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Class Information
Number: 257/627
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Physical configuration of semiconductor (e.g., mesa, bevel, groove, etc.) > With specified crystal plane or axis
Description: Subject matter wherein the physical configuration of the device is along a specified crystal plane or axis.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7459720 |
Single crystal wafer and solar battery cell |
Dec. 2, 2008 |
| 7456040 |
Method for producing semiconductor optical device |
Nov. 25, 2008 |
| 7456450 |
CMOS devices with hybrid channel orientations and method for fabricating the same |
Nov. 25, 2008 |
| 7449767 |
Mixed orientation and mixed material semiconductor-on-insulator wafer |
Nov. 11, 2008 |
| 7446361 |
Capacitor and semiconductor device having a ferroelectric material |
Nov. 4, 2008 |
| 7439110 |
Strained HOT (hybrid orientation technology) MOSFETs |
Oct. 21, 2008 |
| 7432570 |
Semiconductor device and manufacturing method thereof |
Oct. 7, 2008 |
| 7423303 |
Strained silicon directly-on-insulator substrate with hybrid crystalline orientation and different stress levels |
Sep. 9, 2008 |
| 7420261 |
Bulk nitride mono-crystal including substrate for epitaxy |
Sep. 2, 2008 |
| 7414313 |
Polymeric conductor donor and transfer method |
Aug. 19, 2008 |
| 7411273 |
Nitride semiconductor substrate |
Aug. 12, 2008 |
| 7411274 |
Silicon semiconductor substrate and its manufacturing method |
Aug. 12, 2008 |
| 7405436 |
Stressed field effect transistors on hybrid orientation substrate |
Jul. 29, 2008 |
| 7400030 |
Schottky diode with silver layer contacting the ZnO and Mg.sub.xZn.sub.1-xO films |
Jul. 15, 2008 |
| 7396407 |
Trench-edge-defect-free recrystallization by edge-angle-optimized solid phase epitaxy: method and applications to hybrid orientation substrates |
Jul. 8, 2008 |
| 7388278 |
High performance field effect transistors on SOI substrate with stress-inducing material as buried insulator and methods |
Jun. 17, 2008 |
| 7385258 |
Transistors having v-shape source/drain metal contacts |
Jun. 10, 2008 |
| 7382029 |
Method and apparatus for improving integrated circuit device performance using hybrid crystal orientations |
Jun. 3, 2008 |
| 7368763 |
Semiconductor device and manufacturing method thereof |
May. 6, 2008 |
| 7348658 |
Multilayer silicon over insulator device |
Mar. 25, 2008 |
| 7339213 |
Semiconductor device having a triple gate transistor and method for manufacturing the same |
Mar. 4, 2008 |
| 7339255 |
Semiconductor device having bidirectionally inclined toward <1-100> and <11-20> relative to {0001} crystal planes |
Mar. 4, 2008 |
| 7335910 |
Thin film transistor, semiconductor device, display, crystallization method, and method of manufacturing thin film transistor |
Feb. 26, 2008 |
| 7329923 |
High-performance CMOS devices on hybrid crystal oriented substrates |
Feb. 12, 2008 |
| 7307282 |
Thin film transistors and semiconductor device |
Dec. 11, 2007 |
| 7298009 |
Semiconductor method and device with mixed orientation substrate |
Nov. 20, 2007 |
| 7285820 |
Flash memory device using semiconductor fin and method thereof |
Oct. 23, 2007 |
| 7285799 |
Semiconductor light emitting devices including in-plane light emitting layers |
Oct. 23, 2007 |
| 7282379 |
Nitride semiconductor, semiconductor device, and method of manufacturing the same |
Oct. 16, 2007 |
| 7282738 |
Fabrication of crystalline materials over substrates |
Oct. 16, 2007 |
| 7271043 |
Method for manufacturing strained silicon directly-on-insulator substrate with hybrid crystalline orientation and different stress levels |
Sep. 18, 2007 |
| 7271467 |
Multiple oxide thicknesses for merged memory and logic applications |
Sep. 18, 2007 |
| 7268377 |
Structure and method of fabricating a hybrid substrate for high-performance hybrid-orientation silicon-on-insulator CMOS devices |
Sep. 11, 2007 |
| 7256478 |
Notched compound semiconductor wafer |
Aug. 14, 2007 |
| 7256477 |
Notched compound semiconductor wafer |
Aug. 14, 2007 |
| 7256476 |
Notched compound semiconductor wafer |
Aug. 14, 2007 |
| 7226805 |
Sequential lithographic methods to reduce stacking fault nucleation sites |
Jun. 5, 2007 |
| 7208803 |
Method of forming a raised source/drain and a semiconductor device employing the same |
Apr. 24, 2007 |
| 7208815 |
CMOS logic gate fabricated on hybrid crystal orientations and method of forming thereof |
Apr. 24, 2007 |
| 7199451 |
Growing [110] silicon on [001]-oriented substrate with rare-earth oxide buffer film |
Apr. 3, 2007 |
| 7196400 |
Semiconductor device with enhanced orientation ratio and method of manufacturing same |
Mar. 27, 2007 |
| 7190076 |
Electrode for p-type Group III nitride compound semiconductor layer and method for producing the same |
Mar. 13, 2007 |
| 7190050 |
Integrated circuit on corrugated substrate |
Mar. 13, 2007 |
| 7187059 |
Compressive SiGe <110> growth and structure of MOSFET devices |
Mar. 6, 2007 |
| 7183629 |
Metal line having an increased resistance to electromigration along an interface of a dielectric barrier layer by implanting material into the metal line |
Feb. 27, 2007 |
| 7164172 |
Semiconductor device and method of manufacturing same |
Jan. 16, 2007 |
| 7148559 |
Substrate engineering for optimum CMOS device performance |
Dec. 12, 2006 |
| 7132730 |
Bulk nitride mono-crystal including substrate for epitaxy |
Nov. 7, 2006 |
| 7109568 |
Semiconductor device including n-channel fets and p-channel fets with improved drain current characteristics |
Sep. 19, 2006 |
| 7102166 |
Hybrid orientation field effect transistors (FETs) |
Sep. 5, 2006 |
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