| |
 |
|
Class Information
Number: 257/406
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Field effect device > Having insulated electrode (e.g., mosfet, mos diode) > With permanent threshold adjustment (e.g., depletion mode) > With gate insulator containing specified permanent charge > Plural gate insulator layers
Description: Subject matter wherein the gate insulator is made up of a plurality of gate insulator layers.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7595538 |
Semiconductor device |
Sep. 29, 2009 |
| 7592678 |
CMOS transistors with dual high-k gate dielectric and methods of manufacture thereof |
Sep. 22, 2009 |
| 7586159 |
Semiconductor devices having different gate dielectrics and methods for manufacturing the same |
Sep. 8, 2009 |
| 7579231 |
Semiconductor device and method of manufacturing the same |
Aug. 25, 2009 |
| 7576398 |
Method of composite gate formation |
Aug. 18, 2009 |
| 7573110 |
Method of fabricating semiconductor devices |
Aug. 11, 2009 |
| 7550823 |
Nonvolatile memory cell, array thereof, fabrication methods thereof and device comprising the same |
Jun. 23, 2009 |
| 7550809 |
Semiconductor integrated circuit device having deposited layer for gate insulation |
Jun. 23, 2009 |
| 7547951 |
Semiconductor devices having nitrogen-incorporated active region and methods of fabricating the same |
Jun. 16, 2009 |
| 7498643 |
Semiconductor device and method for manufacturing the same |
Mar. 3, 2009 |
| 7470931 |
Thin film transistor and flat panel display using the same |
Dec. 30, 2008 |
| 7442977 |
Gated field effect devices |
Oct. 28, 2008 |
| 7442999 |
Semiconductor substrate, substrate for semiconductor crystal growth, semiconductor device, optical semiconductor device, and manufacturing method thereof |
Oct. 28, 2008 |
| 7427791 |
Method of forming a CMOS structure having gate insulation films of different thicknesses |
Sep. 23, 2008 |
| 7423326 |
Integrated circuits with composite gate dielectric |
Sep. 9, 2008 |
| 7420256 |
Nonvolatile semiconductor memory device having a gate stack and method of manufacturing the same |
Sep. 2, 2008 |
| 7402873 |
Semiconductor integrated circuit device having deposited layer for gate insulation |
Jul. 22, 2008 |
| 7397094 |
Semiconductor device and manufacturing method thereof |
Jul. 8, 2008 |
| 7355249 |
Silicon-on-insulator based radiation detection device and method |
Apr. 8, 2008 |
| 7326988 |
Semiconductor device and method for fabricating the same |
Feb. 5, 2008 |
| 7323755 |
Method of composite gate formation |
Jan. 29, 2008 |
| 7323756 |
Method of composite gate formation |
Jan. 29, 2008 |
| 7312491 |
Charge trapping semiconductor memory element with improved trapping dielectric |
Dec. 25, 2007 |
| 7304340 |
Semiconductor storage elements, semiconductor device manufacturing methods therefor, portable electronic equipment and IC card |
Dec. 4, 2007 |
| 7301219 |
Electrically erasable programmable read only memory (EEPROM) cell and method for making the same |
Nov. 27, 2007 |
| 7273815 |
Etch features with reduced line edge roughness |
Sep. 25, 2007 |
| 7268393 |
Semiconductor devices and methods of manufacturing the same |
Sep. 11, 2007 |
| 7268401 |
Semiconductor integrated circuit device having deposited layer for gate insulation |
Sep. 11, 2007 |
| 7259433 |
Non-volatile semiconductor memory device and method for producing same |
Aug. 21, 2007 |
| 7247920 |
Method of composite gate formation |
Jul. 24, 2007 |
| 7245010 |
System and device including a barrier layer |
Jul. 17, 2007 |
| 7238996 |
Semiconductor device |
Jul. 3, 2007 |
| 7224007 |
Multi-channel transistor with tunable hot carrier effect |
May. 29, 2007 |
| 7208802 |
Insulating film and electronic device |
Apr. 24, 2007 |
| 7164177 |
Multi-level memory cell |
Jan. 16, 2007 |
| 7161203 |
Gated field effect device comprising gate dielectric having different K regions |
Jan. 9, 2007 |
| 7129544 |
Vertical compound semiconductor field effect transistor structure |
Oct. 31, 2006 |
| 7119406 |
Semiconductor integrated circuit device having deposited layer for gate insulation |
Oct. 10, 2006 |
| 7071519 |
Control of high-k gate dielectric film composition profile for property optimization |
Jul. 4, 2006 |
| 7045814 |
OFET structures with both n- and p-type channels |
May. 16, 2006 |
| 7042054 |
SONOS structure including a deuterated oxide-silicon interface and method for making the same |
May. 9, 2006 |
| 7023062 |
Semiconductor integrated circuit device having deposited layer for gate insulation |
Apr. 4, 2006 |
| 7009205 |
Image display device using transistors each having a polycrystalline semiconductor layer |
Mar. 7, 2006 |
| 7001815 |
Method of manufacturing semiconductor device with triple gate insulating layers |
Feb. 21, 2006 |
| 7002224 |
Transistor with doped gate dielectric |
Feb. 21, 2006 |
| 6974999 |
Semiconductor device and method of manufacturing the same |
Dec. 13, 2005 |
| 6969890 |
Structure of thin film transistor |
Nov. 29, 2005 |
| 6960804 |
Semiconductor device having a gate structure surrounding a fin |
Nov. 1, 2005 |
| 6953967 |
Semiconductor device and method of manufacturing the same |
Oct. 11, 2005 |
| 6949805 |
Semiconductor device having low interface state density and method for fabricating the same |
Sep. 27, 2005 |
|
|
|