structures and precursors May. 4, 2010
7704883 Annealing to improve edge roughness in semiconductor technology Apr. 27, 2010
7662694 Capacitor having adjustable capacitance, and printed wiring board having the same Feb. 16, 2010
7642157 Method for enhancing electrode surface area in DRAM cell capacitors Jan. 5, 2010
7563730 Hafnium lanthanide oxynitride films Jul. 21, 2009
7560360 Methods for enhancing trench capacitance and trench capacitor Jul. 14, 2009
7544604 Tantalum lanthanide oxynitride films Jun. 9, 2009
7491601 Methods of forming electronic devices including electrodes with insulating spacers thereon Feb. 17, 2009
7432152 Methods of forming HSG layers and devices Oct. 7, 2008
7427545 Trench memory cells with buried isolation collars, and methods of fabricating same Sep. 23, 2008
7364968 Capacitor in semiconductor device and manufacturing method Apr. 29, 2008
7314795 Methods of forming electronic devices including electrodes with insulating spacers thereon Jan. 1, 2008
7271050 Silicon nanocrystal capacitor and process for forming same Sep. 18, 2007
7271051 Methods of forming a plurality of capacitor devices Sep. 18, 2007
7256147 Porous body and manufacturing method therefor Aug. 14, 2007
7247177 Production method for electric double-layer capacitor Jul. 24, 2007
7052956 Method for forming capacitor of semiconductor device May. 30, 2006
7052957 Methods of fabricating double-sided hemispherical silicon grain electrodes and capacitor modules May. 30, 2006
7053432 Enhanced surface area capacitor fabrication methods May. 30, 2006
7041570 Method of forming a capacitor May. 9, 2006
7038318 Compound structure for reduced contact resistance May. 2, 2006
7037829 Compound structure for reduced contact resistance May. 2, 2006
7034353 Methods for enhancing capacitors having roughened features to increase charge-storage capacity Apr. 25, 2006
7029985 Method of forming MIS capacitor Apr. 18, 2006
7026222 Method of forming a capacitor Apr. 11, 2006
7022570 Methods of forming hemispherical grained silicon on a template on a semiconductor work object Apr. 4, 2006
7019351 Transistor devices, and methods of forming transistor devices and circuit devices Mar. 28, 2006

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