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Class Information
Number: 257/543
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Integrated circuit structure with electrically isolated components > Passive components in ics > Including resistive element > Combined with bipolar transistor > Lightly doped junction isolated resistor (e.g., ion implanted resistor)
Description: Subject matter wherein the resistive element is of the form of a lightly doped layer of one conductivity type located in a region of opposite conductivity type, such that the pn junction between the resistor region and its containing opposite conductivity type region serves to isolate the resistor.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7319254 |
Semiconductor memory device having resistor and method of fabricating the same |
Jan. 15, 2008 |
| 7208814 |
Resistive device and method for its production |
Apr. 24, 2007 |
| 7136299 |
High-density phase change cell array and phase change memory device having the same |
Nov. 14, 2006 |
| 7064414 |
Heater for annealing trapped charge in a semiconductor device |
Jun. 20, 2006 |
| 7053463 |
High-voltage integrated vertical resistor and manufacturing process thereof |
May. 30, 2006 |
| 7038297 |
Semiconductor diffused resistors with optimized temperature dependence |
May. 2, 2006 |
| 6992327 |
Monitor pattern of semiconductor device and method of manufacturing semiconductor device |
Jan. 31, 2006 |
| 6849921 |
Semiconductor device |
Feb. 1, 2005 |
| 6762501 |
Low stress integrated circuit copper interconnect structures |
Jul. 13, 2004 |
| 6759726 |
Formation of an isolating wall |
Jul. 6, 2004 |
| 6720621 |
SOI semiconductor device with resistor body |
Apr. 13, 2004 |
| 6716727 |
Methods and apparatus for plasma doping and ion implantation in an integrated processing system |
Apr. 6, 2004 |
| 6696916 |
Integrated vertical resistor structure with reduced dimensions, for high voltage, and manufacturing process thereof |
Feb. 24, 2004 |
| 6667538 |
Semiconductor device having semiconductor resistance element and fabrication method thereof |
Dec. 23, 2003 |
| 6639300 |
Semiconductor integrated circuit having an integrated resistance region |
Oct. 28, 2003 |
| 6313515 |
Reference voltage supply circuit |
Nov. 6, 2001 |
| 6307248 |
Definition of anti-fuse cell for programmable gate array application |
Oct. 23, 2001 |
| 6111304 |
Semiconductor diffused resistor and method for manufacturing the same |
Aug. 29, 2000 |
| 6107671 |
Film device provided with a resistance-adjustable resistive element |
Aug. 22, 2000 |
| 6078094 |
Starter current source device with automatic shut-down capability and method for its manufacture |
Jun. 20, 2000 |
| 5889312 |
Semiconductor device having circuit element in stress gradient region by film for isolation and method of manufacturing the same |
Mar. 30, 1999 |
| 5572062 |
Antifuse with silicon spacers |
Nov. 5, 1996 |
| 5525831 |
Semiconductor device with thin film resistor having reduced film thickness sensitivity during trimming process |
Jun. 11, 1996 |
| 5401995 |
Circuit with diode-protected emitter resistors |
Mar. 28, 1995 |
| 5321279 |
Base ballasting |
Jun. 14, 1994 |
| 4979001 |
Hidden zener diode structure in configurable integrated circuit |
Dec. 18, 1990 |
| 4918494 |
Thin film transistor |
Apr. 17, 1990 |
| 4893166 |
High value semiconductor resistor |
Jan. 9, 1990 |
| 4868618 |
Ion implanted semiconductor device |
Sep. 19, 1989 |
| 4801555 |
Double-implant process for forming graded source/drain regions |
Jan. 31, 1989 |
| 4785339 |
Integrated lateral PNP transistor and current limiting resistor |
Nov. 15, 1988 |
| 4755484 |
Method of making a semimetal semiconductor contact |
Jul. 5, 1988 |
| 4725876 |
Semiconductor device having at least two resistors with high resistance values |
Feb. 16, 1988 |
| 4656495 |
Bipolar ram cell and process |
Apr. 7, 1987 |
| 4613887 |
Semiconductor device with a means for discharging carriers |
Sep. 23, 1986 |
| 4543593 |
Semiconductor protective device |
Sep. 24, 1985 |
| 4298401 |
Breakdown voltage resistor obtained through a double ion-implantation into a semiconductor substrate, and manufacturing process of the same |
Nov. 3, 1981 |
| 4228451 |
High resistivity semiconductor resistor device |
Oct. 14, 1980 |
| 4152627 |
Low power write-once, read-only memory array |
May. 1, 1979 |
| 4021270 |
Double master mask process for integrated circuit manufacture |
May. 3, 1977 |
| 3947866 |
Ion implanted resistor having controlled temperature coefficient and method |
Mar. 30, 1976 |
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