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Class Information
Number: 257/646
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > With means to control surface effects > Insulating coating > Coating of semi-insulating material (e.g., amorphous silicon or silicon-rich silicon oxide)
Description: Subject matter wherein the insulating layer is composed of a semi-insulating material.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7405466 |
Method of fabricating microelectromechanical system structures |
Jul. 29, 2008 |
| 7368793 |
HEMT transistor semiconductor device |
May. 6, 2008 |
| 7357977 |
Ultralow dielectric constant layer with controlled biaxial stress |
Apr. 15, 2008 |
| 7321145 |
Method and apparatus for operating nonvolatile memory cells with modified band structure |
Jan. 22, 2008 |
| 7314801 |
Semiconductor device having a surface conducting channel and method of forming |
Jan. 1, 2008 |
| 7298024 |
Transparent amorphous carbon structure in semiconductor devices |
Nov. 20, 2007 |
| 7282774 |
Semiconductor device and method for manufacturing semiconductor device |
Oct. 16, 2007 |
| 7268052 |
Method for reducing soft error rates of memory cells |
Sep. 11, 2007 |
| 7259387 |
Nonvolatile semiconductor memory device |
Aug. 21, 2007 |
| 7259055 |
Method of forming high-luminescence silicon electroluminescence device |
Aug. 21, 2007 |
| 7256098 |
Method of manufacturing a memory device |
Aug. 14, 2007 |
| 7235865 |
Methods for making nearly planar dielectric films in integrated circuits |
Jun. 26, 2007 |
| 7221039 |
Thin film transistor (TFT) device structure employing silicon rich silicon oxide passivation layer |
May. 22, 2007 |
| 7208426 |
Preventing plasma induced damage resulting from high density plasma deposition |
Apr. 24, 2007 |
| 7205640 |
Semiconductor device and display comprising same |
Apr. 17, 2007 |
| 7202137 |
Process for producing an integrated electronic circuit comprising superposed components and integrated electronic circuit thus obtained |
Apr. 10, 2007 |
| 7187058 |
Semiconductor component having a pn junction and a passivation layer applied on a surface |
Mar. 6, 2007 |
| 7145172 |
Thin film transistor array substrate |
Dec. 5, 2006 |
| 7105895 |
Epitaxial SiO.sub.x barrier/insulation layer |
Sep. 12, 2006 |
| 7105914 |
Integrated circuit and seed layers |
Sep. 12, 2006 |
| 7030468 |
Low k and ultra low k SiCOH dielectric films and methods to form the same |
Apr. 18, 2006 |
| 7030429 |
Hetero-junction bipolar transistor and the method for producing the same |
Apr. 18, 2006 |
| 7015168 |
Low dielectric constant fluorine and carbon-containing silicon oxide dielectric material characterized by improved resistance to oxidation |
Mar. 21, 2006 |
| 6984843 |
Board for electronic device, electronic device, ferroelectric memory, electronic apparatus, ink-jet recording head, and ink-jet printer |
Jan. 10, 2006 |
| 6977407 |
Even nucleation between silicon and oxide surfaces for thin silicon nitride film growth |
Dec. 20, 2005 |
| 6959920 |
Protection against in-process charging in silicon-oxide-nitride-oxide-silicon (SONOS) memories |
Nov. 1, 2005 |
| 6900523 |
Termination structure for MOSgated power devices |
May. 31, 2005 |
| 6885042 |
Hetero-junction bipolar transistor and a manufacturing method of the same |
Apr. 26, 2005 |
| 6809339 |
Semiconductor device and method for manufacturing same |
Oct. 26, 2004 |
| 6780793 |
Production method of semiconductor device |
Aug. 24, 2004 |
| 6770917 |
High-voltage diode |
Aug. 3, 2004 |
| 6765254 |
Structure and method for preventing UV radiation damage and increasing data retention in memory cells |
Jul. 20, 2004 |
| 6753599 |
Semiconductor package and mounting structure on substrate thereof and stack structure thereof |
Jun. 22, 2004 |
| 6743681 |
Methods of Fabricating Gate and Storage Dielectric Stacks having Silicon-Rich-Nitride |
Jun. 1, 2004 |
| 6737319 |
Method of manufacturing semiconductor device and semiconductor device |
May. 18, 2004 |
| 6696705 |
Power semiconductor component having a mesa edge termination |
Feb. 24, 2004 |
| 6670695 |
Method of manufacturing anti-reflection layer |
Dec. 30, 2003 |
| 6664201 |
Method of manufacturing anti-reflection layer |
Dec. 16, 2003 |
| 6608351 |
Semiconductor device comprising a high-voltage circuit element |
Aug. 19, 2003 |
| 6548901 |
Cu/low-k BEOL with nonconcurrent hybrid dielectric interface |
Apr. 15, 2003 |
| 6518647 |
Plated aluminum leadframes for semiconductor devices, including two nickel layers, and method of fabrication |
Feb. 11, 2003 |
| 6476474 |
Dual-die package structure and method for fabricating the same |
Nov. 5, 2002 |
| 6433387 |
Lateral bipolar transistor |
Aug. 13, 2002 |
| 6384463 |
High voltage shield |
May. 7, 2002 |
| 6365959 |
Semiconductor device and method for fabricating the same |
Apr. 2, 2002 |
| 6355985 |
Integrated circuit device and synchronous-link dynamic random access memory device |
Mar. 12, 2002 |
| 6306777 |
Flash memory having a treatment layer disposed between an interpoly dielectric structure and method of forming |
Oct. 23, 2001 |
| 6242801 |
Semiconductor device |
Jun. 5, 2001 |
| 6183857 |
Substrate for high frequency integrated circuits |
Feb. 6, 2001 |
| 6184572 |
Interlevel dielectric stack containing plasma deposited fluorinated amorphous carbon films for semiconductor devices |
Feb. 6, 2001 |
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