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Class Information
Number: 257/755
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Combined with electrical contact or lead > Of specified material other than unalloyed aluminum > Layered > At least one layer of silicide or polycrystalline silicon > Polysilicon laminated with silicide
Description: Subject matter wherein the layers include a polysilicon laminated with a silicide.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7423344 |
Bi-layer etch stop process for defect reduction and via stress migration improvement |
Sep. 9, 2008 |
| 7417290 |
Air break for improved silicide formation with composite caps |
Aug. 26, 2008 |
| 7399702 |
Methods of forming silicide |
Jul. 15, 2008 |
| 7397123 |
Semiconductor integrated circuit device and process for manufacturing the same |
Jul. 8, 2008 |
| 7368801 |
Semiconductor electrically programmable fuse element with amorphous silicon layer after programming and method of programming the same |
May. 6, 2008 |
| 7294893 |
Titanium silicide boride gate electrode |
Nov. 13, 2007 |
| 7250680 |
Semiconductor circuitry constructions |
Jul. 31, 2007 |
| 7241697 |
Method for sensor edge control and track width definition for narrow track width devices |
Jul. 10, 2007 |
| 7241698 |
Method for sensor edge and mask height control for narrow track width devices |
Jul. 10, 2007 |
| 7228614 |
Method of manufacturing a gas flow meter |
Jun. 12, 2007 |
| 7224009 |
Method for forming a low leakage contact in a CMOS imager |
May. 29, 2007 |
| 7148535 |
Zero capacitance bondpad utilizing active negative capacitance |
Dec. 12, 2006 |
| 7112854 |
Thin-film transistor and method of fabricating the same |
Sep. 26, 2006 |
| 7091610 |
Self-aligned contacts to gates |
Aug. 15, 2006 |
| 7052944 |
Thin-film transistor and method of manufacture thereof |
May. 30, 2006 |
| 7030451 |
Method and apparatus for performing nickel salicidation |
Apr. 18, 2006 |
| 7005744 |
Conductor line stack having a top portion of a second layer that is smaller than the bottom portion |
Feb. 28, 2006 |
| 6995411 |
Image sensor with vertically integrated thin-film photodiode |
Feb. 7, 2006 |
| 6960832 |
Semiconductor device and its production process |
Nov. 1, 2005 |
| 6924544 |
Semiconductor device and manufacturing method of the same |
Aug. 2, 2005 |
| 6882018 |
Semiconductor device that include silicide layers |
Apr. 19, 2005 |
| 6876045 |
Semiconductor device and process for manufacturing the same |
Apr. 5, 2005 |
| 6873051 |
Nickel silicide with reduced interface roughness |
Mar. 29, 2005 |
| 6861751 |
Etch stop layer for use in a self-aligned contact etch |
Mar. 1, 2005 |
| 6858934 |
Semiconductor device structures including metal silicide interconnect structures that extend at least partially over transistor gate structures and methods for making the same |
Feb. 22, 2005 |
| 6852566 |
Self-aligned rear electrode for diode array element |
Feb. 8, 2005 |
| 6841879 |
Semiconductor device |
Jan. 11, 2005 |
| 6812578 |
Semiconductor device bonding pad resistant to stress and method of fabricating the same |
Nov. 2, 2004 |
| 6812551 |
Defect-free dielectric coatings and preparation thereof using polymeric nitrogenous porogens |
Nov. 2, 2004 |
| 6800911 |
Method of making a polycide interconnection layer having a silicide film formed on a polycrystal silicon for a semiconductor device |
Oct. 5, 2004 |
| 6787833 |
Integrated circuit having a barrier structure |
Sep. 7, 2004 |
| 6770972 |
Method for electrical interconnection employing salicide bridge |
Aug. 3, 2004 |
| 6759741 |
Matched set of integrated circuit chips selected from a multi wafer-interposer |
Jul. 6, 2004 |
| 6737716 |
Semiconductor device and method of manufacturing the same |
May. 18, 2004 |
| 6727549 |
Method of delaminating a pre-fabricated transistor layer from a substrate for placement on another wafer |
Apr. 27, 2004 |
| 6713872 |
Multilayered semiconductor device |
Mar. 30, 2004 |
| 6710413 |
Salicide field effect transistors with improved borderless contact structures and a method of fabrication |
Mar. 23, 2004 |
| 6700211 |
Method for forming conductors in semiconductor devices |
Mar. 2, 2004 |
| 6693354 |
Semiconductor structure with substantially etched nitride defects protruding therefrom |
Feb. 17, 2004 |
| 6677650 |
Silicon plugs and local interconnect for embedded memory and system-on-chip (SOC) applications |
Jan. 13, 2004 |
| 6642601 |
Low current substantially silicide fuse for integrated circuits |
Nov. 4, 2003 |
| 6642621 |
Capacitor-type semiconductor device |
Nov. 4, 2003 |
| 6639261 |
Method for forming a low leakage contact in a CMOS imager |
Oct. 28, 2003 |
| 6635939 |
Boron incorporated diffusion barrier material |
Oct. 21, 2003 |
| 6605490 |
Semiconductor device and production process thereof |
Aug. 12, 2003 |
| 6573571 |
Semiconductor structure including metal nitride and metal silicide layers over active area and gate stack |
Jun. 3, 2003 |
| 6566754 |
Polycrystalline semiconductor device and its manufacture method |
May. 20, 2003 |
| 6555887 |
Semiconductor device with multi-layer interconnection |
Apr. 29, 2003 |
| 6541866 |
Cobalt barrier for nickel silicidation of a gate electrode |
Apr. 1, 2003 |
| 6541865 |
Porous dielectric material and electronic devices fabricated therewith |
Apr. 1, 2003 |
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