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Class Information
Number: 257/E21.002
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo)
Description: This subclass is indented under subclass E21.001. This subclass is substantially the same in scope as ECLA classification H01L21/02.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7459394 |
Methods of manufacturing semiconductor devices |
Dec. 2, 2008 |
| 7456084 |
Method of using a setter having a recess in manufacturing a net-shape semiconductor wafer |
Nov. 25, 2008 |
| 7456926 |
Liquid crystal display device |
Nov. 25, 2008 |
| 7452751 |
Semiconductor device and method of manufacturing the same |
Nov. 18, 2008 |
| 7446028 |
Multi-component integrated circuit contacts |
Nov. 4, 2008 |
| 7442636 |
Method of inhibiting copper corrosion during supercritical CO.sub.2 cleaning |
Oct. 28, 2008 |
| 7419917 |
Ion implanted microscale and nanoscale device method |
Sep. 2, 2008 |
| 7416967 |
Semiconductor device, and method for manufacturing the same |
Aug. 26, 2008 |
| 7416969 |
Void free solder arrangement for screen printing semiconductor wafers |
Aug. 26, 2008 |
| 7411260 |
Semiconductor device and manufacturing method thereof |
Aug. 12, 2008 |
| 7410903 |
Methods of patterning substrates |
Aug. 12, 2008 |
| 7407819 |
Polymer memory having a ferroelectric polymer memory material with cell sizes that are asymmetric |
Aug. 5, 2008 |
| 7407889 |
Method of manufacturing article having uneven surface |
Aug. 5, 2008 |
| 7393756 |
Method for fabricating a trench isolation structure having a high aspect ratio |
Jul. 1, 2008 |
| 7364942 |
Process for wafer level treatment to reduce stiction and passivate micromachined surfaces and compounds used therefor |
Apr. 29, 2008 |
| 7364953 |
Manufacturing method to construct semiconductor-on-insulator with conductor layer sandwiched between buried dielectric layer and semiconductor layers |
Apr. 29, 2008 |
| 7344907 |
Apparatus and methods for encapsulating microelectromechanical (MEM) devices on a wafer scale |
Mar. 18, 2008 |
| 7332388 |
Method to simultaneously form both fully silicided and partially silicided dual work function transistor gates during the manufacture of a semiconductor device, semiconductor devices, and syst |
Feb. 19, 2008 |
| 7329615 |
Atomic layer deposition method of forming an oxide comprising layer on a substrate |
Feb. 12, 2008 |
| 7314836 |
Enhanced nitride layers for metal oxide semiconductors |
Jan. 1, 2008 |
| 7314837 |
Chemical treatment of semiconductor substrates |
Jan. 1, 2008 |
| 7288468 |
Luminescent efficiency of semiconductor nanocrystals by surface treatment |
Oct. 30, 2007 |
| 7282436 |
Plasma treatment for silicon-based dielectrics |
Oct. 16, 2007 |
| 7271096 |
Method for improved deposition of dielectric material |
Sep. 18, 2007 |
| 7271101 |
High density plasma chemical vapor deposition process |
Sep. 18, 2007 |
| 7226863 |
Methods for removal of organic materials |
Jun. 5, 2007 |
| 7217647 |
Structure and method of making a semiconductor integrated circuit tolerant of mis-alignment of a metal contact pattern |
May. 15, 2007 |
| 7189591 |
Process for producing light-emitting semiconductor device |
Mar. 13, 2007 |
| 7186570 |
Method of manufacturing ceramic film, method of manufacturing ferroelectric capacitor, ceramic film, ferroelectric capacitor, and semiconductor device |
Mar. 6, 2007 |
| 7186655 |
Method for manufacturing semiconductor device |
Mar. 6, 2007 |
| 7183146 |
Method of manufacturing semiconductor device |
Feb. 27, 2007 |
| 7183198 |
Method for forming a hardmask employing multiple independently formed layers of a capping material to reduce pinholes |
Feb. 27, 2007 |
| 7179747 |
Use of supercritical fluid for low effective dielectric constant metallization |
Feb. 20, 2007 |
| 7172948 |
Method to avoid a laser marked area step height |
Feb. 6, 2007 |
| 7166545 |
Production method for semiconductor device |
Jan. 23, 2007 |
| 7163884 |
Semiconductor device and fabrication method thereof |
Jan. 16, 2007 |
| 7163902 |
Infra-red light-emitting device and method for preparing the same |
Jan. 16, 2007 |
| 7157351 |
Ozone vapor clean method |
Jan. 2, 2007 |
| 7151049 |
Electroplating compositions and methods |
Dec. 19, 2006 |
| 7144799 |
Method for pre-retaining CB opening |
Dec. 5, 2006 |
| 7141852 |
Semiconductor device and fabricating method thereof |
Nov. 28, 2006 |
| 7125324 |
Insulated pad conditioner and method of using same |
Oct. 24, 2006 |
| 7122414 |
Method to fabricate dual metal CMOS devices |
Oct. 17, 2006 |
| 7119034 |
Atomic layer deposition method of forming an oxide comprising layer on a substrate |
Oct. 10, 2006 |
| 7119012 |
Stabilization of Ni monosilicide thin films in CMOS devices using implantation of ions before silicidation |
Oct. 10, 2006 |
| 7119007 |
Production method of semiconductor device |
Oct. 10, 2006 |
| 7119014 |
Method for fabricating a semiconductor device having a tapered-mesa side-wall film |
Oct. 10, 2006 |
| 7113881 |
Method and apparatus for semi-automatic extraction and monitoring of diode ideality in a manufacturing environment |
Sep. 26, 2006 |
| 7112545 |
Passivation of material using ultra-fast pulsed laser |
Sep. 26, 2006 |
| 7105363 |
Cladded conductor for use in a magnetoelectronics device and method for fabricating the same |
Sep. 12, 2006 |
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