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Class Information
Number: 257/765
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Combined with electrical contact or lead > Of specified material other than unalloyed aluminum > Layered > At least one layer of an alloy containing aluminum
Description: Subject matter wherein a layered electrical contact or lead has at least one layer of an alloy containing aluminum (Al).


Patents under this class:
1 2 3 4 5 6 7 8 9

Patent Number Title Of Patent Date Issued
7615868 Electrode, method for producing same and semiconductor device using same Nov. 10, 2009
7566964 Aluminum pad power bus and signal routing for integrated circuit devices utilizing copper technology interconnect structures Jul. 28, 2009
7564061 Field effect transistor and production method thereof Jul. 21, 2009
7547916 Electronic circuit Jun. 16, 2009
7545040 Copper alloy for wiring, semiconductor device, method for forming wiring and method for manufacturing semiconductor device Jun. 9, 2009
7531904 Al-Ni-B alloy wiring material and element structure using the same May. 12, 2009
7518245 Contact structure of a semiconductor device Apr. 14, 2009
7507996 Contact structure of a wiring and a thin film transistor array panel including the same Mar. 24, 2009
7501706 Semiconductor devices to reduce stress on a metal interconnect Mar. 10, 2009
7495339 Connection structure and method for fabricating the same Feb. 24, 2009
7482693 Top layers of metal for high performance IC's Jan. 27, 2009
7470992 Barrier layer stack to prevent Ti diffusion Dec. 30, 2008
7456468 Semiconductor device including high-k insulating layer and method of manufacturing the same Nov. 25, 2008
7446392 Electronic device and method for manufacturing the same Nov. 4, 2008
7436065 Electrode contact structure Oct. 14, 2008
7425765 Zinc-aluminum solder alloy Sep. 16, 2008
7420277 System for heat dissipation in semiconductor devices Sep. 2, 2008
7358611 System and method for adjusting the ratio of deposition times to optimize via density and via fill in aluminum multilayer metallization Apr. 15, 2008
7335990 Process of forming a composite diffusion barrier in copper/organic low-k damascene technology Feb. 26, 2008
7323783 Electrode, method for producing same and semiconductor device using same Jan. 29, 2008
7307344 Semiconductor device including a discontinuous film and method for manufacturing the same Dec. 11, 2007
7303988 Methods of manufacturing multi-level metal lines in semiconductor devices Dec. 4, 2007
RE39932 Semiconductor interconnect formed over an insulation and having moisture resistant material Dec. 4, 2007
7301241 Semiconductor device for preventing defective filling of interconnection and cracking of insulating film Nov. 27, 2007
7298021 Electronic device and method for manufacturing the same Nov. 20, 2007
7294565 Method of fabricating a wire bond pad with Ni/Au metallization Nov. 13, 2007
7294570 Contact integration method Nov. 13, 2007
7294851 Dense seed layer and method of formation Nov. 13, 2007
7294858 Semiconductor device and method of manufacturing the same Nov. 13, 2007
7276795 Small grain size, conformal aluminum interconnects and method for their formation Oct. 2, 2007
7253501 High performance metallization cap layer Aug. 7, 2007
7253519 Chip packaging structure having redistribution layer with recess Aug. 7, 2007
7235844 Power composite integrated semiconductor device and manufacturing method thereof Jun. 26, 2007
7226858 Submicron contact fill using a CVD TiN barrier and high temperature PVD aluminum alloy deposition Jun. 5, 2007
7224065 Contact/via force fill techniques and resulting structures May. 29, 2007
7224066 Bonding material and circuit device using the same May. 29, 2007
7215029 Multilayer interconnection structure of a semiconductor May. 8, 2007
7193326 Mold type semiconductor device Mar. 20, 2007
7189645 System and method for adjusting the ratio of deposition times to optimize via density and via fill in aluminum multilayer metallization Mar. 13, 2007
7166921 Aluminum alloy film for wiring and sputter target material for forming the film Jan. 23, 2007
7161211 Aluminum-containing film derived from using hydrogen and oxygen gas in sputter deposition Jan. 9, 2007
7154180 Electronic device, method of manufacture of the same, and sputtering target Dec. 26, 2006
7135770 Semiconductor element with conductive columnar projection and a semiconductor device with conductive columnar projection Nov. 14, 2006
7129582 Reducing the migration of grain boundaries Oct. 31, 2006
7119440 Back end IC wiring with improved electro-migration resistance Oct. 10, 2006
7098539 Electronic device, method of manufacture of the same, and sputtering target Aug. 29, 2006
7091609 Semiconductor devices including an alloy layer and a wetting layer on an interlayer dielectric Aug. 15, 2006
7087998 Control of air gap position in a dielectric layer Aug. 8, 2006
7078733 Aluminum alloyed layered structure for an optical device Jul. 18, 2006
7064441 Semiconductor device and method of manufacturing the same Jun. 20, 2006

1 2 3 4 5 6 7 8 9


 
 
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