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Class Information
Number: 257/E21.012
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Manufacture of two-terminal component for integrated circuit (epo) > Of capacitor (epo) > Formation of electrode (epo) > With increased surface area, e.g., by roughening, texturing (epo)
Description: This subclass is indented under subclass E21.011. This subclass is substantially the same in scope as ECLA classification H01L21/02B3C2.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7427545 |
Trench memory cells with buried isolation collars, and methods of fabricating same |
Sep. 23, 2008 |
| 7408216 |
Device, system, and method for a trench capacitor having micro-roughened semiconductor surfaces |
Aug. 5, 2008 |
| 7405418 |
Memory device electrode with a surface structure |
Jul. 29, 2008 |
| 7354823 |
Methods of forming integrated circuit devices having carbon nanotube electrodes therein |
Apr. 8, 2008 |
| 7341906 |
Method of manufacturing sidewall spacers on a memory device, and device comprising same |
Mar. 11, 2008 |
| 7322098 |
Method of simultaneous two-disk processing of single-sided magnetic recording disks |
Jan. 29, 2008 |
| 7276412 |
MIM capacitor of semiconductor device and manufacturing method thereof |
Oct. 2, 2007 |
| 7253102 |
Methods for forming and integrated circuit structures containing enhanced-surface-area conductive layers |
Aug. 7, 2007 |
| 7247177 |
Production method for electric double-layer capacitor |
Jul. 24, 2007 |
| 7112505 |
Method of selectively etching HSG layer in deep trench capacitor fabrication |
Sep. 26, 2006 |
| 7060615 |
Methods of forming roughened layers of platinum |
Jun. 13, 2006 |
| 7022581 |
Interdigitaded capacitors |
Apr. 4, 2006 |
| 6975500 |
Capacitor having improved electrodes |
Dec. 13, 2005 |
| 6963122 |
Capacitor structure and automated design flow for incorporating same |
Nov. 8, 2005 |
| 6933552 |
High surface area capacitors and intermediate storage poly structures formed during fabrication thereof |
Aug. 23, 2005 |
| 6924969 |
Silicon nanocrystal capacitor and process for forming same |
Aug. 2, 2005 |
| 6913966 |
Method for stabilizing or offsetting voltage in an integrated circuit |
Jul. 5, 2005 |
| 6885542 |
Capacitor structure |
Apr. 26, 2005 |
| 6864526 |
Capacitor with via plugs forming first and second electrodes in a multilayer wiring structure of a semiconductor device |
Mar. 8, 2005 |
| 6838338 |
Integrated capacitor bottom electrode for use with conformal dielectric |
Jan. 4, 2005 |
| 6831324 |
Method of producing rough polysilicon by the use of pulsed plasma chemical vapor deposition and products produced by the same |
Dec. 14, 2004 |
| 6828190 |
Method for manufacturing capacitor of semiconductor device having dielectric layer of high dielectric constant |
Dec. 7, 2004 |
| 6825520 |
Capacitor with a roughened silicide layer |
Nov. 30, 2004 |
| 6825095 |
Methods of forming capacitors |
Nov. 30, 2004 |
| 6812112 |
Methods for forming and integrated circuit structures containing enhanced-surface-area conductive layers |
Nov. 2, 2004 |
| 6808983 |
Silicon nanocrystal capacitor and process for forming same |
Oct. 26, 2004 |
| 6787482 |
Method to form a DRAM capacitor using low temperature reoxidation |
Sep. 7, 2004 |
| 6787839 |
Capacitor structure |
Sep. 7, 2004 |
| 6780758 |
Method of establishing electrical contact between a semiconductor substrate and a semiconductor device |
Aug. 24, 2004 |
| 6780706 |
Semiconductor container structure with diffusion barrier |
Aug. 24, 2004 |
| 6777770 |
Films deposited at glancing incidence for multilevel metallization |
Aug. 17, 2004 |
| 6764943 |
Methods for forming and integrated circuit structures containing enhanced-surface-area conductive layers |
Jul. 20, 2004 |
| 6759305 |
Method for increasing the capacity of an integrated circuit device |
Jul. 6, 2004 |
| 6756283 |
Method of fabricating a high surface area capacitor electrode |
Jun. 29, 2004 |
| 6756627 |
Container capacitor |
Jun. 29, 2004 |
| 6746940 |
Integrated structure comprising a patterned feature substantially of single grain polysilicon |
Jun. 8, 2004 |
| 6743671 |
Metal-on-metal capacitor with conductive plate for preventing parasitic capacitance and method of making the same |
Jun. 1, 2004 |
| 6740923 |
Capacitor structure |
May. 25, 2004 |
| 6690570 |
Highly efficient capacitor structures with enhanced matching properties |
Feb. 10, 2004 |
| 6682984 |
Method of making a concave capacitor |
Jan. 27, 2004 |
| 6670663 |
DRAM cell capacitor and manufacturing method thereof |
Dec. 30, 2003 |
| 6642565 |
Miniaturized capacitor with solid-state dielectric, in particular for integrated semiconductor memories, E.G. DRAMS, and method for fabricating such a capacitor |
Nov. 4, 2003 |
| 6617208 |
High capacitance damascene capacitors |
Sep. 9, 2003 |
| 6600209 |
Mesh capacitor structure in an integrated circuit |
Jul. 29, 2003 |
| 6597562 |
Electrically polar integrated capacitor and method of making same |
Jul. 22, 2003 |
| 6586329 |
Semiconductor device and a method of manufacturing thereof |
Jul. 1, 2003 |
| 6583022 |
Methods of forming roughened layers of platinum and methods of forming capacitors |
Jun. 24, 2003 |
| 6576947 |
Cylindrical capacitor and method for fabricating same |
Jun. 10, 2003 |
| 6573552 |
Method to form hemispherical grained polysilicon |
Jun. 3, 2003 |
| 6570210 |
Multilayer pillar array capacitor structure for deep sub-micron CMOS |
May. 27, 2003 |
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