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Class Information
Number: 257/65
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Non-single crystal, or recrystallized, semiconductor material forms part of active junction (including field-induced active junction) > Non-single crystal, or recrystallized, material containing non-dopant additive, or alloy of semiconductor materials (e.g., ge x si 1- x, polycrystalline silicon with dangling bond modifier)
Description: Subject matter wherein the non-single crystal semiconductor is an alloy or contains an additive other than an electrically active dopant, such as a dangling bond passivator or an additive to change the band gap of the amorphous semiconductor material (e.g., Six










Patents under this class:
1 2 3 4 5 6 7

Patent Number Title Of Patent Date Issued
8659023 Monocrystalline substrate including lattice matching atoms in a near surface region and a monocrystalline layer disposed on the substrate Feb. 25, 2014
8648391 SiGe heterojunction bipolar transistor with an improved breakdown voltage-cutoff frequency product Feb. 11, 2014
8629446 Devices formed from a non-polar plane of a crystalline material and method of making the same Jan. 14, 2014
8624295 SRAM devices utilizing strained-channel transistors and methods of manufacture Jan. 7, 2014
8611146 Forced ion migration for chalcogenide phase change memory device Dec. 17, 2013
8546249 Selective growth of polycrystalline silicon-containing semiconductor material on a silicon-containing semiconductor surface Oct. 1, 2013
8530907 Room temperature silicon-compatible LED/laser with electrically pumped field emission device Sep. 10, 2013
8501570 Method of manufacturing source/drain structures Aug. 6, 2013
8497508 Semiconductor device and manufacturing method thereof Jul. 30, 2013
8466450 Semiconductor device and fabrication method thereof Jun. 18, 2013
8455859 Strained structure of semiconductor device Jun. 4, 2013
8399878 Silicon/germanium oxide particle inks and processes for forming solar cell components and for forming optical components Mar. 19, 2013
8357940 Thin film transistor and manufacturing method thereof Jan. 22, 2013
8349694 Enhanced confinement of high-K metal gate electrode structures by reducing material erosion of a dielectric cap layer upon forming a strain-inducing semiconductor alloy Jan. 8, 2013
8338831 Semiconductor device and manufacturing method thereof Dec. 25, 2012
8330161 Electronic photosensitive body and manufacturing method for same, as well as image forming apparatus Dec. 11, 2012
8318555 Method of producing a hybrid substrate having a continuous buried electrically insulating layer Nov. 27, 2012
8283669 Semiconductor device and method of manufacturing same Oct. 9, 2012
8274083 Semiconductor device and a method of manufacturing the same Sep. 25, 2012
8182719 Pyroelectric compound and method of its preparation May. 22, 2012
8183566 Hetero-crystalline semiconductor device and method of making same May. 22, 2012
8178882 Buffer layer for promoting electron mobility and thin film transistor having the same May. 15, 2012
8168975 Semiconductor device and manufacturing method thereof May. 1, 2012
8154022 Process for fabricating a structure for epitaxy without an exclusion zone Apr. 10, 2012
8134159 Semiconductor device including a p-type transistor having extension regions in sours and drain regions and method of fabricating the same Mar. 13, 2012
8120112 Method and apparatus for improving triggering uniformity of snapback electrostatic discharge protection devices Feb. 21, 2012
8106466 MOS transistor and method for fabricating the same Jan. 31, 2012
8097499 Semiconductor device and methods thereof Jan. 17, 2012
8080849 Characterizing films using optical filter pseudo substrate Dec. 20, 2011
8053776 Vertical diode and method for manufacturing same and semiconductor memory device Nov. 8, 2011
8026535 Thin film transistor and organic electroluminescence display using the same Sep. 27, 2011
7999250 Silicon-germanium-carbon semiconductor structure Aug. 16, 2011
7993947 Silicon/germanium oxide particle inks, inkjet printing and processes for doping semiconductor substrates Aug. 9, 2011
7964479 Low-temperature formation of layers of polycrystalline semiconductor material Jun. 21, 2011
7956360 Growth of planar reduced dislocation density M-plane gallium nitride by hydride vapor phase epitaxy Jun. 7, 2011
7928438 Semiconductor thin film and semiconductor device Apr. 19, 2011
7928442 Optical device having strained buried channel Apr. 19, 2011
7928443 Method and structure for forming strained SI for CMOS devices Apr. 19, 2011
7910929 Semiconductor device Mar. 22, 2011
7906778 Methods of making nano-scale structures having controlled size, nanowire structures and methods of making the nanowire structures Mar. 15, 2011
7898028 Process for fabricating a strained channel MOSFET device Mar. 1, 2011
7892872 Silicon/germanium oxide particle inks, inkjet printing and processes for doping semiconductor substrates Feb. 22, 2011
7884354 Germanium on insulator (GOI) semiconductor substrates Feb. 8, 2011
7858964 Semiconductor device formed in a recrystallized layer Dec. 28, 2010
7855127 Method for manufacturing semiconductor substrate Dec. 21, 2010
7855384 SIC semiconductor device and method for manufacturing the same Dec. 21, 2010
7851695 Stacked-type photoelectric conversion device Dec. 14, 2010
7816686 Forming silicides with reduced tailing on silicon germanium and silicon Oct. 19, 2010
7816680 Oxide semiconductors and thin film transistors comprising the same Oct. 19, 2010
7791064 Semiconductor device and fabrication method thereof Sep. 7, 2010

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