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Class Information
Number: 257/760
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Combined with electrical contact or lead > Of specified material other than unalloyed aluminum > Layered > Multiple metal levels on semiconductor, separated by insulating layer (e.g., multiple level metallization for integrated circuit) > Separating insulating layer is laminate or composite of plural insulating materials (e.g., silicon oxide on silicon nitride, silicon oxynitride)
Description: Subject matter wherein there is at least one separating insulator layer between different metal layers, which separating insulator layer is itself made up of plural sublayers, or which separating insulator layer is a composite such as a mixture of silicon oxide and silicon nitride.


Patents under this class:
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Patent Number Title Of Patent Date Issued
7619283 Methods of fabricating glass-based substrates and apparatus employing same Nov. 17, 2009
7619310 Semiconductor interconnect and method of making same Nov. 17, 2009
7612453 Semiconductor device having an interconnect structure and a reinforcing insulating film Nov. 3, 2009
7608926 Nonvolatile semiconductor memory device Oct. 27, 2009
7608928 Laminated body and semiconductor device Oct. 27, 2009
7605472 Interconnections having double capping layer and method for forming the same Oct. 20, 2009
7605471 Semiconductor devices and methods for manufacturing the same Oct. 20, 2009
7602048 Semiconductor device and semiconductor wafer having a multi-layered insulation film Oct. 13, 2009
7602066 Method of filling structures for forming via-first dual damascene interconnects Oct. 13, 2009
7602067 Hetero-structure variable silicon rich nitride for multiple level memory flash memory device Oct. 13, 2009
7595556 Semiconductor device and method for manufacturing the same Sep. 29, 2009
7595555 Method of forming air gaps in a dielectric material using a sacrificial film and resulting structures Sep. 29, 2009
7595010 Method for producing a doped nitride film, doped oxide film and other doped films Sep. 29, 2009
7592660 Semiconductor device and method for manufacturing the same Sep. 22, 2009
7592710 Bond pad structure for wire bonding Sep. 22, 2009
7586132 Power FET with low on-resistance using merged metal layers Sep. 8, 2009
7582970 Carbon containing silicon oxide film having high ashing tolerance and adhesion Sep. 1, 2009
7582969 Hermetic interconnect structure and method of manufacture Sep. 1, 2009
7576440 Semiconductor chip having bond pads and multi-chip package Aug. 18, 2009
7572571 Image sensor and method for manufacturing the same Aug. 11, 2009
7572728 Semiconductor device and method for manufacturing the same Aug. 11, 2009
7564132 Semiconductor chip Jul. 21, 2009
7554200 Semiconductor devices including porous insulators Jun. 30, 2009
7553757 Semiconductor device and method of manufacturing the same Jun. 30, 2009
7550824 Low k interconnect dielectric using surface transformation Jun. 23, 2009
7550822 Dual-damascene metal wiring patterns for integrated circuit devices Jun. 23, 2009
7550788 Semiconductor device having fuse element arranged between electrodes formed in different wiring layers Jun. 23, 2009
7550823 Nonvolatile memory cell, array thereof, fabrication methods thereof and device comprising the same Jun. 23, 2009
7547977 Semiconductor chip having bond pads Jun. 16, 2009
7544992 Illuminating efficiency-increasable and light-erasable embedded memory structure Jun. 9, 2009
7544983 MTJ read head with sidewall spacers Jun. 9, 2009
7544608 Porous and dense hybrid interconnect structure and method of manufacture Jun. 9, 2009
7541682 Semiconductor chip having bond pads Jun. 2, 2009
7541638 Symmetrical and self-aligned non-volatile memory structure Jun. 2, 2009
7541646 Thin film transistor device and method of manufacturing the same Jun. 2, 2009
7535107 Tiled construction of layered materials May. 19, 2009
7521802 Semiconductor device having a refractory metal containing film and method for manufacturing the same Apr. 21, 2009
7521381 Method for producing silicon wafer and silicon wafer Apr. 21, 2009
7518246 Atomic layer deposition of CeO.sub.2/Al.sub.2O.sub.3 films as gate dielectrics Apr. 14, 2009
7518242 Semiconductor testing device Apr. 14, 2009
7514779 Multilayer build-up wiring board Apr. 7, 2009
7508076 Information handling system including a circuitized substrate having a dielectric layer without continuous fibers Mar. 24, 2009
7507656 Method and structure for low k interlayer dielectric layer Mar. 24, 2009
7504731 Interconnect structure to reduce stress induced voiding effect Mar. 17, 2009
7504699 Fabrication of a semiconductor device with air gaps for ultra-low capacitance interconnections Mar. 17, 2009
7498677 Semiconductor device Mar. 3, 2009
7495337 Dual-gate device and method Feb. 24, 2009
7488428 Method for forming stacked via-holes in printed circuit boards Feb. 10, 2009
7485964 Dielectric material Feb. 3, 2009
7485915 Semiconductor device and method having capacitor and capacitor insulating film that includes preset metal element Feb. 3, 2009

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