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Class Information
Number: 257/65
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Non-single crystal, or recrystallized, semiconductor material forms part of active junction (including field-induced active junction) > Non-single crystal, or recrystallized, material containing non-dopant additive, or alloy of semiconductor materials (e.g., ge x si 1- x, polycrystalline silicon with dangling bond modifier)
Description: Subject matter wherein the non-single crystal semiconductor is an alloy or contains an additive other than an electrically active dopant, such as a dangling bond passivator or an additive to change the band gap of the amorphous semiconductor material (e.g., Six


Patents under this class:
1 2 3 4 5

Patent Number Title Of Patent Date Issued
6433269 Silicon photoelectric conversion device, method of fabricating the same and method of processing the same Aug. 13, 2002
6420219 Thin film transistors and method of forming thin film transistors Jul. 16, 2002
6392253 Semiconductor device with single crystal films grown on arrayed nucleation sites on amorphous and/or non-single crystal surfaces May. 21, 2002
6384316 Photovoltaic device May. 7, 2002
6346716 Semiconductor material having particular oxygen concentration and semiconductor device comprising the same Feb. 12, 2002
6333110 Functionalized nanocrystals as visual tissue-specific imaging agents, and methods for fluorescence imaging Dec. 25, 2001
6331718 Thin film circuit with improved carrier mobility Dec. 18, 2001
6326664 Transistor with ultra shallow tip and method of fabrication Dec. 4, 2001
6319607 Purification of functionalized fluorescent nanocrystals Nov. 20, 2001
6320202 Bottom-gated thin film transistors comprising germanium in a channel region Nov. 20, 2001
6316789 Semiconductor device and method for producing the same Nov. 13, 2001
6312617 Conductive isostructural compounds Nov. 6, 2001
6309701 Fluorescent nanocrystal-labeled microspheres for fluorescence analyses Oct. 30, 2001
6300659 Thin-film transistor and fabrication method for same Oct. 9, 2001
6294814 Cleaved silicon thin film with rough surface Sep. 25, 2001
6288412 Thin film transistors for display devices having two polysilicon active layers of different thicknesses Sep. 11, 2001
6285042 Active Matry Display Sep. 4, 2001
6242779 Selective silicide thin-film transistor having polysilicon active layers with crystallizing metal agent introduced only in the source/drain regions Jun. 5, 2001
6225667 Leaky lower interface for reduction of floating body effect in SOI devices May. 1, 2001
6225645 Semiconductor device and method of manufacturing the same May. 1, 2001
6218702 Microcrystal silicon film and its manufacturing method, and photoelectric conversion device and its manufacturing method Apr. 17, 2001
6211535 Method of manufacturing a semiconductor device Apr. 3, 2001
6211077 Method for forming polycrystal silicon film for semiconductor elements Apr. 3, 2001
6210998 Semiconductor device formed on an insulator and having a damaged portion at the interface between the insulator and the active layer Apr. 3, 2001
6184541 Thin film transistor and method of producing the same Feb. 6, 2001
6180982 Semiconductor device and method of making thereof Jan. 30, 2001
6172380 Semiconductor material Jan. 9, 2001
6153920 Process for controlling dopant diffusion in a semiconductor layer and semiconductor device formed thereby Nov. 28, 2000
6144041 Semiconductor device having an active layer with no grain boundary Nov. 7, 2000
6140667 Semiconductor thin film in semiconductor device having grain boundaries Oct. 31, 2000
6124602 Semiconductor circuit having a crystal growth in an active layer where a specific distance is established between a selected portion and where the growth starts to the active layer of the circ Sep. 26, 2000
6114038 Functionalized nanocrystals and their use in detection systems Sep. 5, 2000
6111267 CMOS integrated circuit including forming doped wells, a layer of intrinsic silicon, a stressed silicon germanium layer where germanium is between 25 and 50%, and another intrinsic silicon lay Aug. 29, 2000
6107639 Semiconductor device with rod like crystals and a recessed insulation layer Aug. 22, 2000
6104040 Liquid crystal display having a transistor with doped region in an active semiconductor layer Aug. 15, 2000
6103138 Silicon-system thin film, photovoltaic device, method for forming silicon-system thin film, and method for producing photovoltaic device Aug. 15, 2000
6100562 Method of manufacturing a semiconductor device Aug. 8, 2000
6097037 Thin film transistor having a continuous crystallized layer including the channel and portions of source and drain regions Aug. 1, 2000
6093934 Thin film transistor having grain boundaries with segregated oxygen and halogen elements Jul. 25, 2000
6093937 Semiconductor thin film, semiconductor device and manufacturing method thereof Jul. 25, 2000
6087679 Semiconductor thin film and semiconductor device Jul. 11, 2000
6084247 Semiconductor device having a catalyst enhanced crystallized layer Jul. 4, 2000
6078060 Active matrix display devices and methods of manufacturing the active matrix display devices Jun. 20, 2000
6072193 Thin-film transistor and semiconductor device using thin-film transistors Jun. 6, 2000
6054739 Semiconductor device having channel refractive index in first and second directions Apr. 25, 2000
6043512 Thin film semiconductor device and method for producing the same Mar. 28, 2000
6031249 CMOS semiconductor device having boron doped channel Feb. 29, 2000
6028264 Semiconductor having low concentration of carbon Feb. 22, 2000
6028333 Electric device, matrix device, electro-optical display device, and semiconductor memory having thin-film transistors Feb. 22, 2000
6023088 Semiconductor device formed on an insulator and having a damaged portion at the interface between the insulator and the active layer Feb. 8, 2000

1 2 3 4 5


 
 
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