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Class Information
Number: 257/639
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > With means to control surface effects > Insulating coating > Multiple layers > At least one layer of silicon oxynitride
Description: Subject matter wherein at least one of the multiple insulating layers is made of a mixture of the oxides and nitrides of silicon.

Patents under this class:
1 2 3 4 5

Patent Number Title Of Patent Date Issued
8674484 Dielectric separator layer Mar. 18, 2014
8669645 Semiconductor structures including polymer material permeated with metal oxide Mar. 11, 2014
8659124 Physical structure for use in a physical unclonable function Feb. 25, 2014
8643124 Oxide-nitride-oxide stack having multiple oxynitride layers Feb. 4, 2014
8629535 Mask for forming integrated circuit Jan. 14, 2014
8575727 Gate structures Nov. 5, 2013
8552537 Semiconductor device and method for fabricating the same Oct. 8, 2013
8471369 Method and apparatus for reducing plasma process induced damage in integrated circuits Jun. 25, 2013
8455985 Integrated circuit devices having selectively strengthened composite interlayer insulation layers and methods of fabricating the same Jun. 4, 2013
8441107 Gate structures May. 14, 2013
8264064 Semiconductor device Sep. 11, 2012
8227877 Semiconductor bio-sensors and methods of manufacturing the same Jul. 24, 2012
8212280 Light-emitting element and display device Jul. 3, 2012
8198708 System and method for improving CMOS compatible non volatile memory retention reliability Jun. 12, 2012
8187973 Method for manufacturing semiconductor device and the semiconductor device May. 29, 2012
8183136 Method of forming insulating layer and method of manufacturing transistor using the same May. 22, 2012
8183647 Semiconductor device and manufacturing method for silicon oxynitride film May. 22, 2012
8013392 High mobility CMOS circuits Sep. 6, 2011
7928512 Semiconductor device Apr. 19, 2011
7898065 Structure and method for device-specific fill for improved anneal uniformity Mar. 1, 2011
7855416 Semiconductor device and manufacturing method thereof Dec. 21, 2010
RE41948 Semiconductor device having multi-layered wiring Nov. 23, 2010
7834427 Integrated circuit having a semiconductor arrangement Nov. 16, 2010
7825443 Semiconductor constructions Nov. 2, 2010
7804115 Semiconductor constructions having antireflective portions Sep. 28, 2010
7786552 Semiconductor device having hydrogen-containing layer Aug. 31, 2010
7732923 Impurity doped UV protection layer Jun. 8, 2010
7675118 Semiconductor structure with enhanced performance using a simplified dual stress liner configuration Mar. 9, 2010
7651959 Method for forming silazane-based dielectric film Jan. 26, 2010
7642203 Passivation layer for semiconductor device and manufacturing method thereof Jan. 5, 2010
7638859 Interconnects with harmonized stress and methods for fabricating the same Dec. 29, 2009
7566950 Flexible pixel array substrate Jul. 28, 2009
7550823 Nonvolatile memory cell, array thereof, fabrication methods thereof and device comprising the same Jun. 23, 2009
7518193 SRAM array and analog FET with dual-strain layers comprising relaxed regions Apr. 14, 2009
7456474 Semiconductor device having insulating film Nov. 25, 2008
7432216 Semiconductor device and manufacturing method thereof Oct. 7, 2008
7420264 High reflector tunable stress coating, such as for a MEMS mirror Sep. 2, 2008
7372114 Semiconductor device, and method of fabricating the same May. 13, 2008
7358595 Method for manufacturing MOS transistor Apr. 15, 2008
7329956 Dual damascene cleaning method Feb. 12, 2008
7301219 Electrically erasable programmable read only memory (EEPROM) cell and method for making the same Nov. 27, 2007
7262432 Semiconductor device and fabrication method thereof Aug. 28, 2007
7253501 High performance metallization cap layer Aug. 7, 2007
7217989 Composition for selectively polishing silicon nitride layer and polishing method employing it May. 15, 2007
7202551 Display device having underlying insulating film and insulating films Apr. 10, 2007
7202568 Semiconductor passivation deposition process for interfacial adhesion Apr. 10, 2007
7190033 CMOS device and method of manufacture Mar. 13, 2007
7187038 Semiconductor device with MOS transistors with an etch-stop layer having an improved residual stress level and method for fabricating such a semiconductor device Mar. 6, 2007
7166899 Semiconductor device, and method of fabricating the same Jan. 23, 2007
7119418 Supercritical fluid-assisted deposition of materials on semiconductor substrates Oct. 10, 2006

1 2 3 4 5

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