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Browse by Category: Main > Physics
Class Information
Number: 257/767
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Combined with electrical contact or lead > Of specified material other than unalloyed aluminum > Resistive to electromigration or diffusion of the contact or lead material
Description: Subject matter wherein an electrical contact or lead material is adapted to resist electromigration of the contact or lead material, or diffusion of the contact or lead material into the material to which the contact is attached.


Patents under this class:
1 2 3 4 5 6 7 8 9

Patent Number Title Of Patent Date Issued
7598614 Low leakage metal-containing cap process using oxidation Oct. 6, 2009
7586198 Innerlayer panels and printed wiring boards with embedded fiducials Sep. 8, 2009
7547972 Laminated structure, very-large-scale integrated circuit wiring board, and method of formation thereof Jun. 16, 2009
7533193 Apparatus and method for reducing electromigration May. 12, 2009
7511378 Enhancement of performance of a conductive wire in a multilayered substrate Mar. 31, 2009
7508082 Semiconductor device and method of manufacturing the same Mar. 24, 2009
7504674 Electronic apparatus having a core conductive structure within an insulating layer Mar. 17, 2009
7495317 Semiconductor package with ferrite shielding structure Feb. 24, 2009
7495338 Metal capped copper interconnect Feb. 24, 2009
7446392 Electronic device and method for manufacturing the same Nov. 4, 2008
7436066 Semiconductor element Oct. 14, 2008
7422977 Copper adhesion improvement device and method Sep. 9, 2008
7414275 Multi-level interconnections for an integrated circuit chip Aug. 19, 2008
7397126 Semiconductor device Jul. 8, 2008
7372160 Barrier film deposition over metal for reduction in metal dishing after CMP May. 13, 2008
7339274 Metallization performance in electronic devices Mar. 4, 2008
7339270 Semiconductor device and method for fabricating the same Mar. 4, 2008
7332814 Bondwire utilized for coulomb counting and safety circuits Feb. 19, 2008
7327031 Semiconductor device and method of manufacturing the same Feb. 5, 2008
7303988 Methods of manufacturing multi-level metal lines in semiconductor devices Dec. 4, 2007
7301241 Semiconductor device for preventing defective filling of interconnection and cracking of insulating film Nov. 27, 2007
7301239 Wiring structure to minimize stress induced void formation Nov. 27, 2007
7298021 Electronic device and method for manufacturing the same Nov. 20, 2007
7276796 Formation of oxidation-resistant seed layer for interconnect applications Oct. 2, 2007
7271097 Method for manufacturing a semiconductor protection element and a semiconductor device Sep. 18, 2007
7271700 Thin film resistor with current density enhancing layer (CDEL) Sep. 18, 2007
7265450 Semiconductor device and method for fabricating the same Sep. 4, 2007
7262473 Metal to polysilicon contact in oxygen environment Aug. 28, 2007
7242097 Electromigration barrier layers for solder joints Jul. 10, 2007
7238626 Chemically and electrically stabilized polymer films Jul. 3, 2007
7235844 Power composite integrated semiconductor device and manufacturing method thereof Jun. 26, 2007
7233071 Low-k dielectric layer based upon carbon nanostructures Jun. 19, 2007
7224063 Dual-damascene metallization interconnection May. 29, 2007
7224009 Method for forming a low leakage contact in a CMOS imager May. 29, 2007
7215029 Multilayer interconnection structure of a semiconductor May. 8, 2007
7205667 Semiconductor device having copper wiring Apr. 17, 2007
7196420 Method and structure for creating ultra low resistance damascene copper wiring Mar. 27, 2007
7193327 Barrier structure for semiconductor devices Mar. 20, 2007
7187080 Semiconductor device with a conductive layer including a copper layer with a dopant Mar. 6, 2007
7187079 Stacked memory cell having diffusion barriers Mar. 6, 2007
7164205 Semiconductor carrier film, and semiconductor device and liquid crystal module using the same Jan. 16, 2007
7164206 Structure in a microelectronic device including a bi-layer for a diffusion barrier and an etch-stop layer Jan. 16, 2007
7164207 Wiring structure for semiconductor device Jan. 16, 2007
7151315 Method of a non-metal barrier copper damascene integration Dec. 19, 2006
7145241 Semiconductor device having a multilayer interconnection structure and fabrication process thereof Dec. 5, 2006
7141880 Metal line stacking structure in semiconductor device and formation method thereof Nov. 28, 2006
7129582 Reducing the migration of grain boundaries Oct. 31, 2006
7115997 Seedless wirebond pad plating Oct. 3, 2006
7088000 Method and structure to wire electronic devices Aug. 8, 2006
7087999 Semiconductor protection element, semiconductor device and method for manufacturing same Aug. 8, 2006

1 2 3 4 5 6 7 8 9


 
 
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